In this work, diamond-like-carbon （DLC） films were deposited onto polycarbonate （PC） substrates by radio-frequency plasma-enhanced cheraical vapor deposition （RF PECVD）, and silicon films were prepared between D...In this work, diamond-like-carbon （DLC） films were deposited onto polycarbonate （PC） substrates by radio-frequency plasma-enhanced cheraical vapor deposition （RF PECVD）, and silicon films were prepared between DLC and PC substrates by magnetron sputtering deposition so as to improve the adhesion of the DLC films. The deposited films were investigated by means of field-emission scanning electron microscopy （FE-SEM）, X-ray photoelectron spectroscopy （XPS） and Raman spectroscopy. Subsequently, the following frictional and optical properties of the films were measured： the friction coefficient by using a ball-on-disk tribometer, the scratch hardness by using a nano-indenter, the optical transmittance by using a UV/visible spectrometer. The effects of incident power upon the frictional and optical properties of the films were investigated. Films deposited at low incident powers showed large optical gaps, which decreased with increasing incident power. The optical properties of DLC films correlated to the sp^2 content of the coatings. High anti-scratch properties were obtained at higher values of incident power. The anti-scratch properties of DLC films correlated to the sp^3 content of the coatings.展开更多
高速钢表面类金刚石(diamond-like carbon,DLC)薄膜的沉积效率和膜-基结合力影响其在切削刀具领域的应用。基于空心阴极原理,利用等离子体增强化学气相沉积(plasma-enhanced chemical vapor deposition,PECVD)的方法,在体积比为1∶3的CH...高速钢表面类金刚石(diamond-like carbon,DLC)薄膜的沉积效率和膜-基结合力影响其在切削刀具领域的应用。基于空心阴极原理,利用等离子体增强化学气相沉积(plasma-enhanced chemical vapor deposition,PECVD)的方法,在体积比为1∶3的CH_(4)和C_(2)H_(2)的混合气体中加入N_(2)在高速钢表面制备类金刚石薄膜,研究了N_(2)体积分数对DLC薄膜结合力和耐磨性的影响。结果表明:掺氮可提高DLC薄膜的沉积效率,改善膜结构。随着N_(2)体积分数的增加,DLC薄膜中sp^(3)键含量和摩擦因数均先增大后减小。掺10%体积分数N_(2)的DLC薄膜厚度达1543 nm,膜-基结合力等级从HF4提高到HF2,摩擦因数降至0.139,耐磨性提高。展开更多
围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控...围绕压阻传感器领域对高性能类金刚石(Diamond Like Carbon,DLC)薄膜压阻敏感材料的需求,针对金属掺杂DLC存在的载流子输运行为和实际多工况(如温度、湿度等)下压阻性能不明的问题,本工作以Ti-石墨复合拼接靶为靶材,采用高功率脉冲磁控溅射技术,高通量制备出4种Ti含量(原子分数为0.43%~4.11%)的Ti掺杂类金刚石(Ti-DLC)薄膜,研究了Ti含量对薄膜组分结构、电学性能、变湿度环境下压阻性能的影响规律。结果表明:Ti含量(原子分数)在0.43%~4.11%范围内,掺杂Ti原子均以固溶形式均匀镶嵌于非晶碳网络中,Ti-DLC薄膜电学行为表现为典型半导体特性,在200~350 K温度范围内,薄膜电阻率均随温度升高而降低。载流子传导机制在200~270 K内为Mott型三维变程跳跃传导,在270~350 K范围内则为热激活传导。Ti-DLC薄膜压阻系数(Gauge Factor,GF)最大值为95.1,在20%~80%相对湿度范围内,所有样品GF均随湿度增加而增大,这可能是引入的固溶Ti原子缩短了导电相之间的平均距离,同时吸附表面水分子导致电阻变化。展开更多
目的研究硅(Si)、氧(O)元素掺杂对类金刚石(Diamond like Carbon,DLC)薄膜沉积、结构、表面形貌以及阻隔性能的影响,为高效制备高阻隔硅氧共掺类金刚石(Si and O Incorporated DLC,Si/O-DLC)薄膜提供新的思路参考。方法利用微波等离子...目的研究硅(Si)、氧(O)元素掺杂对类金刚石(Diamond like Carbon,DLC)薄膜沉积、结构、表面形貌以及阻隔性能的影响,为高效制备高阻隔硅氧共掺类金刚石(Si and O Incorporated DLC,Si/O-DLC)薄膜提供新的思路参考。方法利用微波等离子体化学气相沉积(Plasma Enhanced Chemical Vapor Deposition,PECVD)技术在聚对苯二甲酸乙二醇酯(Polyethylene terephthalate,PET)基底表面沉积Si/O-DLC薄膜,具体研究反应单体中六甲基二硅氧烷(Hexaethyldisiloxane,HMDSO)含量对薄膜沉积和阻隔性能的影响。通过台阶仪、傅里叶红外光谱(FTIR)、X射线光电子能谱(XPS)、原子力显微镜(AFM)表征薄膜厚度、结构和微观形貌,并通过测试氧气透过率表征复合薄膜的阻隔性能。结果随着混合气体中HMDSO含量增加,薄膜的沉积速率提高,不同高度位置上沉积速率波动变弱,平均沉积速率最高达到310 nm·min^(–1),同时,薄膜中Si、O元素含量增加,相关的键合结构含量增加,薄膜表面致密性变差,氧气阻隔性能变弱;当HMDSO流量控制在1 mL·min^(–1)时,PET薄膜的氧气透过率可从未涂覆时的132mL·m^(2)·d^(–1)降低至2mL·m^(2)·d^(-1),阻隔性能明显改善。结论在一定工艺条件下,通过微波PECVD技术在PET薄膜表面涂覆Si/O-DLC薄膜,可明显改善其阻隔性能。展开更多
基金supported by China Postdoctoral Science Foundation Funded Project (Nos. 20100481209 and 201104569)a Grant (20120101220) from Liaoning Province of China+1 种基金a Grant (F11-264-1-74) from Shenyang City of Chinasupported by the Fundamental Research Funds for the Central Universities, China (No. N110403002)
文摘In this work, diamond-like-carbon （DLC） films were deposited onto polycarbonate （PC） substrates by radio-frequency plasma-enhanced cheraical vapor deposition （RF PECVD）, and silicon films were prepared between DLC and PC substrates by magnetron sputtering deposition so as to improve the adhesion of the DLC films. The deposited films were investigated by means of field-emission scanning electron microscopy （FE-SEM）, X-ray photoelectron spectroscopy （XPS） and Raman spectroscopy. Subsequently, the following frictional and optical properties of the films were measured： the friction coefficient by using a ball-on-disk tribometer, the scratch hardness by using a nano-indenter, the optical transmittance by using a UV/visible spectrometer. The effects of incident power upon the frictional and optical properties of the films were investigated. Films deposited at low incident powers showed large optical gaps, which decreased with increasing incident power. The optical properties of DLC films correlated to the sp^2 content of the coatings. High anti-scratch properties were obtained at higher values of incident power. The anti-scratch properties of DLC films correlated to the sp^3 content of the coatings.
文摘目的研究硅(Si)、氧(O)元素掺杂对类金刚石(Diamond like Carbon,DLC)薄膜沉积、结构、表面形貌以及阻隔性能的影响,为高效制备高阻隔硅氧共掺类金刚石(Si and O Incorporated DLC,Si/O-DLC)薄膜提供新的思路参考。方法利用微波等离子体化学气相沉积(Plasma Enhanced Chemical Vapor Deposition,PECVD)技术在聚对苯二甲酸乙二醇酯(Polyethylene terephthalate,PET)基底表面沉积Si/O-DLC薄膜,具体研究反应单体中六甲基二硅氧烷(Hexaethyldisiloxane,HMDSO)含量对薄膜沉积和阻隔性能的影响。通过台阶仪、傅里叶红外光谱(FTIR)、X射线光电子能谱(XPS)、原子力显微镜(AFM)表征薄膜厚度、结构和微观形貌,并通过测试氧气透过率表征复合薄膜的阻隔性能。结果随着混合气体中HMDSO含量增加,薄膜的沉积速率提高,不同高度位置上沉积速率波动变弱,平均沉积速率最高达到310 nm·min^(–1),同时,薄膜中Si、O元素含量增加,相关的键合结构含量增加,薄膜表面致密性变差,氧气阻隔性能变弱;当HMDSO流量控制在1 mL·min^(–1)时,PET薄膜的氧气透过率可从未涂覆时的132mL·m^(2)·d^(–1)降低至2mL·m^(2)·d^(-1),阻隔性能明显改善。结论在一定工艺条件下,通过微波PECVD技术在PET薄膜表面涂覆Si/O-DLC薄膜,可明显改善其阻隔性能。
