A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of allo...A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of alloy elements, and lithium intercalation/de-intercalation behaviors of the fabricated films were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, electron probe microanalyzer （EPMA）, X-ray photoelectron spectroscopy （XPS）, inductively coupled plasma atomic emission spectrometry （ICP）, cyclic voltammetry （CV）, and galvanostatic charge/discharge （GC） measurements. It is found that the lithium intercalation/de-intercalation behavior of the Sn film can be significantly improved by its composite with graphite. With cycling, the discharge capacity of the Sn film without composite changes from 570 mAh/g of the 2nd cycle to 270 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 90% and 95%. Nevertheless, the discharge capacity of the composite Sn/C film changes from 575 mAh/g of the 2nd cycle to 515 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 95% and 100%. The performance improvement of tin by its composite with graphite is ascribed to the retardation of the bulk tin cracking from volume change during lithium intercalation and de-intercalation, which leads to the pulverization of tin.展开更多
This article mainly deals with the preparation and properties of PZTthin films. A new type of Metal-Me tal Oxide composite target was developed. Relating factors have been discussed. The electrical and optical propert...This article mainly deals with the preparation and properties of PZTthin films. A new type of Metal-Me tal Oxide composite target was developed. Relating factors have been discussed. The electrical and optical properties of PZT thin films have also been studied.展开更多
Polycrystalline Cr2AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 ℃. Partic...Polycrystalline Cr2AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 ℃. Particularly, various targets synthesized by hot pressing mixture of Cr, Al, and C powders at 650-1000 ℃ were used. It was found that regardless of the phase compositions and density of the com- posite targets, when the molar ratio of Cr：Al：C in the starting materials was 2：1：1, phase-pure crystalline Cr2AlC coatings were prepared by magnetron sputtering and post crystallization. The Cr2AIC coatings were dense and crack-free and had a duplex structure. The adhesion strength of the coating deposited on M38G superalloy from the 800 ℃ hot-pressed target and then annealed at 620 ℃ for 20 h in Ar exceeded 82 ± 6 MPa, while its hardness was 12 ± 3 GPa.展开更多
Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron ...Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, atomic force microscopy, surface profile, UV-Vis spectroscopy, and Hall effect. The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time, target power, chamber pressure, and the target-substrate separation. The average transmittance of the ZnSnO3 films within the visible wavelength was approximately 80% and the resistivity of the ZnSnO3 films was in the range of 10^-3-10^-4 Ω cm. The structural, optical, and electrical properties of the ZnSnO3 films could be adjusted and regulated by optimizing the sputtering process, allowing materials with specific properties to be designed.展开更多
MoS2/Zr composite films were deposited on the cemented carbide YT14 （WC＋14%TiC＋6%Co） by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage ...MoS2/Zr composite films were deposited on the cemented carbide YT14 （WC＋14%TiC＋6%Co） by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were investigated.The results showed that proper negative bias voltage could significantly improve the mechanical and tribological properties of composite films.The effects of negative bias voltage on film properties were also put forward.The optimal negative bias voltage was -200 V under this experiment conditions.The obtained composite films were dense,the adhesion strength was about 60 N,the thickness was about 2.4 μm,and the micro-hardness was about 9.0 GPa.The friction coefficient and wear rate was 0.12 and 2.1×10-7 cm3/N·m respectively after 60 m sliding operation against hardened steel under a load of 20 N and a sliding speed of 200 rev·min-1.展开更多
The nonuniform Yb-Er Codoped Al2O3 films were prepared on SiO2/Si substrates using a medium frequency magnetron sputtering system. Two asymmetry targets in the system were introduced to realize the nonuniform dopant. ...The nonuniform Yb-Er Codoped Al2O3 films were prepared on SiO2/Si substrates using a medium frequency magnetron sputtering system. Two asymmetry targets in the system were introduced to realize the nonuniform dopant. Some curves of Photoluminescence （PL） peak intensity were obtained by adjusting the deposition parameters, such as, the pillar number of erbium and ytterbium in the mixed target and the distance between a sample table and targets. Typically, the curve of PL peak intensity against the offset distance was approximately linear. The ratio of the PL intensity at the two ends of the same sample was 12.6 and the slope was 71.83/mm when the pillar numbers of the erbium and ytterbium in the mixed target are 5 and 60, respectively, and the distance between targets and the sample table is 2.9 cm.展开更多
基金the National Nature Science Foundation of China (Nos. 50771046 and 20373016) the Natural Science Foundation of Guangdong Province (No. 05200534)the Key Projects of Guangdong Province and Guangzhou City, China (Nos. 2006A10704003 and 2006Z3-D2031)
文摘A tin film of 320 nm in thickness on Cu foil and its composite film with graphite of-50 nm in thickness on it were fabricated by magnetron sputtering. The surface morphology, composition, surface distributions of alloy elements, and lithium intercalation/de-intercalation behaviors of the fabricated films were characterized by X-ray diffraction （XRD）, scanning electron microscopy （SEM）, electron probe microanalyzer （EPMA）, X-ray photoelectron spectroscopy （XPS）, inductively coupled plasma atomic emission spectrometry （ICP）, cyclic voltammetry （CV）, and galvanostatic charge/discharge （GC） measurements. It is found that the lithium intercalation/de-intercalation behavior of the Sn film can be significantly improved by its composite with graphite. With cycling, the discharge capacity of the Sn film without composite changes from 570 mAh/g of the 2nd cycle to 270 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 90% and 95%. Nevertheless, the discharge capacity of the composite Sn/C film changes from 575 mAh/g of the 2nd cycle to 515 mAh/g of the 20th cycle, and its efficiency for the discharge and charge is between 95% and 100%. The performance improvement of tin by its composite with graphite is ascribed to the retardation of the bulk tin cracking from volume change during lithium intercalation and de-intercalation, which leads to the pulverization of tin.
文摘This article mainly deals with the preparation and properties of PZTthin films. A new type of Metal-Me tal Oxide composite target was developed. Relating factors have been discussed. The electrical and optical properties of PZT thin films have also been studied.
基金supported by the National Natural Science Foundation of China under Grant Nos.51271191,51571205 and 51401209
文摘Polycrystalline Cr2AlC coatings were prepared on M38G superalloy using a two-step method consisting of magnetron sputtering from Cr-Al-C composite targets at room temperature and subsequent annealing at 620 ℃. Particularly, various targets synthesized by hot pressing mixture of Cr, Al, and C powders at 650-1000 ℃ were used. It was found that regardless of the phase compositions and density of the com- posite targets, when the molar ratio of Cr：Al：C in the starting materials was 2：1：1, phase-pure crystalline Cr2AlC coatings were prepared by magnetron sputtering and post crystallization. The Cr2AIC coatings were dense and crack-free and had a duplex structure. The adhesion strength of the coating deposited on M38G superalloy from the 800 ℃ hot-pressed target and then annealed at 620 ℃ for 20 h in Ar exceeded 82 ± 6 MPa, while its hardness was 12 ± 3 GPa.
基金financially supported by the National Natural Science Foundation of China (Nos. 51372109 and 51502126)the Foundation of Educational Department of Liaoning (No. L2015260)the Open Subject of Key Laboratory Liaoning Province (No. USTLKFSY201501)
文摘Transparent conductive oxide ZnSnO3 films were prepared by radio-frequency magnetron sputtering from powder targets and were characterized by X-ray photoelectron spectroscopy, X-ray diffraction, transmission electron microscopy, atomic force microscopy, surface profile, UV-Vis spectroscopy, and Hall effect. The structures of the films were either amorphous or nanocrystalline depending on sputtering parameters including deposition time, target power, chamber pressure, and the target-substrate separation. The average transmittance of the ZnSnO3 films within the visible wavelength was approximately 80% and the resistivity of the ZnSnO3 films was in the range of 10^-3-10^-4 Ω cm. The structural, optical, and electrical properties of the ZnSnO3 films could be adjusted and regulated by optimizing the sputtering process, allowing materials with specific properties to be designed.
基金Funded by the National Natural Science Foundation of China (No.51075237)the National Basic Research Program of China (No.2009CB724402)+3 种基金the Taishan Scholar Program of Shandong Provincethe Outstanding Young Scholar Science Foundation of Shandong (No.JQ200917)the National Natural Science Foundation of Shandong (No.ZR2010EZ002)National High Technology Research and Development Program (No.2009AA044303)
文摘MoS2/Zr composite films were deposited on the cemented carbide YT14 （WC＋14%TiC＋6%Co） by medium-frequency magnetron sputtered and coupled with multi-arc ion plated techniques.The influence of negative bias voltage on the composite film properties,including adhesion strength,micro-hardness,thickness and tribological properties were investigated.The results showed that proper negative bias voltage could significantly improve the mechanical and tribological properties of composite films.The effects of negative bias voltage on film properties were also put forward.The optimal negative bias voltage was -200 V under this experiment conditions.The obtained composite films were dense,the adhesion strength was about 60 N,the thickness was about 2.4 μm,and the micro-hardness was about 9.0 GPa.The friction coefficient and wear rate was 0.12 and 2.1×10-7 cm3/N·m respectively after 60 m sliding operation against hardened steel under a load of 20 N and a sliding speed of 200 rev·min-1.
基金supported by the National Natural Science Foundation of China(Grant No:10274018)the Foundation of Hebei Provincial Education Department(Grant No:002013)the Key Foundation of Hebei Normal University(Grant No:120203).
基金Project supported by the National Natural Science Foundation of China (60477023)the Natural Science Foundation of Science and Tech-nology Commission of Liaoning Province (20062137)
文摘The nonuniform Yb-Er Codoped Al2O3 films were prepared on SiO2/Si substrates using a medium frequency magnetron sputtering system. Two asymmetry targets in the system were introduced to realize the nonuniform dopant. Some curves of Photoluminescence （PL） peak intensity were obtained by adjusting the deposition parameters, such as, the pillar number of erbium and ytterbium in the mixed target and the distance between a sample table and targets. Typically, the curve of PL peak intensity against the offset distance was approximately linear. The ratio of the PL intensity at the two ends of the same sample was 12.6 and the slope was 71.83/mm when the pillar numbers of the erbium and ytterbium in the mixed target are 5 and 60, respectively, and the distance between targets and the sample table is 2.9 cm.
