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Numerical investigations of an optical switch based on a silicon stripe waveguide embedded with vanadium dioxide layers 被引量:2
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作者 LEI CHEN HAN YE +3 位作者 YUMIN LIU DONG WU RUI MA ZHONGYUAN YU 《Photonics Research》 SCIE EI 2017年第4期335-339,共5页
A novel scheme for the design of an ultra-compact and high-performance optical switch is proposed and investigated numerically. Based on a standard silicon(Si) photonic stripe waveguide, a section of hyperbolic metama... A novel scheme for the design of an ultra-compact and high-performance optical switch is proposed and investigated numerically. Based on a standard silicon(Si) photonic stripe waveguide, a section of hyperbolic metamaterials(HMM) consisting of 20-pair alternating vanadium dioxide (VO_2)∕Si thin layers is inserted to realize the switching of fundamental TE mode propagation. Finite-element-method simulation results show that, with the help of an HMM with a size of 400 nm × 220 nm × 200 nm(width × height × length), the ON/OFF switching for fundamental TE mode propagation in an Si waveguide can be characterized by modulation depth(MD) of5.6 d B and insertion loss(IL) of 1.25 dB. It also allows for a relatively wide operating bandwidth of 215 nm maintaining MD > 5 dB and IL < 1.25 dB. Furthermore, we discuss that the tungsten-doped VO_2 layers could be useful for reducing metal-insulator-transition temperature and thus improving switching performance. In general, our findings may provide some useful ideas for optical switch design and application in an on-chip all-optical communication system with a demanding integration level. 展开更多
关键词 Numerical investigations of an optical switch based on a silicon stripe waveguide embedded with vanadium dioxide layers HMM mode
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In situ selective laser gas nitriding for composite TiN/Ti-6Al-4V fabrication via laser powder bed fusion 被引量:1
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作者 P.A.Morton H.C.Taylor +3 位作者 L.E.Murr O.G.Delgado C.A.Terrazas R.B.Wicker 《Journal of Materials Science & Technology》 SCIE EI CAS CSCD 2020年第10期98-107,共10页
Laser-assisted gas nitriding of selective Ti-6Al-4V surfaces has been achieved during laser powder bed fusion fabrication by exchanging the argon build gas environment with nitrogen.Systematic variation of processing ... Laser-assisted gas nitriding of selective Ti-6Al-4V surfaces has been achieved during laser powder bed fusion fabrication by exchanging the argon build gas environment with nitrogen.Systematic variation of processing parameters allowed microdendritic Ti N surface coatings to be formed having thicknesses ranging from a few tens of microns to several hundred microns,with TiN dendrite microstructure volume fractions ranging from 0.6 to 0.75;and corresponding Vickers microindentation hardness values ranging from^7.5 GPa–9.5 GPa.Embedded TiN hard layers ranging from 50μm to 150μm thick were also fabricated in the laser-beam additively manufactured Ti-6Al-4V alloy producing prototype,hybrid,planar composites having alternating,ductile Ti-6Al-4V layers with a hardness of^4.5 GPa and a stiff,TiN layer with a hardness of^8.5 GPa.The results demonstrate prospects for fabricating novel,additively manufactured components having selective,hard,wear and corrosion resistant coatings along with periodic,planar or complex metal matrix composite regimes exhibiting superior toughness and related mechanical properties. 展开更多
关键词 TI-6AL-4V TiN ceramic coatings and embedded layers Dendritic microstructures Selective laser melting Additive manufacturing Metal matrix composites Selective nitriding
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Metal-to-metal antifuse with low programming voltage and low on-state resistance
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作者 江洋 田敏 +3 位作者 龙煌 赵劼 陈率 钟汇才 《Journal of Semiconductors》 EI CAS CSCD 2016年第7期82-85,共4页
This paper" describes and analyses the impact of the Ti layer, which is embedded between the insulator and top electrode, on the programming characteristic of the A1-HfO2-AI antifuse. The programming voltage of the a... This paper" describes and analyses the impact of the Ti layer, which is embedded between the insulator and top electrode, on the programming characteristic of the A1-HfO2-AI antifuse. The programming voltage of the antiiikse with 120 A HfO2 is properly reduced from 5.5 to 4.6 V with an embedded Ti layer. Low on-state resistance (-19Ω) and low programming voltage (4.6 V) is demonstrated in the embedded Ti antifhse with 120 A H fO2 while keeping sufficient off-state reliability. The antifuse embedded with a Ti layer between the insulator and top electrode has been developed and has potential in field programmable devices. 展开更多
关键词 antifuse: embedded Ti layer lower programming voltage HFO2
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