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Atomic layer deposition of ultrathin layered TiO_2 on Pt/C cathode catalyst for extended durability in polymer electrolyte fuel cells
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作者 Sangho Chung Myounghoon Choun +2 位作者 Beomgyun Jeong Jae Kwang Lee Jaeyoung Lee 《Journal of Energy Chemistry》 SCIE EI CAS CSCD 2016年第2期256-262,共7页
This study shows the preparation of a TiO2 coated Pt/C(TiO2/Pt/C) by atomic layer deposition(ALD),and the examination of the possibility for TiO2/Pt/C to be used as a durable cathode catalyst in polymer electrolyt... This study shows the preparation of a TiO2 coated Pt/C(TiO2/Pt/C) by atomic layer deposition(ALD),and the examination of the possibility for TiO2/Pt/C to be used as a durable cathode catalyst in polymer electrolyte fuel cells(PEFCs). Cyclic voltammetry results revealed that TiO2/Pt/C catalyst which has 2 nm protective layer showed similar activity for the oxygen reduction reaction compared to Pt/C catalysts and they also had good durability. TiO2/Pt/C prepared by 10 ALD cycles degraded 70% after 2000 Accelerated degradation test, while Pt/C corroded 92% in the same conditions. TiO2 ultrathin layer by ALD is able to achieve a good balance between the durability and activity, leading to TiO2/Pt/C as a promising cathode catalyst for PEFCs. The mechanism of the TiO2 protective layer used to prevent the degradation of Pt/C is discussed. 展开更多
关键词 Polymer electrolyte hydrogen fuel cells Atomic layer deposition Gas diffusion layer Protective layer Titanium dioxide
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A Novel Duplex Low-temperature Chromizing Process at 500℃ 被引量:3
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作者 Huiliang CAO Cuilan WU +2 位作者 Jiangwen LIU Chengping LUO Ganfeng ZOU 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2007年第6期823-827,共5页
An optimized low-temperature chromizing process at 500℃ was realized on a plain medium-carbon steel with 0.45 wt pct carbon via a duplex chromizing process which consists of a precursor plasma nitriding, and a follow... An optimized low-temperature chromizing process at 500℃ was realized on a plain medium-carbon steel with 0.45 wt pct carbon via a duplex chromizing process which consists of a precursor plasma nitriding, and a followed salt bath thermoreactive deposition and diffusion (TRD) chromizing process. CrN layer with a thin diffusion layer underneath was formed. The duplex chromizing process was studied by optical microscopy (OM), scanning electron microscopy (SEM), energy dispersive X-ray spectroscopy (EDS), X-ray diffraction (XRD), and transmission electron microscopy (TEM). It was found that the chromizing speed at 500℃ was successfully enhanced by adding more Cr-Fe powders into the salt bath, and the CrN layer formed at the cost of the prior nitride compound layer. A CrN layer with average 8.1/~m in thickness and 1382 HV0.01 in microhardness was formed on the substrate by duplex chromizing at 500℃ for 24 h. Further more, the CrN layer consisted of nanocrystalline CrN grains. 展开更多
关键词 Chromizing Plasma nitriding Thermoreactive deposition and diffusion (TRD) CRN
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Scaling relation of domain competition on(2+1)-dimensional ballistic deposition model with surface diffusion
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作者 Kenyu Osada Hiroyasu Katsuno +1 位作者 Toshiharu Irisawa Yukio Saito 《Journal of Semiconductors》 EI CAS CSCD 2016年第9期12-17,共6页
During heteroepitaxial overlayer growth multiple crystal domains nucleated on a substrate surface compete with each other in such a manner that a domain covered by neighboring ones stops growing.The number density of ... During heteroepitaxial overlayer growth multiple crystal domains nucleated on a substrate surface compete with each other in such a manner that a domain covered by neighboring ones stops growing.The number density of active domains ρ decreases as the height h increases.A simple scaling argument leads to a scaling law of ρ~ h^(-γ) with a coarsening exponent γ=d/z,where d is the dimension of the substrate surface and z the dynamic exponent of a growth front.This scaling relation is confirmed by performing kinetic Monte Carlo simulations of the ballistic deposition model on a two-dimensional(d=2) surface,even when an isolated deposited particle diffuses on a crystal surface. 展开更多
关键词 domain competition ballistic deposition model Kardar-Parisi-Zhang universality class surface diffusion
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