Photorefractive properties of Hf：Fe：LiNbO3 crystals with various [Li]/[Nb] ratios have been investigated at 488 nm wavelength based on the two-wave coupling experiment. High diffraction efficiency and large recordin...Photorefractive properties of Hf：Fe：LiNbO3 crystals with various [Li]/[Nb] ratios have been investigated at 488 nm wavelength based on the two-wave coupling experiment. High diffraction efficiency and large recording sensitivity are observed and explained. The decrease in Li vacancies is suggested to be the main contributor to the increase in the photoconductivity and subsequently to the induction of the improvement of recording sensitivity. The saturation diffraction efficiency is measured up to 80.2%, and simultaneously the recording sensitivity of 0.91 cm/J is achieved to in the Hf：Fe：LiNbO3 crystal grown from the melt with the [Li]/[Nb] ratio of 1.20, which is significantly enhanced as compared with those of the Hf：Fe：LiNbO3 crystal with the [Li]/[Nb] ratio of 0.94 in melt under the same experimental conditions. Experimental results definitely show that increasing the [Li]/[Nb] ratio in crystal is an effective method＇for Hf：Fe：LiNbO3 crystal to improve its photorefractive properties.展开更多
为了提高晶体的响应速度和抗光散射能力,利用光致双折射和二波耦合实验,系统地研究了488 nm波长下Hf4+掺杂浓度为阈值摩尔分数4.0%的Hf∶Fe∶LiN b O3晶体中[Li]/[Nb]的变化对其抗光损伤能力和光折变性能的影响。研究结果表明,随着[Li]/...为了提高晶体的响应速度和抗光散射能力,利用光致双折射和二波耦合实验,系统地研究了488 nm波长下Hf4+掺杂浓度为阈值摩尔分数4.0%的Hf∶Fe∶LiN b O3晶体中[Li]/[Nb]的变化对其抗光损伤能力和光折变性能的影响。研究结果表明,随着[Li]/[Nb]比的增加,晶体的抗光损伤能力有所减弱,而晶体的光折变性能有了明显提高。与[Li]/[Nb]为0.946的Hf∶Fe∶LiNb O3晶体相比,[Li]/[Nb]为1.200的Hf∶Fe∶LiN b O3晶体的全息光栅衍射效率饱和值增大到80.2%,响应时间缩短到19.7 s,记录灵敏度提高到0.91 cm/J。展开更多
基金supported by the Fundamental Research Foundation of Commission of Science Technology,Industry for National Defense of China (Grant No.2320060089)and National Basic Research and Development Program of China (Grant No.2007CB3070001)Program of Excellent Team in Harbin Institute of Technology,China
文摘Photorefractive properties of Hf：Fe：LiNbO3 crystals with various [Li]/[Nb] ratios have been investigated at 488 nm wavelength based on the two-wave coupling experiment. High diffraction efficiency and large recording sensitivity are observed and explained. The decrease in Li vacancies is suggested to be the main contributor to the increase in the photoconductivity and subsequently to the induction of the improvement of recording sensitivity. The saturation diffraction efficiency is measured up to 80.2%, and simultaneously the recording sensitivity of 0.91 cm/J is achieved to in the Hf：Fe：LiNbO3 crystal grown from the melt with the [Li]/[Nb] ratio of 1.20, which is significantly enhanced as compared with those of the Hf：Fe：LiNbO3 crystal with the [Li]/[Nb] ratio of 0.94 in melt under the same experimental conditions. Experimental results definitely show that increasing the [Li]/[Nb] ratio in crystal is an effective method＇for Hf：Fe：LiNbO3 crystal to improve its photorefractive properties.
文摘为了提高晶体的响应速度和抗光散射能力,利用光致双折射和二波耦合实验,系统地研究了488 nm波长下Hf4+掺杂浓度为阈值摩尔分数4.0%的Hf∶Fe∶LiN b O3晶体中[Li]/[Nb]的变化对其抗光损伤能力和光折变性能的影响。研究结果表明,随着[Li]/[Nb]比的增加,晶体的抗光损伤能力有所减弱,而晶体的光折变性能有了明显提高。与[Li]/[Nb]为0.946的Hf∶Fe∶LiNb O3晶体相比,[Li]/[Nb]为1.200的Hf∶Fe∶LiN b O3晶体的全息光栅衍射效率饱和值增大到80.2%,响应时间缩短到19.7 s,记录灵敏度提高到0.91 cm/J。
