A low-threshold and high-power oxide-confined 850-nm AlInGaAs strained quantum-well （QW） vertical-cavity surface-emitting laser （VCSEL） based on an intra-cavity contacted structure is fabricated. A threshold curre...A low-threshold and high-power oxide-confined 850-nm AlInGaAs strained quantum-well （QW） vertical-cavity surface-emitting laser （VCSEL） based on an intra-cavity contacted structure is fabricated. A threshold current of 1.5 mA for a 22 μm oxide aperture device is achieved, which corresponds to a threshold current density of 0.395 kA/cm2. The peak output optical power reaches 17.5 mW at an injection current of 30 mA at room temperature under pulsed opera- tion. While under continuous-wave （CW） operation, the maximum power attains 10.5 mW. Such a device demonstrates a high characteristic temperature of 327 K within a temperature range from -12°C to 96 °C and good reliability under a lifetime test. There is almost no decrease of the optical power when the device operates at a current of 5 mA at room temperature under the CW injection current.展开更多
Polarization-stable 980 nm oxide-confined vertical-cavity surface-emitting lasers with 3 μm diamond-shaped aper- ture are fabricated by comprehensively utilizing the anisotropic properties of wet etching and wet nitr...Polarization-stable 980 nm oxide-confined vertical-cavity surface-emitting lasers with 3 μm diamond-shaped aper- ture are fabricated by comprehensively utilizing the anisotropic properties of wet etching and wet nitrogen oxida- tion of Ⅲ-Ⅴ semiconductor materials. Polarization-stable operation along the major axis of the diamond-shaped oxide aperture with 11 dB orthogonal polarization suppression ratio is achieved in a temperature range of 15-55℃ from the threshold to 4 mA.展开更多
Taking into account oxidation temperature, N2 carrier gas flow, and the geometry of the mesa structures this paper investigates the characteristics of selective oxidation during the fabrication of the vertical cavity ...Taking into account oxidation temperature, N2 carrier gas flow, and the geometry of the mesa structures this paper investigates the characteristics of selective oxidation during the fabrication of the vertical cavity surface emitting laser （VCSEL） in detail. Results show that the selective oxidation follows a law which differs from any reported in the literature. Below 435℃ selective oxidation of Al0.98Ga0.02As follows a linear growth law for the two mesa structures employed in VCSEL. Above 435℃ approximately increasing parabolic growth is found, which is influenced by the geometry of the mesa structures. Theoretical analysis on the difference between the two structures for the initial oxidation has been performed, which demonstrates that the geometry of the mesa structures does influence on the growth rate of oxide at higher temperatures.展开更多
Vertical cavity surface emitting lasers（VCSELs） are widely used in optical communications and optical interconnects due to their advantages of low threshold, low power consumption and so on. Wet nitrogen oxidation t...Vertical cavity surface emitting lasers（VCSELs） are widely used in optical communications and optical interconnects due to their advantages of low threshold, low power consumption and so on. Wet nitrogen oxidation technology, which utilizes H20 molecules to oxidize the Al;Ga;As, is used for electrical and optical mode confinement. In this paper, the effects of oxidation time, oxidation temperature and oxidation anisotropy on the oxidation rate are explored and demonstrated. The ratio of oxidation rate on [0-11] to [011] crystal orientation is defined as oxidation anisotropy coefficient, which decreases with the increase of oxidation temperature and oxidation time. In order to analyze the effect of the oxidation anisotropy on the VCSEL performance, an oxide-aperture of the VCSELs with two difference shapes is designed and then fabricated. The static performance of these fabricated VCSELs has been measured,whose threshold current ratio ～0.714 is a good agreement with that of the theoretical calculation value ～0.785. Our research on wet nitrogen oxidation and its anisotropy serves as an important reference in the batch fabrication of large-area VCSELs.展开更多
基金Project supported by the National Natural Science Foundation of China (Grant Nos.60908012 and 61076148)the Foundation of Beijing Municipal Education Commission,China (Grant No.KM201010005030)
文摘A low-threshold and high-power oxide-confined 850-nm AlInGaAs strained quantum-well （QW） vertical-cavity surface-emitting laser （VCSEL） based on an intra-cavity contacted structure is fabricated. A threshold current of 1.5 mA for a 22 μm oxide aperture device is achieved, which corresponds to a threshold current density of 0.395 kA/cm2. The peak output optical power reaches 17.5 mW at an injection current of 30 mA at room temperature under pulsed opera- tion. While under continuous-wave （CW） operation, the maximum power attains 10.5 mW. Such a device demonstrates a high characteristic temperature of 327 K within a temperature range from -12°C to 96 °C and good reliability under a lifetime test. There is almost no decrease of the optical power when the device operates at a current of 5 mA at room temperature under the CW injection current.
基金Supported by the National Natural Science Foundation of China under Grant Nos 61222501 and 61335004the Specialized Research Fund for the Doctoral Program of Higher Education of China under Grant No 20111103110019
文摘Polarization-stable 980 nm oxide-confined vertical-cavity surface-emitting lasers with 3 μm diamond-shaped aper- ture are fabricated by comprehensively utilizing the anisotropic properties of wet etching and wet nitrogen oxida- tion of Ⅲ-Ⅴ semiconductor materials. Polarization-stable operation along the major axis of the diamond-shaped oxide aperture with 11 dB orthogonal polarization suppression ratio is achieved in a temperature range of 15-55℃ from the threshold to 4 mA.
文摘Taking into account oxidation temperature, N2 carrier gas flow, and the geometry of the mesa structures this paper investigates the characteristics of selective oxidation during the fabrication of the vertical cavity surface emitting laser （VCSEL） in detail. Results show that the selective oxidation follows a law which differs from any reported in the literature. Below 435℃ selective oxidation of Al0.98Ga0.02As follows a linear growth law for the two mesa structures employed in VCSEL. Above 435℃ approximately increasing parabolic growth is found, which is influenced by the geometry of the mesa structures. Theoretical analysis on the difference between the two structures for the initial oxidation has been performed, which demonstrates that the geometry of the mesa structures does influence on the growth rate of oxide at higher temperatures.
基金Project supported by the National Natural Science Foundation of China(Nos.61335004,61675046,61505003)the Open Fund of IPOC2017B011(BUPT)
文摘Vertical cavity surface emitting lasers（VCSELs） are widely used in optical communications and optical interconnects due to their advantages of low threshold, low power consumption and so on. Wet nitrogen oxidation technology, which utilizes H20 molecules to oxidize the Al;Ga;As, is used for electrical and optical mode confinement. In this paper, the effects of oxidation time, oxidation temperature and oxidation anisotropy on the oxidation rate are explored and demonstrated. The ratio of oxidation rate on [0-11] to [011] crystal orientation is defined as oxidation anisotropy coefficient, which decreases with the increase of oxidation temperature and oxidation time. In order to analyze the effect of the oxidation anisotropy on the VCSEL performance, an oxide-aperture of the VCSELs with two difference shapes is designed and then fabricated. The static performance of these fabricated VCSELs has been measured,whose threshold current ratio ～0.714 is a good agreement with that of the theoretical calculation value ～0.785. Our research on wet nitrogen oxidation and its anisotropy serves as an important reference in the batch fabrication of large-area VCSELs.
