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Electromagnetic–thermal–structural coupling analysis of the ITER edge localized mode coil with flexible supports
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作者 张善文 宋云涛 +3 位作者 汤淋淋 王忠伟 戢翔 杜双松 《Plasma Science and Technology》 SCIE EI CAS CSCD 2017年第5期91-96,共6页
In a fusion reactor, the edge localized mode(ELM) coil has a mitigating effect on the ELMs of the plasma. The coil is placed close to the plasma between the vacuum vessel and the blanket to reduce its design power a... In a fusion reactor, the edge localized mode(ELM) coil has a mitigating effect on the ELMs of the plasma. The coil is placed close to the plasma between the vacuum vessel and the blanket to reduce its design power and improve its mitigating ability. The coil works in a high-temperature,high-nuclear-heat and high-magnetic-field environment. Due to the existence of outer superconducting coils, the coil is subjected to an alternating electromagnetic force induced by its own alternating current and the outer magnetic field. The design goal for the ELM coil is to maintain its structural integrity in the multi-physical field. Taking as an example the middle ELM coil(with flexible supports) of ITER(the International Thermonuclear Fusion Reactor), an electromagnetic–thermal–structural coupling analysis is carried out using ANSYS. The results show that the flexible supports help the three-layer casing meet the static and fatigue design requirements. The structural design of the middle ELM coil is reasonable and feasible. The work described in this paper provides the theoretical basis and method for ELM coil design. 展开更多
关键词 fusion reactor ELM coil electromagnetic–thermal–structural coupling analysis flexible support
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The effect of discharge conditions of ICP etching reactor on plasma parameters
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作者 Yijia Lu Yaosong Chen Yiran An LTCS, College of Engineering, Peking University,100871 Beijing, China 《Acta Mechanica Sinica》 SCIE EI CAS CSCD 2009年第6期769-776,共8页
This study investigated the inductively coupled plasma etching reactor and RF coils developed by North Microelectronic Corporation. Full three dimensional simulations were made at different discharge conditions. The s... This study investigated the inductively coupled plasma etching reactor and RF coils developed by North Microelectronic Corporation. Full three dimensional simulations were made at different discharge conditions. The simulations examined and compared the distribution and non-uniformity of several plasma parameters at a fixed position upon the wafer at different pressures and coil currents. These parameters included electron density, electron temperature and power deposition. The results demonstrate that the electron density, power deposition and uniformity increase with either higher pressure or stronger coil currents, while the electron temperature decreases at this condition. Coil number increase can reduce the non-uniformity of parameters in the spatial distribution. The linear relationship between power deposition and electron density does not always exist. The comparison between simulation results and experiment results is also presented in the paper. 展开更多
关键词 Inductively coupled plasma. Electron densityElectron temperature ~ Power deposition - RF coils
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