High-Quality Bi_2Te_3 Single Crystalline Films on Flexible Substrates and Bendable Photodetectors

Recently, great efforts have been made in the fabrication of arbitrary warped devices to satisfy the requirement of wearable and lightweight electronic products. Direct growth of high crystalline quality films on flexible substrates is the most desirable method to fabricate flexible devices owing to the advantage of simple and compatible preparation technology with current semiconductor devices, while it is a very challenging work, and usually amorphous, polycrystalline or discontinuous single crystalline films are achieved. Here we demonstrate the direct growth of high-quality Bi2 Te3 single crystalline films on flexible polyimide substrates by the modified hot wall epitaxy technique. Experimental results reveal that adjacent crystallites are coherently coalesced to form a continuous film, although amounts of disoriented crystallites are generated due to fast growth rate. By inserting a quartz filter into the growth tube, the number density of disoriented crystallites is effectively reduced owing to the improved spiral interaction. Furthermore, flexible Bi2 Te3 photoconductors are fabricated and exhibit strong near-infrared photoconductive response under different degrees of bending, which also confirms the obtained fexible films suitable for electronic applications.

Columnar growth of crystalline silicon films on aluminium-coated glass by inductively coupled plasma CVD at room temperature

Silicon films were grown on aluminium-coated glass by inductively coupled plasma CVD at room temperature using a mixture of SiH4 and H2 as the source gas. The microstructure of the films was evaluated using Raman spectroscopy, scanning electron microscopy and atomic force microscopy. It was found that the films are composed of columnar grains and their surfaces show a random and uniform distribution of silicon nanocones. Such a microstructure is highly advantageous to the application of the films in solar cells and electron emission devices. Field electron emission measurement of the films demonstrated that the threshold field strength is as low as -9.8V/μm and the electron emission characteristic is reproducible. In addition, a mechanism is suggested for the columnar growth of crystalline silicon films on aluminium-coated glass at room temperature.

Influence of reducing anneal on the ferromagnetism in single crystalline Co-doped ZnO thin films

This paper reports that the high-quality Co-doped ZnO single crystalline films have been grown on a-plane sapphire substrates by using molecular-beam epitaxy. The as-grown films show high resistivity and non-ferromagnetism at room temperature, while they become more conductive and ferromagnetic after annealing in the reducing atmosphere either in the presence or absence of Zn vapour. The x-ray absorption studies indicate that all Co ions in these samples actually substituted into the ZnO lattice without formatting any detectable secondary phase. Compared with weak ferromagnetism （0.16 μB/Co2＋） in the Zno.95 Co0.05 O single crystalline film with reducing annealing in the absence of Zn vapour, the films annealed in the reducing atmosphere with Zn vapour are found to have much stronger ferromagnetism （0.65 μB/Co2＋） at room temperature. This experimental studies clearly indicate that Zn interstitials are more effective than oxygen vacancies to activate the high-temperature ferromagnetism in Co-doped ZnO films, and the corresponding ferromagnetic mechanism is discussed.

Structural and electrical properties of single crystalline and bi-crystalline ZnO thin films grown by molecular beam epitaxy

C-oriented ZnO epitaxial thin films are grown separately on the a-plane and c-plane sapphire substrates by using a molecular-beam epitaxy technique. In contrast to single crystalline ZnO films grown on a-plane sapphire, the films grown on c-plane sapphire are found to be bi-crystalline; some domains have a 30~ rotation to reduce the large mismatch between the film and the substrate. The presence of these rotation domains in the bi-crystalline ZnO thin film causes much more carrier scatterings at the boundaries, leading to much lower mobility and smaller mean free path of the mobile carriers than those of the single crystalline one. In addition, the complex impedance spectra are also studied to identify relaxation mechanisms due to the domains and/or domain boundaries in both the single crystalline and bi-crystalline ZnO thin films.

Effect of Pre-heating Temperature on Structural and Optical Properties of Sol-gel Derived Zn_(0.8)Cd_(0.2)O Thin Films

Zn_（0.8）Cd_（0.2）O thin films prepared using the spin-coating method were investigated. X-ray diffraction, scanning electron microscopy, and UV-Vis spectrophotometry were employed to illustrate the effects of the pre-heating temperature on the crystalline structure, surface morphology and transmission spectra of Zn_（0.8）Cd_（0.2）O thin films. When the thin films were pre-heated at 150 ℃, polycrystalline Zn O thin films were obtained. When the thin films were pre-heated at temperatures of 200 ℃ or higher, preferential growth of Zn O nanocrystals along the c-axis was observed. Transmission spectra showed that thin films with high transmission in the visible light range were prepared and effective bandgap energies of these thin films decreased from 3.19 e V to 3.08 e V when the pre-heating temperature increased from 150 ℃ to 300 ℃.

Study on device simulation and performance optimization of the epitaxial crystalline silicon thin film solar cell

Because crystalline silicon thin film （CSiTF） solar cells possess the advantages of crystalline silicon solar cells such as high ef- ficiency and stable performance and those of thin film solar cells such as low cost and so on, it is regarded as the next genera- tion solar cell technology, which is most likely to replace the existing crystalline silicon solar cell technology. In this paper, we performed device simulation on the epitaxial CSiTF solar cell by using PCI D software. In order to make simulation results closer to the actual situation, we adopted a more realistic device structure and parameters. On this basis, we comprehensively and systematically investigated the effect of physical parameters of back surface field （BSF） layer, base and emitter, electrical quality of crystalline silicon active layer, situation of surface passivation, internal recombination and p-n junction leakage on the optoelectronic performance of the epitaxial CSiTF solar cell. Among various factors affecting the efficiency of the epitaxial CSiTF solar cell, we identified the three largest efficiency-affecting parameters. They are the base minority carrier diffusion length, the diode dark saturation current and the front surface recombination velocity in order. Through simulations, we found that the base is not the thicker the better, and the base minority carrier diffusion length must be taken into account when deter- mining the optimal base thickness. When the base minority carrier diffusion length is smaller, the optimal base thickness should be less than or equal to the base minority carrier diffusion length; when the base minority carrier diffusion length is larger, the base minority carrier diffusion length should be at least twice the optimal base thickness. In addition, this paper not only illustrates the simulation results but also explains their changes from the aspect of physical mechanisms. Because epitaxi- al CSiTF solar cells possess a device structure that is similar to crystalline silicon solar cells, the conclusions drawn in this pa- per are also applied to crystalline silicon solar cells to a certain extent, particularly to thin silicon solar cells which are the hot- test research topic at present.

Large area crystalline Weyl semimetal with nano Au film based micro-fold line array for THz detector

The advancement of 6G technology relies on the development of high-performance terahertz detectors that can operate at room temperature.These detectors are crucial for Internet of Things(Io T)applications,which require sensitive environmental sensing and efficient reception of 6G signals.One significant research focus is on detection technology with high responsiveness and low equivalent noise power for 6G signals,which experience high losses in the air.To meet the demand for ultra-sensitive detectors in 6G technology,we have employed several techniques.Firstly,we prepared a large area of Weyl-semimetal layer through magnetron sputtering.Secondly,we obtained a high-quality Weyl-semimetal active layer by carefully controlling the annealing conditions.Next,a thin nano-Au layer was introduced as a micro-cavity reflection layer to enhance the device's detection rate.Additionally,we incorporated an electromagnetic induction well to improve carrier confinement and enhance the detection sensitivity.This proposed high-performance terahertz detector,with its potential for industrial production,offers a valuable technical solution for the advancement of 6G technology.

Artificial synaptic and self-rectifying properties of crystalline(Na_(1-x)K_(x))NbO_(3)thin films grown on Sr_(2)Nb_(3)O_(10)nanosheet seed layers

Crystalline(Na_(1-x)K_(x))NbO_(3)(NKN)thin films were deposited on Sr_(2)Nb_(3)O_(10)/TiN/Si(S-TS)substrates at 370°C.Sr_(2)Nb_(3)O_(10)(SNO)nanosheets served as a template for the formation of crystalline NKN films at low temperatures.When the NKN film was deposited on one SNO monolayer,the NKN memristor exhibited normal bipolar switching characteristics,which could be attributed to the formation and destruction of oxygen vacancy filaments.Moreover,the NKN memristor with one SNO monolayer exhibited artificial synaptic properties.However,the NKN memristor deposited on two SNO monolayers exhibited self-rectifying bipolar switching properties,with the two SNO monolayers acting as tunneling barriers in the memristor.The conduction mechanism of the NKN memristor with two SNO monolayers in the highresistance state is attributed to Schottky emission,direct tunneling,and Fowler–Nordheim(FN)tunneling.The current conduction in this memristor in the low-resistance state was governed by direct tunneling and FN tunneling.Additionally,the NKN memristor with two SNO monolayers exhibited large ON/OFF and rectification ratios and artificial synaptic properties.Therefore,an NKN memristor with two SNO monolayers can be used for fabricating artificial synaptic devices with a cross-point array structure.

Solution-processed top-contact electrodes strategy for organic crystalline field-effect transistor arrays

Organic crystals,especially ultra-thin two-dimensional(2D)ones such as monolayer molecular crystals,are fragile and vulnerable to traditional vacuum deposition.Up to now,most of the methods reported for fabricating organic field-effect transistors(OFETs)with top-electrodes on the 2D molecular crystals are based on mechanical-transfer method.Nondestructive method for large scale in-situ electrode deposition is urgent.In this work,the silver mirror reaction(SMR)is introduced to construct top-contact electrodes on 2D organic crystalline thin films.OFETs based on bilayer crystalline films with solution-processed silver electrodes show comparable performance to devices with transferred gold electrodes.In addition to that,OFETs with SMR fabricated silver electrodes show lower contact resistance than the ones with evaporated silver electrodes.Furthermore,the temperature under which SMR electrodes annealed is relatively low(60℃),making this approach applicable to varies of organic semiconductors,such as spin-coated polymer films,vacuum evaporated films,2D and even monolayer crystalline films.Besides,OFETs with sub-micrometer channel width and 25μm channel length are realized which might find practical application in the ultra-small pixel mini/micro-LEDs.

Synthesis and characterization of C_3N_4 crystal ( Ⅰ )——Growth on silicon

A successful experimental synthesis of pure crystalline β-and α-C3N4 films on Si( 100) substrate was carried out by bias-assisted hot filament chemical vapor deposition (bias-HFCVD). It is found that a mixed-phase C3-x-Six-Ny buffer layer was formed between the Si substrate and the C-N film. A "lattice match selection" was proposed to study the growth mechanism of C3N4 clusters composed of many crystal columns with hexagonal facets.