Review on reactive species in water treatment using electrical discharge plasma:formation, measurement, mechanisms and mass transfer

In the electrical discharge plasma process, various chemical and physical processes can participate in the removal of contaminants. In this paper, the chemical and physical processes that occur as a result of the electrical discharge plasma are reviewed, and their possible roles in the degradation of contaminants are discussed. Measurement methods for the quantification of important reactive species and their advantages and shortcomings are presented. Approaches on how to enhance the diffusion of the reactive species in solution are examined. In addition, the formation of typical reactive species in different electrical discharge plasma is compared.

The influence of grounded electrode positions on the evolution and characteristics of an atmospheric pressure argon plasma jet

An atmospheric pressure plasma jet（APPJ） in Ar with various grounded electrode arrangements is employed to investigate the effects of electrode arrangement on the characteristics of the APPJ.Electrical and optical methods are used to characterize the plasma properties.The discharge modes of the APPJ with respect to applied voltage are studied for grounded electrode positions of 10 mm,40 mm and 80 mm,respectively,and the main discharge and plasma parameters are investigated.It is shown that an increase in the distance between the grounded electrode and high-voltage electrode results in a change in the discharge modes and discharge parameters.The discharges transit from having two discharge modes,dielectric barrier discharge（DBD） and jet,to having three,corona,DBD and jet,with increase in the distance from the grounded to the high-voltage electrodes.The maximum length of the APPJ reaches 3.8 cm at an applied voltage of 8 kV.The discharge power and transferred charges and spectral line intensities for species in the APPJ are influenced by the positions of the grounded electrode,while there is no obvious difference in the values of the electron excited temperature（EET） for the three grounded electrode positions.

Removal of Nitrogen Oxides in Diesel Engine Exhaust by Plasma Assisted Molecular Sieves

This paper reports the studies conducted on removal of oxides ofnitrogen (NOx) from diesel engine exhaust using electrical dischargeplasma combined with adsorbing materials such as molecular sieves.This study is being reported for the first time. The exhaust is takenfrom a diesel engine of 6 kW under no load conditions. Thecharacteristic behavior of a pulse energized dielectric barrierdischarge reactor in the diesel exhaust treatment is reported. TheNOx removal was not significant (36/100) when the reactor without anypacking was used.

Synthesis and Characterization of Ultra-fine Si_3N_4 by Electric Arc Plasma

Under conditions of electric-arc low-temperature plasma (LTP), ultra-finely dis- persed Si3N4 particles have been synthesized by using silicon powder and nitrogen as raw materi- als. The prepared samples are characterized by X-ray diffraction (XRD), scanning electron spec- troscopy (SEM), transmission electron microscopy (TEM) and X-ray photoelectron spectroscopy (XPS). The result indicates that the basic phase in Si3N4 produced is α- and β-Si3N4. The particle size of Si3N4 sample is in the range of 30-500 nm.

Effects of O_2 Plasma Treatment on the Chemical and Electric Properties of Low-k SiOF Films

With the progress of ULSI technology, materials with low dielectric constant are required to replace SiO2 film as the interlayer to scale down the interconnection delay. Fluorinated Si oxide thin films (SiOF) are a promising material for the low dielectric constant and the process compatibility in existing technology. However, SiOF films are liable to absorb moisture when exposed to air. By treating the SiOF films with O-2 plasma, it was found that the moisture resistibility of SiOF films was remarkably improved. The mechanism of the improvement in stability of dielectric constant was investigated. The results show that: 1) F atoms dissociated from the films and the bond angle of Si-O-Si decreased. 2) The plasma treatment enhanced the strength of Si-F bonds by removing unstable =SiF2 structures in the films. Resistibility of SiOF films in moisture was improved.

Study of the Formation Conditions of Aluminum Oxide Nanoparticles in an Overstressed Nanosecond Discharge Between Aluminum Electrodes in a Mixture of Nitrogen and Oxygen

The results of the study of oscillograms of voltage,current,pulsed electric power and energy input into the plasma of an overstressed nanosecond discharge between aluminum electrodes in argon and mixtures of nitrogen with oxygen(100-1)at pressures in the range of 13.3-103.3 kPa are presented,the emission plasma spectra are studied.It is shown that in mixtures of nitrogen with oxygen at atmospheric pressure,nanoparticles of aluminum oxide(Al2O3)are formed,the luminescence of which manifests itself in the spectral range of 200-600 nm and which is associated with the formation of F-,F+-centers and more complex aggregate formations based on oxygen vacancies.Calculations of the electron-kinetic coefficients of plasma,transport characteristics,such as mean electron energies in the range 5.116-13.41 eV,are given.The electron concentration was 1.6∙10^(20)m^(-3)-1.1∙10^(20)m^(-3)at a current density of 5.1∙10^(6)A/m^(2)and l.02∙10^(7)A/m^(2)on the surface of the electrode of the radiation source(0.196·10^(-4)m^(2)).Also drift velocities,temperatures and concentrations of electrons,specific losses of the discharge power for elastic and inelastic processes of collisions of electrons per unit of the total concentration of the mixture from the reduced electric field strength(E/N)for a mixture of aluminum,nitrogen,oxygen,rate constants of collisions of electrons with aluminum atoms on the E/N parameter in plasma on a mixture of aluminum vapor,oxygen and nitrogen=30:1000:100000 Pa at a total mixture pressure of P=101030 Pa are given.