Mechanical properties of Al/a-C nanocomposite thin films synthesized using a plasma focus device

The Al/a-C nanocomposite thin films are synthesized on Si substrates using a dense plasma focus device with alu- minum fitted anode and operating with CH4/Ar admixture. X-ray diffractometer results confirm the formation of metallic crystalline Al phases using different numbers of focus shots. Raman analyses show the formation of D and G peaks for all thin film samples, confirming the presence of a-C in the nanocomposite thin films. The formation of Al/a-C nanocomposite thin films is further confirmed using X-ray photoelectron spectroscopy analysis. The scanning electron microscope results show that the deposited thin films consist of nanoparticles and their agglomerates. The sizes of th agglomerates increase with increasing numbers of focus deposition shots. The nanoindentation results show the variations in hardness and elastic modulus values of nanocomposite thin film with increasing the number of focus shots. Maximum values of hardness and elastic modulus of the composite thin film prepared using 20 focus shots are found to be about 10.7 GPa and 189.2 GPa, respectively.

Scaling Laws for Plasma Focus Machines from Numerical Experiments

Numerical experiments carried out systematically using the Lee Model code unveil insightful and practical wide-ranging scaling laws for plasma focus machines for nuclear fusion energy as well as other applications. An essential feature of the numerical experiments is the fitting of a measured current waveform to the computed waveform to calibrate the model for the particular machine, thus providing a reliable and rigorous determination of the all-important pinch current. The thermodynamics and radiation properties of the resulting plasma are then reliably determined. This paper provides an overview of the recently published scaling laws for neutron (Yn) and neon soft x-ray, SXR (Ysxr) yields: Yn = 3.2x1011 Ipinch4.5;Yn = 1.8x1010 Ipeak3.8;Ipeak (0.3 to 5.7), Ipinch (0.2 to 2.4) in MA. Yn^E02.0 at tens of kJ to Yn^E00.84 at MJ level (up to 25MJ) and Ysxr = 8.3x103 Ipinch3.6;Ysxr = 6x102 Ipeak3.2;Ipeak (0.1 to 2.4), Ipinch (0.07 to1.3) in MA. Ysxr^E01.6 (kJ range) to Ysxr^E00.8 (towards MJ).

Structural and mechanical properties of Al–C–N films deposited at room temperature by plasma focus device

The Al–C–N films are deposited on Si substrates by using a dense plasma focus（DPF） device with aluminum fitted central electrode（anode） and by operating the device with CH_4/N_2 gas admixture ratio of 1：1. XRD results verify the crystalline Al N（111） and Al_3CON（110） phase formation of the films deposited using multiple shots. The elemental compositions as well as chemical states of the deposited Al–C–N films are studied using XPS analysis, which affirm Al–N, C–C, and C–N bonding. The FESEM analysis reveals that the deposited films are composed of nanoparticles and nanoparticle agglomerates. The size of the agglomerates increases at a higher number of focus deposition shots for multiple shot depositions. Nanoindentation results reveal the variation in mechanical properties（nanohardness and elastic modulus）of Al–C–N films deposited with multiple shots. The highest values of nanohardness and elastic modulus are found to be about 11 and 185 GPa, respectively, for the film deposited with 30 focus deposition shots. The mechanical properties of the films deposited using multiple shots are related to the Al content and C–N bonding.

稠密等离子体焦点装置研制

研制了一台用作脉冲中子源的稠密等离子体焦点装置(DPF),其放电室为Mather型结构。介绍了整个装置的工作原理及系统组成,详细论述了放电室的设计方法。实验结果表明,在550～600Pa充氘压力范围下,当储能电容充电电压大于19kV时,装置的平均中子产额大于5.0×108(D-D)中子/脉冲,中子脉冲宽度(FWHM)为(40±5)ns。该装置能用于中子、伽马辐射诊断中探测系统灵敏度实验研究,也可用于开展快中子照相、中子活化分析以及单粒子效应等方面的研究工作。

DPF脉冲中子源中子产额的活化测量研究

活化测量是等离子体焦点 (DPF)中子源的窄脉冲、高注量率中子辐射产额的有效测量方法。为提高活化探测器的测量精度 ,采用了散射中子的屏蔽措施。详细讨论了探测器的标定方法 ,用饱和照射后截止的方法 ,在加速器中子源上给出了 3个探测距离下的标定曲线和标定系数。对标定中的物理问题 ,如探测器死时间对其测量范围的影响、银的两种衰变对标定结果的影响等进行了分析。估计了主要测量误差 。