As a promising ultra-wide bandgap semiconductor, gallium oxide(Ga_2O_3) has attracted increasing attention in recent years. The high theoretical breakdown electrical field(8 MV/cm), ultra-wide bandgap(～ 4.8 eV) and l...As a promising ultra-wide bandgap semiconductor, gallium oxide(Ga_2O_3) has attracted increasing attention in recent years. The high theoretical breakdown electrical field(8 MV/cm), ultra-wide bandgap(～ 4.8 eV) and large Baliga's figure of merit(BFOM) of Ga_2O_3 make it a potential candidate material for next generation high-power electronics, including diode and field effect transistor(FET). In this paper, we introduce the basic physical properties of Ga_2O_3 single crystal, and review the recent research process of Ga_2O_3 based field effect transistors. Furthermore, various structures of FETs have been summarized and compared, and the potential of Ga_2O_3 is preliminary revealed. Finally, the prospect of the Ga_2O_3 based FET for power electronics application is analyzed.展开更多
Gallium oxide(Ga_2O_3), a typical ultra wide bandgap semiconductor, with a bandgap of ~4.9 e V, critical breakdown field of 8 MV/cm, and Baliga's figure of merit of 3444, is promising to be used in high-power and ...Gallium oxide(Ga_2O_3), a typical ultra wide bandgap semiconductor, with a bandgap of ~4.9 e V, critical breakdown field of 8 MV/cm, and Baliga's figure of merit of 3444, is promising to be used in high-power and high-voltage devices.Recently, a keen interest in employing Ga_2O_3 in power devices has been aroused. Many researches have verified that Ga_2O_3 is an ideal candidate for fabricating power devices. In this review, we summarized the recent progress of field-effect transistors(FETs) and Schottky barrier diodes(SBDs) based on Ga_2O_3, which may provide a guideline for Ga_2O_3 to be preferably used in power devices fabrication.展开更多
The energy bandgap is an intrinsic character of semiconductors, which largely determines their properties. The ability to continuously and reversibly tune the bandgap of a single device during real time operation is o...The energy bandgap is an intrinsic character of semiconductors, which largely determines their properties. The ability to continuously and reversibly tune the bandgap of a single device during real time operation is of great importance not only to device physics but also to technological applications. Here we demonstrate a widely tunable bandgap of few-layer black phosphorus （BP） by the application of vertical electric field in dual-gated BP field-effect transistors. A total bandgap reduction of 124 meV is observed when the electrical displacement field is increased from 0.10 V/nm to 0.83 V/nm. Our results suggest appealing potential for few-layer BP as a tunable bandgap material in infrared optoelectronies, thermoelectric power generation and thermal imaging.展开更多
Negative Bias Temperature Instability （NBTI） has become one of the most serious reliability problems of metaloxide-semiconductor field-effect transistors （MOSFETs）. The degradation mechanism and model of NBTI are ...Negative Bias Temperature Instability （NBTI） has become one of the most serious reliability problems of metaloxide-semiconductor field-effect transistors （MOSFETs）. The degradation mechanism and model of NBTI are studied in this paper. From the experimental results, the exponential value 0.25-0.5 which represents the relation of NBTI degradation and stress time is obtained. Based on the experimental results and existing model, the reaction-diffusion model with H^＋ related species generated is deduced, and the exponent 0.5 is obtained. The results suggest that there should be H^＋ generated in the NBTI degradation. With the real time method, the degradation with an exponent 0.5 appears clearly in drain current shift during the first seconds of stress and then verifies that H^＋ generated during NBTI stress.展开更多
二维半导体过渡金属二硫属化物(transition metal dichalcogenide,TMD)具有独特的电学、光学和力学性能,在数字电路、光伏器件和能量存储等多个领域中具有巨大的应用潜力。通过表面掺杂控制TMD的电学性能为实现灵敏传感提供了有效的方...二维半导体过渡金属二硫属化物(transition metal dichalcogenide,TMD)具有独特的电学、光学和力学性能,在数字电路、光伏器件和能量存储等多个领域中具有巨大的应用潜力。通过表面掺杂控制TMD的电学性能为实现灵敏传感提供了有效的方法。本文开展了氧等离子体对二硫化钼(MoS_(2))掺杂特性的研究。首先,测试了MoS_(2)场效应晶体管(field-effect transistor,FET)的输运特性,发现氧等离子体处理对FET具有p型掺杂作用。随后,通过拉曼光谱研究了掺杂机制的成因,并证实了沟道表面类MoO_(3)缺陷的形成。最后,研究了经等离子体处理的晶体管的湿度传感特性,由于氧等离子体处理使得沟道对水分子的吸收中心增加,在潮湿环境下晶体管具有十分灵敏的响应特性,源漏电流值变化了约54%。这项工作不仅提供了一种调控TMD电学性能的简单方法,也展示了低维材料化学传感器的发展潜力。展开更多
在鳍型场效应晶体管(SOI FinFET)相关静电防护技术研究基础上,提出了一种新型的体区接触固定型绝缘体上硅鳍型场效应晶体管泄放钳位装置(Fix-base SOI FinFET Clamp)。该新型结构的器件解决了基区接触浮空在静电防护设计时引起的一系列...在鳍型场效应晶体管(SOI FinFET)相关静电防护技术研究基础上,提出了一种新型的体区接触固定型绝缘体上硅鳍型场效应晶体管泄放钳位装置(Fix-base SOI FinFET Clamp)。该新型结构的器件解决了基区接触浮空在静电防护设计时引起的一系列问题,而且对正常的FinFET工艺具有良好的兼容性。通过计算机辅助工艺设计(TCAD)仿真论证了Fix-base SOI FinFET Clamp具有明显效果,详细阐述和讨论了SOI FinFET和Fix-base SOI FinFET Clamp工作状态下的电流和热分布。展开更多
基金supported by the National Natural Science Foundation of China(Nos.61521064,61522408,61574169,6 1334007,61474136,61574166)the Ministry of Science andTechnology of China(Nos.2016YFA0201803,2016YFA0203800,2017YFB0405603)+2 种基金the Key Research Program of Frontier Sciences of Chinese Academy of Sciences(Nos.QYZDB-SSWJSC048,QYZDY-SSW-JSC001)the Beijing Municipal Science and Technology Project(No.Z171100002017011)the Opening Project of the Key Laboratory of Microelectronic Devices&Integration Technology,Institute of Microelectronics of Chinese Academy of Sciences
文摘As a promising ultra-wide bandgap semiconductor, gallium oxide(Ga_2O_3) has attracted increasing attention in recent years. The high theoretical breakdown electrical field(8 MV/cm), ultra-wide bandgap(～ 4.8 eV) and large Baliga's figure of merit(BFOM) of Ga_2O_3 make it a potential candidate material for next generation high-power electronics, including diode and field effect transistor(FET). In this paper, we introduce the basic physical properties of Ga_2O_3 single crystal, and review the recent research process of Ga_2O_3 based field effect transistors. Furthermore, various structures of FETs have been summarized and compared, and the potential of Ga_2O_3 is preliminary revealed. Finally, the prospect of the Ga_2O_3 based FET for power electronics application is analyzed.
基金Project supported by the National Natural Science Foundation of China(Grant Nos.61774019,51572033,and 51572241)the Beijing Municipal Commission of Science and Technology,China(Grant No.SX2018-04)
文摘Gallium oxide(Ga_2O_3), a typical ultra wide bandgap semiconductor, with a bandgap of ~4.9 e V, critical breakdown field of 8 MV/cm, and Baliga's figure of merit of 3444, is promising to be used in high-power and high-voltage devices.Recently, a keen interest in employing Ga_2O_3 in power devices has been aroused. Many researches have verified that Ga_2O_3 is an ideal candidate for fabricating power devices. In this review, we summarized the recent progress of field-effect transistors(FETs) and Schottky barrier diodes(SBDs) based on Ga_2O_3, which may provide a guideline for Ga_2O_3 to be preferably used in power devices fabrication.
基金Supported by the National Basic Research Program of China under Grant Nos 2013CB921900 and 2014CB920900the National Natural Science Foundation of China under Grant No 11374021)(S.Yan,Z.Xie,J.-H,Chen)+1 种基金support from the Elemental Strategy Initiative conducted by the MEXT,Japana Grant-in-Aid for Scientific Research on Innovative Areas"Science of Atomic Layers"from JSPS
文摘The energy bandgap is an intrinsic character of semiconductors, which largely determines their properties. The ability to continuously and reversibly tune the bandgap of a single device during real time operation is of great importance not only to device physics but also to technological applications. Here we demonstrate a widely tunable bandgap of few-layer black phosphorus （BP） by the application of vertical electric field in dual-gated BP field-effect transistors. A total bandgap reduction of 124 meV is observed when the electrical displacement field is increased from 0.10 V/nm to 0.83 V/nm. Our results suggest appealing potential for few-layer BP as a tunable bandgap material in infrared optoelectronies, thermoelectric power generation and thermal imaging.
基金supported by the Fundamental Research Funds in Xidian Universities (Grant No.JY10000904009)the National Key Technology Research and Development Program of the Ministry of Science and Technology of China (Grant No.2007BAK25B03)
文摘Negative Bias Temperature Instability （NBTI） has become one of the most serious reliability problems of metaloxide-semiconductor field-effect transistors （MOSFETs）. The degradation mechanism and model of NBTI are studied in this paper. From the experimental results, the exponential value 0.25-0.5 which represents the relation of NBTI degradation and stress time is obtained. Based on the experimental results and existing model, the reaction-diffusion model with H^＋ related species generated is deduced, and the exponent 0.5 is obtained. The results suggest that there should be H^＋ generated in the NBTI degradation. With the real time method, the degradation with an exponent 0.5 appears clearly in drain current shift during the first seconds of stress and then verifies that H^＋ generated during NBTI stress.
基金National Natural Science Foundation of China(No.62005042)。
文摘二维半导体过渡金属二硫属化物(transition metal dichalcogenide,TMD)具有独特的电学、光学和力学性能,在数字电路、光伏器件和能量存储等多个领域中具有巨大的应用潜力。通过表面掺杂控制TMD的电学性能为实现灵敏传感提供了有效的方法。本文开展了氧等离子体对二硫化钼(MoS_(2))掺杂特性的研究。首先,测试了MoS_(2)场效应晶体管(field-effect transistor,FET)的输运特性,发现氧等离子体处理对FET具有p型掺杂作用。随后,通过拉曼光谱研究了掺杂机制的成因,并证实了沟道表面类MoO_(3)缺陷的形成。最后,研究了经等离子体处理的晶体管的湿度传感特性,由于氧等离子体处理使得沟道对水分子的吸收中心增加,在潮湿环境下晶体管具有十分灵敏的响应特性,源漏电流值变化了约54%。这项工作不仅提供了一种调控TMD电学性能的简单方法,也展示了低维材料化学传感器的发展潜力。
文摘在鳍型场效应晶体管(SOI FinFET)相关静电防护技术研究基础上,提出了一种新型的体区接触固定型绝缘体上硅鳍型场效应晶体管泄放钳位装置(Fix-base SOI FinFET Clamp)。该新型结构的器件解决了基区接触浮空在静电防护设计时引起的一系列问题,而且对正常的FinFET工艺具有良好的兼容性。通过计算机辅助工艺设计(TCAD)仿真论证了Fix-base SOI FinFET Clamp具有明显效果,详细阐述和讨论了SOI FinFET和Fix-base SOI FinFET Clamp工作状态下的电流和热分布。
