A new method solution for the direct displacement of parallel mechanism, wavelet network method, is proposed. Comparing with the classical analytical and numerical methods, this method can be extended to any parallel ...A new method solution for the direct displacement of parallel mechanism, wavelet network method, is proposed. Comparing with the classical analytical and numerical methods, this method can be extended to any parallel mechanism with any selected degree of freedom and configuration. A wavelet network suiting to approach multi-input and multi-output system is constructed. The network is optimized by analyzing the sparseness of input data and selecting the fitting wavelets by orthogonalization method according to the output data. Then it is applied to solve the direct displace- ment of a general six-degree-of-freedom parallel mechanism as a numerical example. For comparison purposes, a BP neural network is also used for this problem. Simulation results show that the wavelet network performs better than BP neural network. In addition, the wavelet network learns much faster than BP network.展开更多
Direct laser writing(DLW)enables arbitrary three-dimensional nanofabrication.However,the diffraction limit poses a major obstacle for realizing nanometer-scale features.Furthermore,it is challenging to improve the fab...Direct laser writing(DLW)enables arbitrary three-dimensional nanofabrication.However,the diffraction limit poses a major obstacle for realizing nanometer-scale features.Furthermore,it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems,which cannot perform high-throughput lithography.To overcome these challenges,a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study,based on two-photon polymerization DLW.The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures.The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.展开更多
This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. ...This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. When the substrate shifts, a reference grating next to the substrate is used to adjust in real time the phase of the exposure interference fringes relative to the substrate. Shifting eliminates the exposure defects and therefore decreases the stray light of gratings. Several gratings are successfully made by using this method, which have straighter grooves,smoother surfaces, and lower stray light than gratings made in conventional interference lithography.展开更多
文摘A new method solution for the direct displacement of parallel mechanism, wavelet network method, is proposed. Comparing with the classical analytical and numerical methods, this method can be extended to any parallel mechanism with any selected degree of freedom and configuration. A wavelet network suiting to approach multi-input and multi-output system is constructed. The network is optimized by analyzing the sparseness of input data and selecting the fitting wavelets by orthogonalization method according to the output data. Then it is applied to solve the direct displace- ment of a general six-degree-of-freedom parallel mechanism as a numerical example. For comparison purposes, a BP neural network is also used for this problem. Simulation results show that the wavelet network performs better than BP neural network. In addition, the wavelet network learns much faster than BP network.
基金the National Key Research and Development Program of China(Grant No.2021YFF0502700)the National Natural Science Foundation of China(Grant Nos.62105298,52105565,and 22105180)+2 种基金China Postdoctoral Science Foundation(Grant Nos.2020M671823 and 2020M681956)the Natural Science Foundation of Zhejiang Province,China(Grant Nos.LD21F050002,LQ22F050017,and LQ22F050015)the Major Scientific Project of Zhejiang Lab,China(Grant No.2020MC0AE01).
文摘Direct laser writing(DLW)enables arbitrary three-dimensional nanofabrication.However,the diffraction limit poses a major obstacle for realizing nanometer-scale features.Furthermore,it is challenging to improve the fabrication efficiency using the currently prevalent single-focal-spot systems,which cannot perform high-throughput lithography.To overcome these challenges,a parallel peripheral-photoinhibition lithography system with a sub-40-nm two-dimensional feature size and a sub-20-nm suspended line width was developed in our study,based on two-photon polymerization DLW.The lithography efficiency of the developed system is twice that of conventional systems for both uniform and complex structures.The proposed system facilitates the realization of portable DLW with a higher resolution and throughput.
基金supported by the National Natural Science Foundation of China under Grant No.51427805
文摘This research proposes a simple and practical method to make low-stray-light gratings, where the substrate shifts about a 1 mm distance in the direction parallel or perpendicular to the exposure interference fringes. When the substrate shifts, a reference grating next to the substrate is used to adjust in real time the phase of the exposure interference fringes relative to the substrate. Shifting eliminates the exposure defects and therefore decreases the stray light of gratings. Several gratings are successfully made by using this method, which have straighter grooves,smoother surfaces, and lower stray light than gratings made in conventional interference lithography.
