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Selective removal technology using chemical etching and excimer assistance in precision recycle of color filter 被引量:1
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作者 Pai-shan PA 《Transactions of Nonferrous Metals Society of China》 SCIE EI CAS CSCD 2011年第A01期210-214,共5页
Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical et... Color filters are produced using semiconductor production techniques although problems with low yield remain to be addressed. This study presents a new means of selective removal using excimer irradiation, chemical etching, or electrochemical machining on the fifth generation TFT LCDs. The selective removal of microstructure layers from the color filter surface of an optoelectronic flat panel display, as well as complete removal of the ITO thin-films, RGB layer, or resin black matrix (BM) layer from the substrate is possible. Individual defective film layers can be removed, or all films down to the Cr layer or bare glass can be completely eliminated. Experimental results demonstrate that defective ITO thin-films, RGB layers, or the resin BM layer can now be recycled with a great precision. When the ITO or RGB layer proves difficult to remove, excimer light can be used to help with removal. During this recycling process, the use of 225 nm excimer irradiation before chemical etching, or electrochemical machining, makes removal of stubborn film residues easy, effectively improving the quality of recycled color filters and reducing fabrication cost. 展开更多
关键词 chemical etching excimer light selective removal technology display color filter
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Destruction of H_2S Gas with a Combined Plasma Photolysis(CPP) Reactor
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作者 张虹 纪天一 +1 位作者 张仁熙 侯惠奇 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第2期134-139,共6页
A combined plasma photolysis (CPP) reactor that utilized the dielectric barrier discharge (DBD) plasma together with DBD-driven KrI^* excimer ultraviolet emission was applied to the decomposition of H2S gas. The ... A combined plasma photolysis (CPP) reactor that utilized the dielectric barrier discharge (DBD) plasma together with DBD-driven KrI^* excimer ultraviolet emission was applied to the decomposition of H2S gas. The effects of applied voltage, input current, gas flow velocity, original concentration as well as the ratio of Kr/I2 mixture on H2S removal efficiency were investigated. Gas streams containing H2S were separately treated with single DBD and CPP reactor under the same conditions. In comparison to DBD, CPP could greatly enhance the H2S removal efficiency at the same applied voltage, inlet gas concentration and gas flow velocity. In addition, the reaction mechanism was also discussed in this paper. 展开更多
关键词 combined plasma photolysis hydrogen sulfide excimer ultraviolet light radi-ation dielectric barrier discharge
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