Cu x S thin films are implanted by low energy N + ion beam. The influences of the energy and dose of N + ion implantation on Cu x S films are investigated. The results show that the ratio of copper to sulfur is increa...Cu x S thin films are implanted by low energy N + ion beam. The influences of the energy and dose of N + ion implantation on Cu x S films are investigated. The results show that the ratio of copper to sulfur is increased to some extent, the constituents of the film are turned to rich copper phase from rich sulfurous phase after ion beam irradiation. X-ray diffraction spectrum and optical transmission spectra of sample have confirmed the results.展开更多
Isothermal and cyclic oxidizing behavior of Co-40Cr alloy and its lanthanum ion-implanted samples were studied at 1000 °C in the air by thermal-gravimetric analysis (TGA). Scanning electronic microscopy (SEM) and...Isothermal and cyclic oxidizing behavior of Co-40Cr alloy and its lanthanum ion-implanted samples were studied at 1000 °C in the air by thermal-gravimetric analysis (TGA). Scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine the morphology and structure of oxide film after oxidation. Secondary ion mass spectrum (SIMS) method was used to examine the binding energy change of chromium caused by La-doping and its influence on the formation of Cr2O3 film. Laser Raman spectrum was used to examine the stress changes within the oxide film. It was found that lanthanum implantation remarkably reduced isothermal oxidizing rate of Co-40Cr and improved anti-cracking and anti-spalling properties of Cr2O3 oxide film. The reasons for the improvement were mainly that the implanted lanthanum reduced the grain size and internal stress of Cr2O3 oxide and increased high temperature plasticity of the oxide film. Lanthanum mainly existed on the outer surface of Cr2O3 oxide film in the form of fine La2O3 and LaCrO3 spinel particles.展开更多
Ti-Cu films with different Cu concentrations were fabricated by high-power pulsed magnetron sputtering(HPPMS) to release copper ions and catalyze NO to improve the blood compatibility. The Cu concentrations of films w...Ti-Cu films with different Cu concentrations were fabricated by high-power pulsed magnetron sputtering(HPPMS) to release copper ions and catalyze NO to improve the blood compatibility. The Cu concentrations of films were 25.7 at% and 68.8 at%. Pure Ti films were also fabricated. Copper release, catalytic release of nitric oxide(NO), and blood platelet adhesion of Ti-Cu films were studied. Ti-Cu films released copper ions in PBS solution and more Cu ions were released from films with 68.8 at% Cu. Ti-Cu films had excellent ability of catalytical decomposition of exogenous donor S-nitroso-N-acetyl-DL-penicillamine(SNAP) and as a result, nitric oxide(NO) was generated. The NO generation catalyzed by Ti-Cu films was significantly higher than that by pure Ti films. This was more eminent in the Ti-Cu films with 68.8 at% Cu. The platelet adhesion and activation of Ti-Cu films were significantly inhibited compared to that of pure Ti films in the presence of SNAP. The Ti-Cu film fabricated by HPPMS showed the ability of releasing Cu ions to catalyze SNAP to generate NO to inhibit platelet adhesion and activation.展开更多
文摘Cu x S thin films are implanted by low energy N + ion beam. The influences of the energy and dose of N + ion implantation on Cu x S films are investigated. The results show that the ratio of copper to sulfur is increased to some extent, the constituents of the film are turned to rich copper phase from rich sulfurous phase after ion beam irradiation. X-ray diffraction spectrum and optical transmission spectra of sample have confirmed the results.
基金the National Natural Science Foundation of China (29231011)the Natural Science Foundation of Jiangsu Province (07KJD430246)
文摘Isothermal and cyclic oxidizing behavior of Co-40Cr alloy and its lanthanum ion-implanted samples were studied at 1000 °C in the air by thermal-gravimetric analysis (TGA). Scanning electronic microscopy (SEM) and transmission electronic microscopy (TEM) were used to examine the morphology and structure of oxide film after oxidation. Secondary ion mass spectrum (SIMS) method was used to examine the binding energy change of chromium caused by La-doping and its influence on the formation of Cr2O3 film. Laser Raman spectrum was used to examine the stress changes within the oxide film. It was found that lanthanum implantation remarkably reduced isothermal oxidizing rate of Co-40Cr and improved anti-cracking and anti-spalling properties of Cr2O3 oxide film. The reasons for the improvement were mainly that the implanted lanthanum reduced the grain size and internal stress of Cr2O3 oxide and increased high temperature plasticity of the oxide film. Lanthanum mainly existed on the outer surface of Cr2O3 oxide film in the form of fine La2O3 and LaCrO3 spinel particles.
基金Funded by the National Natural Science Foundation of China(No.31300787)the National Natural Science Foundation of China China Academy of Engineering Physics(NSAF No.U1330113)+1 种基金the Overseas Famous Teacher Program of Chinese Education Ministry(MS2010XNJT070)the Qingmiao Plan of SWJTU 2015(No.A0920502051517-6)
文摘Ti-Cu films with different Cu concentrations were fabricated by high-power pulsed magnetron sputtering(HPPMS) to release copper ions and catalyze NO to improve the blood compatibility. The Cu concentrations of films were 25.7 at% and 68.8 at%. Pure Ti films were also fabricated. Copper release, catalytic release of nitric oxide(NO), and blood platelet adhesion of Ti-Cu films were studied. Ti-Cu films released copper ions in PBS solution and more Cu ions were released from films with 68.8 at% Cu. Ti-Cu films had excellent ability of catalytical decomposition of exogenous donor S-nitroso-N-acetyl-DL-penicillamine(SNAP) and as a result, nitric oxide(NO) was generated. The NO generation catalyzed by Ti-Cu films was significantly higher than that by pure Ti films. This was more eminent in the Ti-Cu films with 68.8 at% Cu. The platelet adhesion and activation of Ti-Cu films were significantly inhibited compared to that of pure Ti films in the presence of SNAP. The Ti-Cu film fabricated by HPPMS showed the ability of releasing Cu ions to catalyze SNAP to generate NO to inhibit platelet adhesion and activation.
基金Project(9231083) supported by Yunnan Aerospace Industry Corporation Contract Research,ChinaProject(9220061) supported by City University of Hong Kong Donation Research Grant,China
文摘本文介绍的动态离子束混合技术制备氧化铬薄膜系在不锈钢基体上进行1keV氩离子束溅射沉积铬(同时通入一定量的O),并用100keV的氩离子束或氧离子束轰击该样品。对两种离子束轰击形成的氧化铬薄膜进行了X射线光电子能谱(X-ray photoelectron spectroscopy,XPS)和俄歇电子能谱(Auger electron spectroscopy,AES)的分析研究。发现Ar+离子束制备的氧化铬薄膜主要是Cr2O3化合物,而O+离子束制备的氧化铬薄膜含有其它价态的铬氧化物。Ar+离子束制备氧化铬薄膜的污染碳少于O+离子束制备。与O+离子束制备相比较,相同能量的Ar+离子束轰击更有利于提高沉积的Cr原子与周围O2的反应性;Ar+离子束制备的氧化铬薄膜过渡层的厚1/3左右,较厚的过渡层显示了制备的薄膜具有较好的附着力。
