The wettability and roughness of a substrate are crucial to the evolution of the contact angle and three-phase contact line in the evaporation of sessile droplets. In this paper, by performing moleoilar dynamics simul...The wettability and roughness of a substrate are crucial to the evolution of the contact angle and three-phase contact line in the evaporation of sessile droplets. In this paper, by performing moleoilar dynamics simulations for droplet evaporation at the nanoscale, we show that the wettability is more important than the roughness. For a smooth substrate, the evaporation behavior of a nanodroplet is similar to that at the macroscopic scale. This similarity is also observed in the case of a rough hydrophilic substrate. However, for a rough hydrophobic substrate, both the constant contact angle and contact line pinning appear in turn during evaporation. This suggests that the roughness of the hydrophobic substrate is useful for the evaporation technique in self-assembly at the nanoscale.展开更多
基金Acknowledgements This work was supported by the National Natural Science Foundation of China under Grant No. 11275084 and Grant No. 21434001.
文摘The wettability and roughness of a substrate are crucial to the evolution of the contact angle and three-phase contact line in the evaporation of sessile droplets. In this paper, by performing moleoilar dynamics simulations for droplet evaporation at the nanoscale, we show that the wettability is more important than the roughness. For a smooth substrate, the evaporation behavior of a nanodroplet is similar to that at the macroscopic scale. This similarity is also observed in the case of a rough hydrophilic substrate. However, for a rough hydrophobic substrate, both the constant contact angle and contact line pinning appear in turn during evaporation. This suggests that the roughness of the hydrophobic substrate is useful for the evaporation technique in self-assembly at the nanoscale.
