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E-beam degradation of thiamphenicol and florfenicol 被引量:3
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作者 Zhou Jiaxin Wu Minghong +3 位作者 Xu Gang Ma Jing Wang Liang Liu Ning 《Nuclear Science and Techniques》 SCIE CAS CSCD 2010年第6期334-338,共5页
Thiamphenicol(THA) and florfenicol(FLO) aqueous solutions were irradiated to different doses by 1 MeV electron beams,and redox reactions of THA/FLO and radicals of OH,e_(eq)^- and ~·H were investigated under vari... Thiamphenicol(THA) and florfenicol(FLO) aqueous solutions were irradiated to different doses by 1 MeV electron beams,and redox reactions of THA/FLO and radicals of OH,e_(eq)^- and ~·H were investigated under various conditions.The results showed that at 8 kGy,the decomposition rate of THA and FLO was 97.2%and 98.5%, respectively.Quantitative and qualitative analysis indicated that OH played a key role in E-beam degradation of the THA and FLO in aqueous solutions,and e_(eq)^- and ~·H radicals could initiate the degradation,too.Seven primary products of the THA and FLO degradation were identified.These indicate that E-beam radiation is an effective method to reduce THA and FLO in aqueous solutions. 展开更多
关键词 电子束辐射 氟苯尼考 甲砜霉素 降解 氧化还原反应 水溶液 自由基 分解率
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E-beam radiolysis of aqueous dimethyl phthalate solution 被引量:3
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作者 LIU Ning XU Gang MA Jing TANG Liang YUAN Qing WANG Liang BAI Yulei WU Minghong 《Nuclear Science and Techniques》 SCIE CAS CSCD 2011年第1期35-38,共4页
To investigate the influence of radiolysis on kinetics and factors of dimethyl phthalate(DMP),the aqueous DMP solution is degraded by 1.8 MeV E-beam,following pseudo-first-order kinetics.The rate constant of DMP degra... To investigate the influence of radiolysis on kinetics and factors of dimethyl phthalate(DMP),the aqueous DMP solution is degraded by 1.8 MeV E-beam,following pseudo-first-order kinetics.The rate constant of DMP degradation decreased exponentially with increasing initial DMP concentration.The DMP is favorably degraded by radical scavengers under its low concentration and alkaline condition.At high doses,the DMP is attacked by eaq-and ·OH,producing monomethyl phthalate,phthalate acid,and a series of aliphatic carboxylic acids,which are completelymineralized into H2O and CO2. 展开更多
关键词 邻苯二甲酸二甲酯 电子束 一级动力学 辐解 自由基清除剂 DMP 脂肪族羧酸
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Electron-beam induced degradation of bisphenol A 被引量:1
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作者 XU Gang REN Hua WU Ming-Hong LIU Ning YUAN Qing TANG Liang WANG Liang 《Nuclear Science and Techniques》 SCIE CAS CSCD 2011年第5期277-281,共5页
E-beam degradation of bisphenol A(BPA) was carried out,under reductive condition of ethanol-water solution and oxidative condition of acetonitrile-water solution.The degradation efficiency is higher in oxidative condi... E-beam degradation of bisphenol A(BPA) was carried out,under reductive condition of ethanol-water solution and oxidative condition of acetonitrile-water solution.The degradation efficiency is higher in oxidative condition than that in reductive condition,and increases with the dose but decreased with increasing initial concentration.The BPA radiolysis follows the pseudo-first-order kinetics.Adding H_2O_2,or neutral condition,does not benefit BPA degradation in oxidative conditions.Pulsed radiolysis was used to investigate mechanism of the BPA radiolysis.The rate constant for BPA reaction with OH(1.85×10^(10) L·mor^(-1)·s^(-1)) is about an order of magnitude higher than that with e_(aq)^-(1.80×l0~9 L·mor^(-1)·s^(-1)).The degradation products were analyzed by ion chromatograph.Smaller molecules such as formic acid and acetic acid were detected,indicating that ^-OH attacks the BPA molecule.The work is of significance for the practical E-beam treatment of waste water containing BPA. 展开更多
关键词 电子束诱导 降解效率 双酚A 乙醇水溶液 氧化条件 反应速率常数 还原条件 一级动力学
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Hydrogen and Ozone SAW Based Gas Sensors with RF Magnetron Sputtered InO_x and Electron Beam Evaporated SiN_y 被引量:1
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作者 A.C.Fechete A.Wisitsora-at +3 位作者 W.Wlodarskil K.Kalantar-zadeh S.Kandasamy A.S.Holland 《稀有金属材料与工程》 SCIE EI CAS CSCD 北大核心 2006年第A03期206-209,共4页
Layered Surface Acoustic Wave (SAW) devices with an InO_x/SiN_u/36°YX LiTaO_3 structure were investigated for sensing low concentrations of hydrogen (H_2) and ozone (O_3) at different operating temperatures.The s... Layered Surface Acoustic Wave (SAW) devices with an InO_x/SiN_u/36°YX LiTaO_3 structure were investigated for sensing low concentrations of hydrogen (H_2) and ozone (O_3) at different operating temperatures.The sensor consists of a 1μm thick silicon nitride (SiN_y) intermediate layer deposited by electron beam evaporation on a 36°Y-cut X-propagating piezoelectric lithium tantalate (LiTaO_3) substrate and a 100 nm thin indium oxide (InO_x) sensing layer deposited by R.F.magnetron sputtering.The device fabrication is described and the performance of the sensor is analyzed in terms of response magnitude as a function of operating temperature.Large frequency shifts of 360 kHz for 600μg/g of H_2 and 92 kHz for 40 ng/g O_3 were recorded.In addition,the surface morphology of the deposited films were investigated by Atomic Force Microscopy (AFM) and the chemical composition by X-Ray Photoelectron Spectroscopy (XPS) to correlate gas-sensing behavior to structural characteristics of the thin film. 展开更多
关键词 SAW gas sensors e-beam evaporated SiN_y InO_x O3 H2
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Electron Beam Guns for High Energy Electron Accelerators: An Overview 被引量:1
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作者 Munawar Iqbal Ghalib Ul Islam +1 位作者 Muhammad Ayub Faridi Zusheng Zhou 《Journal of Modern Physics》 2013年第11期1536-1539,共4页
Thermionic electron beam is a fundamental part of all types of linear accelerators around the world in the field of Experimental High Energy Physics. Thermionic beam is very inexpensive and simple to produce. In this ... Thermionic electron beam is a fundamental part of all types of linear accelerators around the world in the field of Experimental High Energy Physics. Thermionic beam is very inexpensive and simple to produce. In this work, we give an overview of generation, design and applications of the electron beam with particular reference to e-beam generation at high energy linear accelerators. Experimental data are presented in tabular form for ready reference. We also make an evaluation of these high energy sources with our in-house designed e-beam gun. Finally, a comparison has been presented in terms of characteristic parameters of all these high performance sources. 展开更多
关键词 e-beam GUNS LINAC eMITTANCe beam Current
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Investigation on the Effect of Film Thickness on the Surface Morphology, Electrical and Optical Properties of E-Beam Deposited Indium Tin Oxide (ITO) Thin Film 被引量:1
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作者 Golam Saklayen Shahinul Islam +1 位作者 Ferdous Rahman Abu Bakar Ismail 《Advances in Materials Physics and Chemistry》 2014年第10期194-202,共9页
The following article has been retracted due to the fact that the authors practise fraud. The scientific community takes a very strong view on this matter, and the Advances in Materials Physics and Chemistry treats al... The following article has been retracted due to the fact that the authors practise fraud. The scientific community takes a very strong view on this matter, and the Advances in Materials Physics and Chemistry treats all unethical behavior seriously. This paper published in Vol. 4 No. 10 194-202, 2014 has been removed from this site. ? Title: Investigation on the Effect of Film Thickness on the Surface Morphology, Electrical and Optical Properties of E-Beam Deposited Indium Tin Oxide (ITO) Thin Film ? Authors: Golam Saklayen, Shahinul Islam, Ferdous Rahman, Abu Bakar 展开更多
关键词 e-beam Deposition Surface Morphology Thin Films eDX ATOMIC Force MICROSCOPY SeM ANNeALING electrical and Optical Properties
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Effects of Different Titanium Sub-oxide on the Properties of Titanium Dioxide Thin Films Prepared by E-beam Evaporation Deposition with Ion Auxiliary
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作者 郭爱云 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2006年第2期101-104,共4页
TiO2 thin films were prepared with Ti2O3, Ti3O5 and TiO2 as raw materials, by electron-beam evaporation deposition, using O^2- ion beam ( O2 purity up to 99.99% ) as auxiliary means. The crystal structures of the sa... TiO2 thin films were prepared with Ti2O3, Ti3O5 and TiO2 as raw materials, by electron-beam evaporation deposition, using O^2- ion beam ( O2 purity up to 99.99% ) as auxiliary means. The crystal structures of the samples were inspected by the X-ray diffraction (XRD) method, and the evaporation character of warious raw materials was analyzed. Transmittance spectra were measured through a U-3310 spectrophotometer ( wavelength ranging from 200 nm to 900 nm). The refractive index n and the thickness of films were determined from transmission spectra. The experimental results show that the thin films taking Ti2O3 as their raw material have a strong absorption, when taking Ti3O5 and TiO2 as raw materials, the thin films would have good optical properties. The experiments also show that, the crystal structure of all thin films is amorphous before post-annealing and the Ti3O5 is a congruent evaporation phase in the Ti-O system. 展开更多
关键词 titanium sub-oxide thin film e-beam evaporation IAD
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Fabrication of Al/AlO_x/Al junctions using pre-exposure technique at 30-keV e-beam voltage
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作者 兰栋 薛光明 +3 位作者 刘强 谭新生 于海峰 于扬 《Chinese Physics B》 SCIE EI CAS CSCD 2016年第8期443-446,共4页
We fabricate high-quality A1/A1Ox/A1 junctions using improved bridge and bridge-free techniques at 30-keV e-beam voltage,in which the length of undercut and the size of junction can be well controlled by the pre-expos... We fabricate high-quality A1/A1Ox/A1 junctions using improved bridge and bridge-free techniques at 30-keV e-beam voltage,in which the length of undercut and the size of junction can be well controlled by the pre-exposure technique.The dose window is 5 times as large as that used in the usual Dolan bridge technique,making this technique much more robust.Similar results,comparable with those achieved using a 100-keV e-beam writer,are obtained,which indicate that the 30-keV e-beam writer could be an economic choice for the superconducting qubit fabrication. 展开更多
关键词 Josephson junction PRe-eXPOSURe 30-keV e-beam voltage superconducting qubit
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Depolymerization of <i>α</i>- &<i>β</i>-Chitosan by <i>e</i>-Beam Irradiation
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作者 Sueng Hwan Jo Changyong Choi Soo-Kyung Choi 《Journal of Biosciences and Medicines》 2019年第10期72-83,共12页
α- and β-chitosan with molecular weight of 190,000 and 800,000 respectively, were depolymerized by e-beam irradiation with various doses. The radiation yield of scission (Gs) and degradation rate of the chitosans we... α- and β-chitosan with molecular weight of 190,000 and 800,000 respectively, were depolymerized by e-beam irradiation with various doses. The radiation yield of scission (Gs) and degradation rate of the chitosans were identified. The synergistic chemical degradation in the presence of hydrogen peroxide is more effective at lower doses. Mw of β-chitosan was dramatically decreased from 800,000 to 21,030 at the irradiation dose 5 kGy, on the other hand, that of α-chitosan was decreased much more gradually from 190,000 to 36,000. The values of Gs at 10 kGy in the solution without H2O2 and with H2O2 were respectively 6.09 × 10-5 mol/cal and 30.6 × 10-5 mol/cal for α-Chitosan, and 8.18 × 10-5 mol/cal and 43.8 × 10-5 mol/cal for β-chitosan. It was obviously effective on depolymerization by using the combination of e-beam and H2O2. α-Chitosan molecules are likely to adopt a diffuse conformation in the solution and make the different morphologies depending on the concentration. 展开更多
关键词 α- and β-Chitosan CONFORMATION DePOLYMeRIZATION e-beam Irradiation Hydrogen PeROXIDe
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Deposition of Carbon Particulates Surfaces on Zeolites by Electron-Beam Evaporation of Graphite
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作者 Andrew Morgan Joseph Corrao Marcia R. Silva 《Materials Sciences and Applications》 2022年第2期78-90,共13页
Disordered carbon particulates were deposited on the surface of natural acid treated zeolite through graphite evaporation by electron beam to improve adsorption properties of the porous material. This study focuses on... Disordered carbon particulates were deposited on the surface of natural acid treated zeolite through graphite evaporation by electron beam to improve adsorption properties of the porous material. This study focuses on the development of the new material and not on applications. The effect of acid treatment and carbon deposition on the physical properties of the natural material was investigated. The zeolites were characterized via spectroscopic and microscopic methods, thermal analysis, and gas sorption analysis. Analysis revealed that the surface area and volume increased by a factor of ten after the carbon-coating was deposited onto the zeolite surface and indicated that the Si/Al ratio was higher with the acid treated sample. The acid treatment promoted dealumination of the zeolite and increased overall surface area, whereas the carbon coating re-aluminated the zeolite while adding silica back to the main molecular framework, thus increasing crystallinity and thermal stability and further improving the high surface area produced by the acid treatment. 展开更多
关键词 ZeOLITe e-beam evaporation GRAPHITe ADSORPTION Acid Treatment
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E波段矩形环对角双杆行波管的研究
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作者 朱焜 魏望和 丁文豪 《科学技术创新》 2024年第17期221-224,共4页
高功率、宽频带是当前科研人员研究行波管的主流方向,中国工信部最新规定E波段的频率范围在71-76 GHz/81-86 GHz。虽然传统的环圈慢波结构有更高的互作用阻抗,但是当其达到E波段及以上由于其结构特点在现实中难以加工,所以难以实现工作... 高功率、宽频带是当前科研人员研究行波管的主流方向,中国工信部最新规定E波段的频率范围在71-76 GHz/81-86 GHz。虽然传统的环圈慢波结构有更高的互作用阻抗,但是当其达到E波段及以上由于其结构特点在现实中难以加工,所以难以实现工作在E波段,为了提升输出功率,本文设计了E波段矩形环对角双杆慢波结构行波管的研究,对其进行注波互作用模拟仿真和计算,带状电子注采用19.1 kV的电压,电流为0.14 A的条件下,行波管可获得最大400 W的瞬时输出功率,增益为46.02 dB、电子效率15%。 展开更多
关键词 矩形环对角双杆 行波管 注波互作用 e波段
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NEA GaN光电阴极的制备及其应用 被引量:7
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作者 乔建良 常本康 +1 位作者 高有堂 田思 《红外技术》 CSCD 北大核心 2007年第9期524-527,共4页
近年来,随着晶体生长技术的发展,GaN基材料的生长技术与生长工艺取得了重大突破。基于NEA的GaN紫外光电阴极是非常理想的新型紫外光电阴极。本文重点探讨了NEA GaN光电阴极材料的金属有机化学汽相沉积(MOCVD)、分子束外延(MBE)和卤化物... 近年来,随着晶体生长技术的发展,GaN基材料的生长技术与生长工艺取得了重大突破。基于NEA的GaN紫外光电阴极是非常理想的新型紫外光电阴极。本文重点探讨了NEA GaN光电阴极材料的金属有机化学汽相沉积(MOCVD)、分子束外延(MBE)和卤化物汽相外延(HVPE)等主流生长技术的优缺点,介绍了两步生长、横向外延生长及悬空外延技术等新工艺。讨论了GaN光电阴极的性能特点、制备方法以及在紫外光电探测器和电子束平版印刷术领域的应用状况。 展开更多
关键词 NeA GAN 生长技术 电子束平版印刷术 紫外光光电探测器
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应用于PHEMT器件的深亚微米T形栅光刻技术 被引量:3
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作者 谢常青 陈大鹏 +1 位作者 李兵 叶甜春 《微纳电子技术》 CAS 2002年第7期39-42,共4页
PHEMT器件和基于它的高频单片集成电路广泛应用于现代微波/毫米波系统。当PHEMT器件的栅长缩短到足够短的时候,沿着栅宽方向的寄生电阻会影响PHEMT器件的性能。为了解决这个问题,一种具有大截面面积而底部长度却很小的T形栅结构通常被... PHEMT器件和基于它的高频单片集成电路广泛应用于现代微波/毫米波系统。当PHEMT器件的栅长缩短到足够短的时候,沿着栅宽方向的寄生电阻会影响PHEMT器件的性能。为了解决这个问题,一种具有大截面面积而底部长度却很小的T形栅结构通常被用于制作PHEMT器件,因为这种结构可以有效地减少由于栅寄生电阻而引起的晶体管噪声。对几种常用的制作深亚微米T形栅的三种光刻技术即光学光刻、电子束光刻、X射线光刻技术进行了比较分析。对于光学光刻技术,通常需要采用移相和光学邻近效应校正技术,它的制作成本低,但是很难用于制作深亚微米T形栅;对于电子束光刻技术,通常需要采用高灵敏度和低灵敏度的多层胶技术,虽然它的栅长可以制作到非常小,但是它的生产成本非常高,而且它的生产效率非常低;对于X射线光刻技术,它不仅可以用于制作深亚微米T形栅,而且它的生产效率非常高,T形栅的形状可以非常容易控制。 展开更多
关键词 PHeMT器件 光刻技术 T形栅 光学光刻 电子束光刻 X射线 集成电路
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蒸发制备金属薄膜实现MEMS工艺中电互连 被引量:2
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作者 黄磊 陈四海 +4 位作者 何少伟 史锡婷 李敏杰 李毅 易新建 《半导体技术》 CAS CSCD 北大核心 2005年第12期12-14,18,共4页
介绍了利用蒸发方法制备金属薄膜来实现MEMS工艺中的互连,采用剥离方法制作金属互连柱。分别在剥离层为双层AZ5214负胶、聚酰亚胺(ZKPI-305IID)和AZ5214负胶、ENPI剥离胶的情况下,实验并制备了金属Ni互连柱(双层AZ5214金属柱高1.86μm,... 介绍了利用蒸发方法制备金属薄膜来实现MEMS工艺中的互连,采用剥离方法制作金属互连柱。分别在剥离层为双层AZ5214负胶、聚酰亚胺(ZKPI-305IID)和AZ5214负胶、ENPI剥离胶的情况下,实验并制备了金属Ni互连柱(双层AZ5214金属柱高1.86μm,聚酰亚胺(ZKPI-305IID)和AZ5214柱高2.0μm,ENPI柱高1.5μm),都起到了较好的互连作用。 展开更多
关键词 微机电系统 互连 电子束蒸发 剥离技术
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ZEP520正性电子抗蚀剂的工艺研究 被引量:4
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作者 龙世兵 李志刚 +2 位作者 陈宝钦 赵新为 刘明 《微细加工技术》 EI 2005年第1期6-11,16,共7页
详细研究了ZEP520在Si衬底上的对比度、灵敏度、分辨率,并分析了曝光剂量、抗蚀剂厚度对ZEP520线条和圆孔尺寸的影响;同时还初步研究了ZEP520在GaAs衬底上的曝光工艺。实验结果表明,ZEP520的灵敏度远高于PMMA,在Si和GaAs上用ZEP520能分... 详细研究了ZEP520在Si衬底上的对比度、灵敏度、分辨率,并分析了曝光剂量、抗蚀剂厚度对ZEP520线条和圆孔尺寸的影响;同时还初步研究了ZEP520在GaAs衬底上的曝光工艺。实验结果表明,ZEP520的灵敏度远高于PMMA,在Si和GaAs上用ZEP520能分别制作出100nm和130nm宽的细线条,通过预烘GaAs衬底,可以消除ZEP520中的裂纹,因此用ZEP520制作器件或电路中各种细小凹槽图形是十分有利的。 展开更多
关键词 ZeP520抗蚀剂 电子束直写曝光 凹槽图形 分辨率 裂纹
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电子束光刻制备5000line/mm光栅掩模关键技术研究 被引量:2
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作者 朱效立 谢常青 +5 位作者 赵珉 陈宝钦 叶甜春 牛洁斌 张庆钊 刘明 《微细加工技术》 EI 2008年第4期4-5,13,共3页
为了制备高线密度X射线透射光栅掩模,分析了电子束光刻中场拼接对高线密度光栅图形的影响;利用几何校正技术和低灵敏度的950 k的PMMA电子束抗蚀剂,克服了电子束的邻近效应对厚胶图形曝光的影响。采用电子束光刻和微电镀的方法制备了5000... 为了制备高线密度X射线透射光栅掩模,分析了电子束光刻中场拼接对高线密度光栅图形的影响;利用几何校正技术和低灵敏度的950 k的PMMA电子束抗蚀剂,克服了电子束的邻近效应对厚胶图形曝光的影响。采用电子束光刻和微电镀的方法制备了5000 line/mm X射线透射光栅的掩模,并将栅线宽度精确控制在100 nm^110 nm,为X射线光刻复制高线密度X射线透射光栅创造了有利条件。 展开更多
关键词 电子束光刻 X射线透射光栅 邻近效应校正 X射线光刻
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分布串联横向电阻Spindt型FEA的研究 被引量:1
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作者 王炜 李德杰 +1 位作者 姚保纶 张金驰 《微细加工技术》 EI 2000年第2期13-18,共6页
提出了一种新型的分布串联横向电阻Spindt型FEA的制作工艺。通过溅射的办法制备了各层电极、绝缘层以及FEA电阻层。利用磁增强反应离子刻蚀设备 ,刻蚀出Mo薄膜电极图案和直径 1 μm ,深度 1 μm的SiO2 绝缘层圆孔。利用电子束双源蒸发设... 提出了一种新型的分布串联横向电阻Spindt型FEA的制作工艺。通过溅射的办法制备了各层电极、绝缘层以及FEA电阻层。利用磁增强反应离子刻蚀设备 ,刻蚀出Mo薄膜电极图案和直径 1 μm ,深度 1 μm的SiO2 绝缘层圆孔。利用电子束双源蒸发设备 ,蒸发Al和Mo薄膜 ,得到Mo的微尖阵列 ,制成了分布串联横向电阻Spindt型FEA。 展开更多
关键词 Spindt型FeA 分布串联横向电阻 光刻 电子束蒸发
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基于SEM纳米级电子束曝光机的快速束闸设计 被引量:2
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作者 刘俊标 方光荣 +3 位作者 靳鹏云 薛虹 张福安 顾文琪 《电子工业专用设备》 2008年第10期10-13,共4页
基于扫描电镜(SEM)的纳米级电子束曝光系统能够以较低成本满足科研单位对纳米加工设备的需求。在电子束曝光系统中,需要快速束闸控制电子束通断以实现纳米图像的多场曝光。从安装位置、机械结构和驱动器等方面讨论快速束闸的设计。
关键词 电子束曝光 束闸 扫描电子显微镜 图形发生器
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PREVAIL——下一代电子束投影曝光技术 被引量:1
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作者 王云翔 刘明 +3 位作者 陈宝钦 李友 张建宏 张卫红 《微细加工技术》 2002年第2期1-4,共4页
PREVAIL作为下一代电子束投影曝光技术 ,采用可变轴浸没透镜 ,对以硅为支架的碳化硅薄膜进行投影微缩曝光。在 1mm2 子场的情况下 ,运用步进扫描曝光方式 ,在 1 0 0nm临界尺寸下具有较高的产量 ,与EUVL技术一起成为下一代曝光技术的有... PREVAIL作为下一代电子束投影曝光技术 ,采用可变轴浸没透镜 ,对以硅为支架的碳化硅薄膜进行投影微缩曝光。在 1mm2 子场的情况下 ,运用步进扫描曝光方式 ,在 1 0 0nm临界尺寸下具有较高的产量 ,与EUVL技术一起成为下一代曝光技术的有力竞争者。 展开更多
关键词 PReVAIL 电子束投影曝光技术 光学光刻技术 NGL
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环氧树脂E-44的电子束固化研究 被引量:1
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作者 高春玲 郭冬子 谢立青 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2005年第2期346-348,共3页
The critical parameters of electron beam to cure the epoxy resin E-44 were studied. The initiating efficiency of every photoinitiator increases with the increase of the absorbed dose. Diphenyl iodonium hexafluoroantim... The critical parameters of electron beam to cure the epoxy resin E-44 were studied. The initiating efficiency of every photoinitiator increases with the increase of the absorbed dose. Diphenyl iodonium hexafluoroantimonate being the photoinitiator has a higher initiating efficiency, whose optimal quantity is 3%. The curing degree of the system is improved continuously with the increments of the photoinitiator content when the absorbed dose and the dose rate are fixed. The curing degree increases with raising dose rate obviously when the absorbed dose are fixed. 展开更多
关键词 环氧树脂e-44 电子束固化 光引发剂 吸收剂量 剂量率
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