A micro amperometric immunosensor with the sensitive area of only 1mm^2 was fabricated on silicon using the technique of Micro-Electro-Mechanical Systems (MEMS).A double exposure of SU-8 photoresist process was develo...A micro amperometric immunosensor with the sensitive area of only 1mm^2 was fabricated on silicon using the technique of Micro-Electro-Mechanical Systems (MEMS).A double exposure of SU-8 photoresist process was developed to create both the sensitive pool and reaction pool.Antibody was immobilized via cross-linking with glutaraldehyde on the sensitive area of the electrode surface,which was electropolymerized with polypyrrole previously.The immunosensor was characterized by detection of human immunoglobulin G (HIgG).The immunosensor displayed a good linear response to HIgG concentrations between 5ng/ml and 255ng/ml and demonstrated a fast response time of 3 minutes.展开更多
基金The authors greatly acknowledge the financial support from the National Natural Science Foundation of China （Grant No. 90307014）
文摘A micro amperometric immunosensor with the sensitive area of only 1mm^2 was fabricated on silicon using the technique of Micro-Electro-Mechanical Systems (MEMS).A double exposure of SU-8 photoresist process was developed to create both the sensitive pool and reaction pool.Antibody was immobilized via cross-linking with glutaraldehyde on the sensitive area of the electrode surface,which was electropolymerized with polypyrrole previously.The immunosensor was characterized by detection of human immunoglobulin G (HIgG).The immunosensor displayed a good linear response to HIgG concentrations between 5ng/ml and 255ng/ml and demonstrated a fast response time of 3 minutes.
