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Interfacial stress engineering toward enhancement of ferroelectricity in Al doped HfO_(2)thin films
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作者 S X Chen M M Chen +2 位作者 Y Liu D W Cao G J Chen 《Chinese Physics B》 SCIE EI CAS CSCD 2024年第9期637-643,共7页
Ferroelectric HfO_(2)has attracted much attention owing to its superior ferroelectricity at an ultra-thin thickness and good compatibility with Si-based complementary metal-oxide-semiconductor(CMOS)technology.However,... Ferroelectric HfO_(2)has attracted much attention owing to its superior ferroelectricity at an ultra-thin thickness and good compatibility with Si-based complementary metal-oxide-semiconductor(CMOS)technology.However,the crystallization of polar orthorhombic phase(o-phase)HfO_(2)is less competitive,which greatly limits the ferroelectricity of the as-obtained ferroelectric HfO_(2)thin films.Fortunately,the crystallization of o-phase HfO_(2)can be thermodynamically modulated via interfacial stress engineering.In this paper,the growth of improved ferroelectric Al doped HfO_(2)(HfO_(2):Al)thin films on(111)-oriented Si substrate has been reported.Structural analysis has suggested that nonpolar monoclinic HfO_(2):Al grown on(111)-oriented Si substrate suffered from a strong compressive strain,which promoted the crystallization of(111)-oriented o-phase HfO_(2)in the as-grown HfO_(2):Al thin films.In addition,the in-plane lattice of(111)-oriented Si substrate matches well with that of(111)-oriented o-phase HfO_(2),which further thermally stabilizes the o-phase HfO_(2).Accordingly,an improved ferroelectricity with a remnant polarization(2P_(r))of 26.7C/cm^(2) has been obtained.The results shown in this work provide a simple way toward the preparation of improved ferroelectric HfO_(2)thin films. 展开更多
关键词 improved ferroelectricity INTERFACIAL stress ENGINEERING COMPRESSIVE strain HfO_(2)
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Reliable ferroelectricity down to cryogenic temperature in wakeup free Hf_(0.5)Zr_(0.5)O_(2)thin films by thermal atomic layer deposition
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作者 Shuyu Wu Rongrong Cao +6 位作者 Hao Jiang Yu Li Xumeng Zhang Yang Yang Yan Wang Yingfen Wei Qi Liu 《Journal of Semiconductors》 EI CAS CSCD 2024年第3期33-37,共5页
The performance and reliability of ferroelectric thin films at temperatures around a few Kelvin are critical for their application in cryo-electronics.In this work,TiN/Hf_(0.5)Zr_(0.5)O_(2)/TiN capacitors that are fre... The performance and reliability of ferroelectric thin films at temperatures around a few Kelvin are critical for their application in cryo-electronics.In this work,TiN/Hf_(0.5)Zr_(0.5)O_(2)/TiN capacitors that are free from the wake-up effect are investigated systematically from room temperature(300 K)to cryogenic temperature(30 K).We observe a consistent decrease in permittivity(εr)and a progressive increase in coercive electric field(Ec)as temperatures decrease.Our investigation reveals exceptional stability in the double remnant polarization(2P_(r))of our ferroelectric thin films across a wide temperature range.Specifically,at 30 K,a 2P_(r)of 36μC/cm^(2)under an applied electric field of 3.0 MV/cm is achieved.Moreover,we observed a reduced fatigue effect at 30 K in comparison to 300 K.The stable ferroelectric properties and endurance characteristics demonstrate the feasibility of utilizing HfO_(2)based ferroelectric thin films for cryo-electronics applications. 展开更多
关键词 hafnia-zirconia solid solution ferroelectricity cryogenic temperature wake-up effect
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Ferroelectricity Induced by Oxygen Vacancies in Rhombohedral ZrO_(2) Thin Films
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作者 Veniero Lenzi José P.B.Silva +5 位作者 Břetislav Šmíd Vladimir Matoín Cosmin M.Istrate Corneliu Ghica Judith L.MacManus-Driscoll Luís Marques 《Energy & Environmental Materials》 SCIE EI CAS CSCD 2024年第1期229-237,共9页
Rhombohedral phase Hf_(x)Zr_(1.x)O_(2)(HZO,x from 0 to 1)films are promising for achieving robust ferroelectric polarization without the need for an initial wake-up pre-cycling,as is normally the case for the more com... Rhombohedral phase Hf_(x)Zr_(1.x)O_(2)(HZO,x from 0 to 1)films are promising for achieving robust ferroelectric polarization without the need for an initial wake-up pre-cycling,as is normally the case for the more commonly studied orthorhombic phase.However,a large spontaneous polarization observed in rhombohedral films is not fully understood,and there are also large discrepancies between experimental and theoretical predictions.In this work,in rhombohedral ZrO_(2)thin films,we show that oxygen vacancies are not only a key factor for stabilizing the phase,but they are also a source of ferroelectric polarization in the films.This is shown experimentally through the investigation of the structural properties,chemical composition and the ferroelectric properties of the films before and after an annealing at moderate temperature(400℃)in an oxygen environment to reduce the V_(o)concentration compared.The experimental work is supported by density functional theory(DFT)calculations which show that the rhombohedral phase is the most stable one in highly oxygen defective ZrO_(2)films.The DFT calculations also show that V_(o)contribute to the ferroelectric polarization.Our findings reveal the importance of V_(o)for stabilizing rhombohedral ZrO_(2)thin films with superior ferroelectric properties. 展开更多
关键词 charged defects ferroelectric polarization rhombohedral phase stability ZIRCONIA
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Robust and Tunable Ferroelectricity in Ba/Co Codoped (K_(0.5)Na_(0.5))NbO_(3) Ceramics
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作者 刘佳讯 查节林 +5 位作者 杨玉龙 吕笑梅 胡雪莉 阎朔 吴子敬 黄凤珍 《Chinese Physics Letters》 SCIE EI CAS CSCD 2024年第7期152-160,共9页
The 0.98(K_(0.5)Na_(0.5))NbO_(3)-0.02Ba(Nb_(0.5)Co_(0.5))O_(3-δ) ceramics with doped Ba^(2+) and Co^(2+) ions are fabricated,and the impacts of the thermal process are studied.Compared with the rapidly cooled (RC) sa... The 0.98(K_(0.5)Na_(0.5))NbO_(3)-0.02Ba(Nb_(0.5)Co_(0.5))O_(3-δ) ceramics with doped Ba^(2+) and Co^(2+) ions are fabricated,and the impacts of the thermal process are studied.Compared with the rapidly cooled (RC) sample,the slowly cooled (SC) sample possesses superior dielectric and ferroelectric properties,and an 11 K higher ferroelectricparaelectric phase transition temperature,which can be attributed to the structural characteristics such as the grain size and the degree of anisotropy.Heat treatment can reversibly modulate the content of the oxygen vacancies,and in turn the ferroelectric hysteresis loops of the samples.Finally,robust and tunable ferroelectric property is achieved in SC samples with good structural integrity. 展开更多
关键词 CERAMICS FERROELECTRIC treatment
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Ferroelectricity of pristine Hf_(0.5)Zr_(0.5)O_(2) films fabricated by atomic layer deposition 被引量:1
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作者 陈璐秋 张晓旭 +12 位作者 冯光迪 刘逸飞 郝胜兰 朱秋香 冯晓钰 屈可 杨振中 祁原深 Yachin Ivry Brahim Dkhil 田博博 褚君浩 段纯刚 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第10期684-688,共5页
Hafnium-based ferroelectric films,remaining their ferroelectricity down to nanoscale thickness,present a promising application for low-power logic devices and nonvolatile memories.It has been appealing for researchers... Hafnium-based ferroelectric films,remaining their ferroelectricity down to nanoscale thickness,present a promising application for low-power logic devices and nonvolatile memories.It has been appealing for researchers to reduce the required temperature to obtain the ferroelectric phase in hafnium-based ferroelectric films for applications such as flexible and wearable electronics.This work demonstrates that a remanent polarization(P_(r))value of>5μC/cm^(2)can be obtained in asdeposited Hf_(0.5)Zr_(0.5)O_(2)(HZO)films that are fabricated by thermal atomic layer deposition(TALD)under low temperature of 250℃.The ferroelectric orthorhombic phase(o-phase)in the as-deposited HZO films is detected by scanning transmission electron microscopy(STEM).This low fabrication temperature further extends the compatibility of ferroelectric HZO films to flexible electronics and avoids the cost imposed by following high-temperature annealing treatments. 展开更多
关键词 Hf_(0.5)Zr_(0.5)O_(2)(HZO) FERROELECTRIC ORTHORHOMBIC without annealing
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Ferroelectricity of hafnium oxide-based materials:Current status and future prospects from physical mechanisms to device applications
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作者 Wanwang Yang Chenxi Yu +9 位作者 Haolin Li Mengqi Fan Xujin Song Haili Ma Zheng Zhou Pengying Chang Peng Huang Fei Liu Xiaoyan Liu Jinfeng Kang 《Journal of Semiconductors》 EI CAS CSCD 2023年第5期78-121,共44页
The finding of the robust ferroelectricity in HfO_(2)-based thin films is fantastic from the view point of both the fundamentals and the applications.In this review article,the current research status of the future pr... The finding of the robust ferroelectricity in HfO_(2)-based thin films is fantastic from the view point of both the fundamentals and the applications.In this review article,the current research status of the future prospects for the ferroelectric HfO_(2)-based thin films and devices are presented from fundamentals to applications.The related issues are discussed,which include:1)The ferroelectric characteristics observed in HfO_(2)-based films and devices associated with the factors of dopant,strain,interface,thickness,defect,fabrication condition,and more;2)physical understanding on the observed ferroelectric behaviors by the density functional theory(DFT)-based theory calculations;3)the characterizations of microscopic and macroscopic features by transmission electron microscopes-based and electrical properties-based techniques;4)modeling and simulations,5)the performance optimizations,and 6)the applications of some ferroelectric-based devices such as ferroelectric random access memory,ferroelectric-based field effect transistors,and the ferroelectric tunnel junction for the novel information processing systems. 展开更多
关键词 ferroelectricity HfO_(2)-based thin films physical mechanism characterization modeling and simulation applications
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Ferroelectricity induced by the absorption of water molecules on double helix SnIP
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作者 刘聃 魏冉 +2 位作者 韩琳 朱琛 董帅 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第3期537-543,共7页
We study the ferroelectricity in a one-dimensional(1D)system composed of a double helix SnIP with absorbing water molecules.Our ab initio calculations reveal two factors that are critical to the electrical polarizatio... We study the ferroelectricity in a one-dimensional(1D)system composed of a double helix SnIP with absorbing water molecules.Our ab initio calculations reveal two factors that are critical to the electrical polarization.The first one is the orientation of polarized water molecules staying in the R2 region of SnIP.The second one is the displacement of I atom which roots from subtle interaction with absorbed water molecules.A reasonable scenario of polarization flipping is proposed in this study.In the scenario,the water molecule is rolling-up with keeping the magnitude of its electrical dipole and changing its direction,meanwhile,the displacement of I atoms is also reversed.Highly tunable polarization can be achieved by applying strain,with 26.5%of polarization enhancement by applying tensile strain,with only 4%degradation is observed with 4%compressive strain.Finally,the direct band gap is also found to be correlated with strain. 展开更多
关键词 ferroelectricity one-dimensional double helix electrical polarization density functional theory
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Strain engineering and hydrogen effect for two-dimensional ferroelectricity in monolayer group-Ⅳmonochalcogenides MX(M=Sn,Ge;X=Se,Te,S)
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作者 Maurice Franck Kenmogne Ndjoko 郭必诞 +1 位作者 彭银辉 赵宇军 《Chinese Physics B》 SCIE EI CAS CSCD 2023年第3期396-401,共6页
Two-dimensional(2D)ferroelectric compounds are a special class of materials that meet the need for devices miniaturization,which can lead to a wide range of applications.Here,we investigate ferroelectric properties of... Two-dimensional(2D)ferroelectric compounds are a special class of materials that meet the need for devices miniaturization,which can lead to a wide range of applications.Here,we investigate ferroelectric properties of monolayer group-IV monochalcogenides MX(M=Sn,Ge;X=Se,Te,S)via strain engineering,and their effects with contaminated hydrogen are also discussed.GeSe,GeTe,and GeS do not go through transition up to the compressive strain of-5%,and consequently have good ferroelectric parameters for device applications that can be further improved by applying strain.According to the calculated ferroelectric properties and the band gaps of these materials,we find that their band gap can be adjusted by strain for excellent photovoltaic applications.In addition,we have determined the most stable hydrogen occupancy location in the monolayer SnS and SnTe.It reveals that H prefers to absorb on SnS and SnTe monolayers as molecules rather than atomic H.As a result,hydrogen molecules have little effect on the polarization and electronic structure of monolayer SnTe and SnS. 展开更多
关键词 two-dimensional material strain engineering ferroelectric photovoltaic materials hydrogen effect
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Ferroelectricity and Large Rashba Splitting in Two-Dimensional Tellurium
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作者 王垚 雷珍珍 +3 位作者 张金森 陶新永 华陈强 陆赟豪 《Chinese Physics Letters》 SCIE EI CAS CSCD 2023年第11期86-92,共7页
Two-dimensional(2D)ferroelectric(FE)systems are promising candidates for non-volatile nanodevices.Previous studies mainly focused on 2D compounds.Though counter-intuitive,here we propose several new phases of telluriu... Two-dimensional(2D)ferroelectric(FE)systems are promising candidates for non-volatile nanodevices.Previous studies mainly focused on 2D compounds.Though counter-intuitive,here we propose several new phases of tellurium with(anti)ferroelectricity.Two-dimensional films can be viewed as a collection of one-dimensional chains,and lone-pair instability is responsible for the(anti)ferroelectricity.The total polarization is determined to be 0.34×10^(-10)C/m for the FE ground state.Due to the local polarization field in the FE film,we show a large Rashba splitting(α_(R)~2 eV·?)with nonzero spin Hall conductivity for experimental detection.Furthermore,a dipole-like distribution of Berry curvature is verified,which may facilitate a nonlinear Hall effect.Because Rashba-splitting/Berry-curvature distributions are fully coupled with a polarization field,they can be reversed through FE phase transition.Our results not only broaden the elemental FE materials,but also shed light on their intriguing transport phenomena. 展开更多
关键词 transition FERROELECTRIC CURVATURE
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Coupled Ferroelectricity and Correlated States in a Twisted Quadrilayer MoS_(2) Moiré Superlattice
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作者 吴帆帆 李璐 +12 位作者 徐巧玲 刘乐 袁亚龙 赵交交 黄智恒 昝晓洲 Kenji Watanabe Takashi Taniguchi 时东霞 冼乐德 杨威 杜罗军 张广宇 《Chinese Physics Letters》 SCIE EI CAS CSCD 2023年第4期68-73,共6页
Moiré superlattices have emerged as a highly controllable quantum platform for exploration of various fascinating phenomena,such as Mott insulator states,ferroelectric order,unconventional superconductivity and o... Moiré superlattices have emerged as a highly controllable quantum platform for exploration of various fascinating phenomena,such as Mott insulator states,ferroelectric order,unconventional superconductivity and orbital ferromagnetism.Although remarkable progress has been achieved,current research in moiré physics has mainly focused on the single species properties,while the coupling between distinct moiré quantum phenomena remains elusive.Here we demonstrate,for the first time,the strong coupling between ferroelectricity and correlated states in a twisted quadrilayer MoS2moiré superlattice,where the twist angles are controlled in sequence to be ~57°,~0°,and ~-57°.Correlated insulator states are unambiguously established at moiré band filling factors v = 1,2,3 of twisted quadrilayer MoS_(2).Remarkably,ferroelectric order can occur at correlated insulator states and disappears quickly as the moiré band filling deviates from the integer fillings,providing smoking gun evidences of the coupling between ferroelectricity and correlated states.Our results demonstrate the coupling between different moiré quantum properties and will hold great promise for new moiré physics and applications. 展开更多
关键词 FERROELECTRIC quantum TWISTED
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铁电陶瓷脉冲耐压失效分布及耐压可靠性
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作者 张福平 李玺钦 +2 位作者 杜金梅 刘雨生 叶福庆 《物理学报》 SCIE EI CAS CSCD 北大核心 2024年第10期315-320,共6页
铁电陶瓷在高电场下的击穿问题是困扰铁电陶瓷应用的关键问题之一.本文统计了铁电陶瓷在正向脉冲电场(4.5 kV/mm)失效概率与脉冲次数的分布关系,对通过第10次脉冲耐压样品第11次的失效概率进行了分析,开展了铁电陶瓷经历万次以上的脉冲... 铁电陶瓷在高电场下的击穿问题是困扰铁电陶瓷应用的关键问题之一.本文统计了铁电陶瓷在正向脉冲电场(4.5 kV/mm)失效概率与脉冲次数的分布关系,对通过第10次脉冲耐压样品第11次的失效概率进行了分析,开展了铁电陶瓷经历万次以上的脉冲耐压后压电常数与电滞回线测试研究.结果表明:铁电陶瓷的击穿概率与脉冲加电压次数曲线呈现典型的浴盆曲线分布,经历10次脉冲高压测试合格的样品,其脉冲耐压失效概率相比于未经历脉冲高压陶瓷样品,降低了4个数量级以上,且上述脉冲高压加载接近无损.考虑到裂纹扩展速度,多个缺陷导致的裂纹同时扩展并连通是铁电陶瓷在脉冲高电压下断裂的主要原因. 展开更多
关键词 铁电陶瓷 脉冲电场 失效概率
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旋涂工艺对钛酸铋(Bi_(4)Ti_(3)O_(12))薄膜铁电性能的影响
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作者 石敏 陈浩 +2 位作者 杜淑淑 陈武 许育东 《广州化工》 CAS 2024年第10期48-51,共4页
应用溶胶-凝胶法,在Pt(111)/Ti/SiO_(2)/Si衬底采用不同转速制备了Bi_(4)Ti_(3)O_(12)薄膜。通过XRD、SEM、半导体测试、铁电性能测试等对制备的薄膜结构以及铁电性能进行表征。XRD结果表明成功制备钛酸铋纯相,FESEM结果显示所有的薄膜... 应用溶胶-凝胶法,在Pt(111)/Ti/SiO_(2)/Si衬底采用不同转速制备了Bi_(4)Ti_(3)O_(12)薄膜。通过XRD、SEM、半导体测试、铁电性能测试等对制备的薄膜结构以及铁电性能进行表征。XRD结果表明成功制备钛酸铋纯相,FESEM结果显示所有的薄膜与衬底间均有良好的接触,半导体测试以及铁电性能测试结果显示,转速为4500 r/min下制备的薄膜不仅具有最低的漏电流密度(2.60×10^(-6)A/cm^(2)),而且拥有最大的剩余极化强度(P_(r)=12.38μC/cm^(2))。 展开更多
关键词 薄膜 漏电流密度 铁电性能
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自支撑BaTiO_(3)薄膜的制备与铁电性研究
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作者 张军 沈玙璠 苏天聪 《真空科学与技术学报》 CAS CSCD 北大核心 2024年第4期369-375,共7页
BaTiO_(3)(BTO)铁电氧化物薄膜因其在非易失信息存储、智能传感、生物医疗、纳米发电机等领域潜在的应用而受到了人们的广泛关注。目前,为了保证BTO薄膜能高质量外延生长,通常选择晶格匹配的氧化物做衬底,所生长的薄膜与衬底之间存在较... BaTiO_(3)(BTO)铁电氧化物薄膜因其在非易失信息存储、智能传感、生物医疗、纳米发电机等领域潜在的应用而受到了人们的广泛关注。目前,为了保证BTO薄膜能高质量外延生长,通常选择晶格匹配的氧化物做衬底,所生长的薄膜与衬底之间存在较强的化学键,很难将其从衬底上大面积地剥离下来,所以也无法实现下一步转移到可用于高密度器件集成的的Si基衬底上。文章使用水溶Sr_(3)Al_(2)O_(6)(SAO)为牺牲层的方法,将生长在Nb-SrTiO_(3)(Nb-STO)衬底上的BTO外延薄膜可以大面积、无褶皱地转移到Si基衬底上。并且,转移后的自支撑薄膜仍然保持了完美的结晶度和室温铁电性。此结论对自支撑氧化物薄膜在高密度铁电器件的集成方面奠定了一定的基础。 展开更多
关键词 BaTiO_(3)薄膜 铁电性 自支撑 柔性器件
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Ga_(2-x)Fe_(x)O_(3) 单相多铁性及室温磁电耦合效应的研究进展
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作者 张军 马建春 薛武红 《中国陶瓷》 CAS CSCD 北大核心 2024年第3期1-11,共11页
在单相多铁材料中,利用电场代替磁场来可逆控制磁性这一手段是实现下一代高密度、低功耗磁电多功能器件的理想方法。然而,目前所发现的单相多铁材料大多数都表现出了弱的室温铁电性、铁磁性或者低于室温的磁电工作温度,这严重限制了其... 在单相多铁材料中,利用电场代替磁场来可逆控制磁性这一手段是实现下一代高密度、低功耗磁电多功能器件的理想方法。然而,目前所发现的单相多铁材料大多数都表现出了弱的室温铁电性、铁磁性或者低于室温的磁电工作温度,这严重限制了其在实际生产中的应用。近年来的研究发现,具有强磁电(ME)耦合的第Ⅱ类室温单相多铁Ga_(2-x)Fe_(x)O_(3),其剩余铁电极化强度(Pr)和饱和磁化强度(Ms)在最优的条件下分别可以达到25μC/cm^(2)和1.2μB/f.u.,因而是一种极有可能同时解决上述问题的新型替代材料。首先介绍了单相多铁材料的研究现状以及潜在的应用;然后总结了Ga_(2-x)Fe_(x)O_(3)材料单相多铁性和ME耦合效应的研究历程;最后,围绕Ga_(2-x)Fe_(x)O_(3)未来面临的关键科学问题和挑战进行了详细讨论。 展开更多
关键词 单相多铁性 Ga_(2-x)Fe_(x)O_(3) 铁电性 铁磁性 磁电耦合
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甲胺基金属卤化物MAPbX_(3)铁电半导体研究进展
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作者 南瑞华 刘腾 坚佳莹 《西安工业大学学报》 CAS 2024年第2期192-208,共17页
为了研究甲胺基金属卤化物MAPbX_(3)铁电半导体的铁电性对光伏性能的影响,文中梳理了近几年MAPbX_(3)的相关研究文献,分析了MAPbX_(3)晶体的光学吸收和载流子输运性能的影响因素,阐述了MAPbX_(3)铁电性的验证方法及铁电体中载流子的分... 为了研究甲胺基金属卤化物MAPbX_(3)铁电半导体的铁电性对光伏性能的影响,文中梳理了近几年MAPbX_(3)的相关研究文献,分析了MAPbX_(3)晶体的光学吸收和载流子输运性能的影响因素,阐述了MAPbX_(3)铁电性的验证方法及铁电体中载流子的分离机制,介绍了铁电半导体的应用,重点分析了MAPbX_(3)晶体结构方面的研究争议,讨论了MAPbX_(3)铁电性与铁弹性的关系,并对光伏器件的设计以及应用提出了新的研究思路。 展开更多
关键词 MAPbX_(3) 钙钛矿材料 光电性能 铁电性
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二维层状α⁃In_(2)Se_(3)(2H)铁电材料的各向异性光响应
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作者 吕宝华 李玉珍 《无机化学学报》 SCIE CAS CSCD 北大核心 2024年第10期1911-1918,共8页
采用机械剥离法制备了2H相α⁃In_(2)Se_(3)[α⁃In_(2)Se_(3)(2H)]纳米片。通过X射线衍射(X⁃ray diffraction,XRD)、拉曼光谱、球差电镜和压电力显微镜对纳米片的结构和铁电性能进行详细表征,确定纳米片为具有特殊结构的α⁃In_(2)Se_(3)(... 采用机械剥离法制备了2H相α⁃In_(2)Se_(3)[α⁃In_(2)Se_(3)(2H)]纳米片。通过X射线衍射(X⁃ray diffraction,XRD)、拉曼光谱、球差电镜和压电力显微镜对纳米片的结构和铁电性能进行详细表征,确定纳米片为具有特殊结构的α⁃In_(2)Se_(3)(2H)铁电材料。进一步在SiO_(2)/Si基片上成功构造了基于α⁃In_(2)Se_(3)(2H)铁电的平面四端器件,详细研究其在各个方向的光响应。结果表明,具有本征结构的α⁃In_(2)Se_(3)(2H)在相互垂直方向均没有光响应。在器件两端分别施加电压后,α⁃In_(2)Se_(3)(2H)器件在相互垂直方向均出现了明显的光响应,尤其在接近于易极化轴方向施加电压后,α⁃In_(2)Se_(3)(2H)器件出现了各向异性光响应。 展开更多
关键词 二维层状α⁃In_(2)Se_(3)(2H) 机械剥离法 铁电性 各向异性光响应
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Moderate Fields, Maximum Potential: Achieving High Records with Temperature‑Stable Energy Storage in Lead‑Free BNT‑Based Ceramics 被引量:1
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作者 Wenjing Shi Leiyang Zhang +7 位作者 Ruiyi Jing Yunyao Huang Fukang Chen Vladimir Shur Xiaoyong Wei Gang Liu Hongliang Du Li Jin 《Nano-Micro Letters》 SCIE EI CAS CSCD 2024年第5期184-200,共17页
The increasing awareness of environmental concerns has prompted a surge in the exploration of leadfree,high-power ceramic capacitors.Ongoing efforts to develop leadfree dielectric ceramics with exceptional energystora... The increasing awareness of environmental concerns has prompted a surge in the exploration of leadfree,high-power ceramic capacitors.Ongoing efforts to develop leadfree dielectric ceramics with exceptional energystorage performance(ESP)have predominantly relied on multicomponent composite strategies,often accomplished under ultrahigh electric fields.However,this approach poses challenges in insulation and system downsizing due to the necessary working voltage under such conditions.Despite extensive study,bulk ceramics of(Bi_(0.5)Na_(0.5))TiO_(3)(BNT),a prominent lead-free dielectric ceramic family,have seldom achieved a recoverable energy-storage(ES)density(Wrec)exceeding 7 J cm^(−3).This study introduces a novel approach to attain ceramic capacitors with high ESP under moderate electric fields by regulating permittivity based on a linear dielectric model,enhancing insulation quality,and engineering domain structures through chemical formula optimization.The incorporation of SrTiO_(3)(ST)into the BNT matrix is revealed to reduce the dielectric constant,while the addition of Bi(Mg_(2/3)Nb_(1/3))O_(3)(BMN)aids in maintaining polarization.Additionally,the study elucidates the methodology to achieve high ESP at moderate electric fields ranging from 300 to 500 kV cm^(−1).In our optimized composition,0.5(Bi_(0.5)Na_(0.4)K_(0.1))TiO_(3)–0.5(2/3ST-1/3BMN)(B-0.5SB)ceramics,we achieved a Wrec of 7.19 J cm^(−3) with an efficiency of 93.8%at 460 kV cm^(−1).Impressively,the B-0.5SB ceramics exhibit remarkable thermal stability between 30 and 140℃ under 365 kV cm^(−1),maintaining a Wrec exceeding 5 J cm^(−3).This study not only establishes the B-0.5SB ceramics as promising candidates for ES materials but also demonstrates the feasibility of optimizing ESP by modifying the dielectric constant under specific electric field conditions.Simultaneously,it provides valuable insights for the future design of ceramic capacitors with high ESP under constraints of limited electric field. 展开更多
关键词 BNT Energy storage LEAD-FREE Relaxor ferroelectrics Capacitors
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0.9BaTiO_(3)-0.1Bi(Mg_(1/2)Ti_(1/2))O_(3)铁电薄膜制备及储能特性
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作者 刘松 张发强 +1 位作者 罗进 刘志甫 《无机材料学报》 SCIE EI CAS CSCD 北大核心 2024年第3期291-298,共8页
电介质薄膜是通过介质极化方式存储静电能的一种材料,以其高功率密度和高充放电效率,在电子器件领域得到广泛应用。目前,储能密度较低和温度稳定性差仍是电介质储能薄膜的缺陷。本研究采用溶胶-凝胶法在Pt/Ti/SiO_(2)/Si衬底上制备了0.9... 电介质薄膜是通过介质极化方式存储静电能的一种材料,以其高功率密度和高充放电效率,在电子器件领域得到广泛应用。目前,储能密度较低和温度稳定性差仍是电介质储能薄膜的缺陷。本研究采用溶胶-凝胶法在Pt/Ti/SiO_(2)/Si衬底上制备了0.9BaTiO_(3)-0.1Bi(Ti_(1/2)Mg_(1/2))O_(3)(0.9BT-0.1BMT)薄膜,通过引入BMT期望获得高储能密度及宽温度稳定性,并研究了退火温度对薄膜的相组成和微观形貌的影响。研究结果表明,退火温度过高会导致薄膜的致密性明显降低并伴随晶粒尺寸增大,750℃是最佳的退火温度。综合性能研究发现,1 kHz下,薄膜的室温介电常数为399,介电损耗为5.8%。薄膜在各测试频率下的介电温度稳定性满足X9R标准,ΔC/C25℃≤±13.9%。通过Currie-Weiss关系计算得到薄膜的弛豫系数(Relaxor value)γ值为≈1.96,说明其具有明显的弛豫特性。储能特性研究显示,薄膜的室温储能密度Wrec达51.9 J/cm^(3),室温~200℃的宽温度范围内,储能密度Wrec>20 J/cm^(3),可释放能量效率η>65%(1600 kV/cm)。在脉冲放电测试中,薄膜的脉冲放电时间τ0.9保持在15μs以内,且具有优异的频率、温度和循环可靠性。本研究所制备的0.9BT-0.1BMT铁电薄膜具有出色的储能特性和宽温度稳定性,具备在高温环境中应用的潜力。 展开更多
关键词 BaTiO_(3) 铁电薄膜 退火温度 能量存储 宽温稳定 弛豫铁电
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环境温度对HfO_(2)铁电存储器的质子辐照效应影响研究
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作者 朱旭昊 袁亦辉 +6 位作者 黄铭敏 马瑶 毕津顺 许高博 龚敏 杨治美 李芸 《微电子学》 CAS 北大核心 2024年第2期330-337,共8页
基于HfO_(2)的铁电随机存取存储器(FeRAM)具有功耗低、存取速度快,易于小型化,抗干扰能力强等优势,在航天航空领域有广袤的发展空间。然而,FeRAM在太空环境下的抗辐照性能尚未得到全面的研究。研究了W/TiN/Hf_(0.5)Zr_(0.5)O_(2)(HZO)/... 基于HfO_(2)的铁电随机存取存储器(FeRAM)具有功耗低、存取速度快,易于小型化,抗干扰能力强等优势,在航天航空领域有广袤的发展空间。然而,FeRAM在太空环境下的抗辐照性能尚未得到全面的研究。研究了W/TiN/Hf_(0.5)Zr_(0.5)O_(2)(HZO)/TiN铁电存储器在常温和高温环境下经5 MeV质子辐照后的电学特性和铁电畴结构变化。通过电学和压电响应力显微镜(PFM)手段表征发现,在常温质子辐照后,电容器的介电常数(ε_(r))和剩余极化强度(P_(r))值均增大,器件的铁电性能提升,常温高注量质子辐照有利于存储器在太空环境中工作,但随着辐照时环境温度升高,HZO存储器的铁电性能下降,漏电流增大,铁电存储器的各项性能明显退化。 展开更多
关键词 HfO_(2) 铁电存储器 质子辐照 温度
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超高压下钙钛矿材料铁电峰值行为研究
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作者 管豪毅 周志宏 +2 位作者 李亚兰 梁英 田晓宝 《应用数学和力学》 CSCD 北大核心 2024年第10期1313-1319,共7页
压力能够显著影响钙钛矿铁电材料的晶体结构和功能特性,且对相变温度的影响相对较小,是能比较有效地改善材料的介电和铁电性质的手段.该文利用基于第一性原理的分子动力学方法,探究了钛酸钡(BTO)单晶在常压至150 GPa静水压力区间的铁电... 压力能够显著影响钙钛矿铁电材料的晶体结构和功能特性,且对相变温度的影响相对较小,是能比较有效地改善材料的介电和铁电性质的手段.该文利用基于第一性原理的分子动力学方法,探究了钛酸钡(BTO)单晶在常压至150 GPa静水压力区间的铁电性演变规律.结果表明,BTO单晶的铁电性随着压力的增加呈现出非单调的变化趋势,表现为先减弱、后增强,最后完全消失,并在42 GPa处出现峰值现象,其原因是压力导致的原子间距减小影响了长程Coulomb力与短程电子斥力的平衡.研究揭示的BTO单晶在超高静水压力环境下的铁电性变化规律,为未来钙钛矿材料在器件领域中的应用提供了理论基础,并为实验领域研究BTO铁电性的超高压行为提供了理论指导. 展开更多
关键词 分子动力学 BTO 超高压 铁电性
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