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Determination of Plasma Parameters in a Dual-Frequency Capacitively Coupled CF_4 Plasma Using Optical Emission Spectroscopy
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作者 刘文耀 朱爱民 +4 位作者 李小松 赵国利 陆文琪 徐勇 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2013年第9期885-890,共6页
Optical emission spectroscopy measurements of dual-frequency capacitively coupled CF4 plasmas were carried out. The gas temperature (Tg) was acquired by fitting the optical emission spectra of a CF B-X system in 201... Optical emission spectroscopy measurements of dual-frequency capacitively coupled CF4 plasmas were carried out. The gas temperature (Tg) was acquired by fitting the optical emission spectra of a CF B-X system in 201~206 nm. The atomic fluorine concentration and the electron temperature (Te) were obtained by trace rare gas optical emission spectroscopy and a modified Boltzmann plot technique, respectively. It was found that the gas temperature was about 620±30 K at 50 mTorr and the atomic fluorine concentration increased while the electron temperature decreased with increasing gas pressure and power of high frequency (60 MHz). With increasing low frequency (2 MHz) power, the electron temperature also increased, but the atomic fluorine concentration was insensitive to this change. The generation and disappearance mecha- nisms of F atoms are discussed. 展开更多
关键词 dual-frequency capacitively coupled plasma (df ccp) gas temperature elec-tron temperature fluorine atom concentration
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