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Crystallization Kinetics of NiTi Films with Different Ni Contents 被引量:1
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作者 Xunyong JIANG, Huibin XU and Shengkai GONG Department of Materials Science and Engineering, Beijing University of Aeronautics and Astronautics, Beijing 100083, China 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2001年第4期421-424,共4页
Three kinds of NiTi films with different Ni contents were prepared by DC magnetron sputtering. The crystallization kinetics of amorphous films was determined by using non-isothermal single- scan techniques. The result... Three kinds of NiTi films with different Ni contents were prepared by DC magnetron sputtering. The crystallization kinetics of amorphous films was determined by using non-isothermal single- scan techniques. The results show that the activation energy of crystallization of Ni-rich NiTi film(Ni 51.10 at. pct, Ti 48.90 at. pct) is 715 kJ/mol; while that of Ti-rich films are similar: one is 445 kJ/mol (Ni 46.74 at. pct. Ti 53.26 at. pct), the other is 418 kJ/mol (Ni 43.21 at. pct, Ti 56.7g at. pct), which i5 lower than Ni-rich film. The Avrami parameter n of different films are 0.92 and 0.74 for Ni-rich film and Ti-rich films, respectively. The difference of kinetic parameters for NiTi films with various Ni contents implies that the crystallization behaviors of these films are distinct, which is confirmed by the calculated isothermal kinetics at different temperatures. The thorough research on this phenomenon is in progress. 展开更多
关键词 niti Crystallization Kinetics of niti Films with Different Ni contents
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