Preparation and Optical Patterning of Organic-Inorganic Hybrid Color-Filter Films Using Latent Pigments by Utilizing Photo-Acid-Generator and Microwave Irradiation

Preparation and photo-patterning characteristics of organic-inorganic hybrid thin film containing latent pigment by using photo-acid-generator (PAG) and microwave irradiation have been investigated. The acrylic thin film modified with methoxysilane containing PAG was formed on a glass substrate and irradiated with ultraviolet rays to promote sol-gel reaction by catalytic action of acid which was generated from PAG. And then the film was hardened with microwave irradiation, yielding organic-inorganic hybrid polymer film having hardness, highly transparency and strong adhesion with a glass substrate. Since this reaction only occurred in the optically (UV) irradiated regions, by exploiting the difference between the adhesivenesses of these regions photo-irradiated through photomask with a glass substrate, it was possible to form a patterned film with pitch of 100 to 50 μm by a simple lift-off method. A pigment-containing film using latent pigments (with subtractive three primary colors of coloring materials) and a patterned film were prepared, and it was possible to make these films multi-colored by varying the mixing ratio of the pigments. This multi-colored film-preparation method is effective for simply and efficiently forming a color-filter film by applying optical and microwave irradiation.

Experimental Research of DLC Film Deposited by Filtered Vacuum Arc Evaporation

本文研究了过滤式阴极电弧沉积方法获得的类金刚石薄膜．实验研究电弧的稳定性和探针电流与沉积参数的关系，并系统研究了膜层的性能．膜层的摩擦性能也得到了研究．

S-type Er-Yb Co-doped Phosphate Glass Waveguide Amplifier Integrated with Cascaded Multilayer Medium Thin Film Filter

A new S-type of erbium-ytterbium co-doped phosphate glass waveguide amplifier integrated with cascaded multilayer medium thin film filter is proposed,this S-type geometry waveguide structure is used to achieve a long path in a compact chip,and obtained higher gain with lower Er-doped concentration. The cascaded multilayer medium thin film filter is utilized to achieve a broader flattening gain bandwidth.The intrinsical gain spectrum is obtained by solving rate and power propagation equations,the effect of transmittance spectrum of thin film filter on flattening gain is discussed.

Design of non-polarizing thin film edge filters

The separation between s- and p-polarization components invariably affects thin film edge filters used for tilted incidence and is a difficult problem for many applications, especially for optical communication. This paper presents a novel design method to obtain edge filters with non-polarization at incidence angle of 45°. The polarization separation at 50% trans-mittance for a long-wave-pass filter and a short-wave-pass filter is 0.3 nm and 0.1 nm respectively. The design method is based on a broadband Fabry-Perot thin-film interference filter in which the higher or lower interference band at both sides of the main transmittance peak can be used for initial design of long-wave-pass filter or short-wave-pass filter and then can be refined to reduce the transmittance ripples. The spacer 2H2L2H or 2L2H2L of the filter is usually taken. Moreover, the method for expanding the bandwidth of rejection and transmission is explained. The bandwidth of 200 nm for both rejection region and transmission band is obtained at wavelength 1550 nm. In this way, the long-wave-pass and short-wave-pass edge filters with zero separation between two polarization components can easily be fabricated.

The behaviours of optical novelty filter based on bacteriorhodopsin film

The quality of the novelty filter image is investigated at different intensities of the incident blue and yellow beams irradiating a bacteriorhodopsin （bR） film. The relationship between the transmitted blue beams and the incident yellow beams is established. The results show that the contrast of the novelty filter image depends on the lifetime of longest lived photochemical state （M state）. These results enable one to identify the direction of a moving object and to improve the quality of the novel filter image by prolonging the lifetime of M state.

An improved transmitting multi-layer thin-film filter

The angular resolutions of the phase-shifted Rugate thin-film filters, the ultra-narrow bandpass filters, and a cutoff filter-combination device are discussed, and the electric field distributions of the filters are compared. The results show that the three transmitting multi-layer thin-film filters can realize the same angular resolution, but the electric field in the cutoff filter-combination device is the lowest. Because a lower electric-field distribution corresponds to a higher laser-induced damage threshold of the thin films, the cutoff filter-combination device may replace the traditional spatial filters in high power laser systems.

Fabrication of Tungsten Carbide Films by Filtered Pulse Arc Deposition with Cemented Tungsten Carbide Cathodes

Tungsten carbide films (W-C films) were fabricated on silicon substrates by using the filtered pulse arc deposition (FPAD) method. Two types of cemented tungsten carbide (WC) were used as cathode, one containing Co and the other Ti, which were used as binders for forming the cathode shape. The films were fabricated by varying the pulse arc current and substrate bias voltage. The discharge, deposition and film properties were investigated under these deposition conditions. The cathode wear amount when using WC-Co (WC cathode containing Co) was found to be smaller than that measured when WC-Ti (WC cathode containing Ti) was used. The W-C film thickness was approximately 30 - 40 nm under all conditions, except when the pulse arc current was 50 A and the film thickness, was approximately 10 nm. Compared to the WC-Ti, the consumption of cathode material is suppressed in the WC-Co, indicating that the efficiency for film preparation of the latter is good. From the X-ray diffraction analysis, the crystalline phase of W-C films fabricated using WC-Co and WC-Ti were observed as W2C and WC1-x, respectively, indicating that different crystalline phases could be fabricated using different cathodes. From the X-ray photoelectron spectroscopy analysis, the oxidation layer formed by air exposure was observed to exclusively exist on the W-C film surface. Moreover, almost all oxygen in the oxidation layer bonded with tungsten.

Mechanical Properties of Composite SiNx/DLC Films Prepared by Filtered Cathodic Arc of Graphite Incorporated with RF Sputtering of Silicon Nitride

Composite SiNx/DLC films were deposited on Si substrate by RF magnetron sputtering of silicon nitride (Si3N4) target simultaneously with filtered cathode arc (FCA) of graphite. The RF power was fixed at 100 W whereas the arc currents of FCA were 20, 40, 60 and 80 A. The effects of arc current on the structure, surface roughness, density and mechanical properties of SiNx/DLC films were investigated. The results show that the arc current in the studied range has effect on the structure, surface roughness, density and mechanical properties of composite SiNx/DLC films. The composite SiNx/DLC films show the sp3 content between 53.5% and 66.7%, density between 2.54 and2.98 g/cm3, stress between 1.7 and 2.2 GPa, and hardness between 35 and 51 GPa. Furthermore, it was found that the density, stress and hardness correlate linearly with the sp3 content for composite SiNx/DLC films.

用于荧光内窥镜的陷波滤光片的研制

基于荧光内窥镜的实际应用确定陷波滤光片的技术指标,以光学薄膜理论为基础设计陷波滤光片结构,采用Essential Macleod软件辅助进行膜系设计,分析膜层敏感度,选择合适镀膜设备、工艺控制方法制备陷波滤光片。制备的滤光片通带透射率均值达到97%以上,截止背景达到OD6以上,透射波前畸变低于λ/4@632.8 nm,满足医疗健康微创精准手术的应用需求。

ESTIMATE ACCURACY OF NONLINEAR COEFFICIENTS OF SQUEEZEFILM DAMPER USING STATE VARIABLE FILTER METHOD

The estimate model for a nonlinear system of squeeze film damper (SFD) is described.The method of state variable filter (SVF) is used to estimate the coefficients of SFD.The factors which are critical to the estimate accuracy are discussed

45°倾斜应用的多通道干涉截止滤光片研制

光纤通信的发展对通信器件中薄膜滤光片提出了新的要求。根据45°倾斜应用的多通道干涉截止滤光片的设计指标,选择Nb2O5和SiO2为高、低折射率材料设计非规整膜系,以减少偏振效应的影响。结合APS1104型镀膜机的特点,分析了设计膜系的膜层灵敏度和薄膜生长过程中的模拟监控曲线,判断设计薄膜的可镀制性。然后采取直接光学监控方式,选择合适的镀制工艺成功镀制滤光片。测试结果表明:滤光片在45°倾斜应用条件下,1255~1365 nm、1475~1502 nm双通带最大插入损耗为0.199 dB,1547~1565 nm为反射带,通带隔离度为17.3 dB,满足系统应用需求。

Parylene F在V频段MMIC防护上的应用

为了验证Parylene F材料在V频段MMIC防护上的应用,设计了薄膜滤波器、铝基和铜基的可调放大器模块。采用真空气相沉积工艺在滤波器、放大器模块上制作Parylene F膜层。测试结果表明:5μm的膜层使滤波器中心频率向左偏移300~350 MHz,其插损、矩形系数几乎没有变化;5μm膜层使可调放大器模块增益峰值下降约0.1%~0.2%,正常态、衰减态下的增益均出现了漂移现象,但处理前后的增益曲线趋势基本一致;模块的噪声系数峰值增加了1.12~1.78 dB,正常态与衰减态下的噪声系数曲线均出现了漂移,但处理前后的噪声系数曲线趋势基本一致,且铜基腔体的噪声系数恶化较铝基腔体弱。分析结果表明,通过滤波器、可调放大器的补偿设计,可以实现Parylene F在V频段MMIC防护上的应用。

后处理工艺对抗静电滤料性能的影响

选择基布中嵌织导电纱线的基布导电型和面层中混入导电纤维的面层导电型2种典型抗静电滤料作为基材,进行聚四氟乙烯(PTFE)乳液浸渍处理和PTFE微孔膜覆膜处理,得到面密度和厚度均匀的复合滤料。再基于电阻率、静电压衰减时间及摩擦带电电压3项指标,从静电荷的消散及积聚2个角度,探究了后处理工艺对抗静电滤料性能的影响。试验结果表明:浸渍处理后,滤料抗静电性能提升,2种滤料的迎尘面表面电阻率和体积电阻率均降低且降幅小于1个数量级,基布导电型滤料和面层导电型滤料的迎尘面静电压半衰期分别由0.40 s、0.23 s缩短至0.38 s、0.20 s,摩擦时间为60 s时摩擦带电电压分别由1043 V、596 V减小至668 V、67 V。覆膜处理后,滤料抗静电性能下降,基布导电型滤料迎尘面表面电阻率升高且升幅为1个数量级、体积电阻率升高但升幅小于1个数量级,面层导电型滤料迎尘面表面电阻率和体积电阻率均升高且升幅为4个数量级,基布导电型滤料和面层导电型滤料迎尘面静电压半衰期分别由0.40 s、0.23 s延长至0.53 s、0.77 s,摩擦时间为60 s时摩擦带电电压分别由1043 V、596 V增大至1952 V、920 V。

异构脱蜡装置金属过滤器设计与试验研究

异构脱蜡装置原料蜡油过滤器易堵塞,再生效果差。将滤芯材料更换为高精度金属复合膜滤材,再生方式改为液体鼓泡+气体爆破反冲洗组合工艺系统,试验验证改进效果。结果表明,金属复合膜对蜡油中5μm以上金属颗粒的拦截效果超过98%,过滤后的蜡油固含量(质量分数)小于5×10^(-6),能够满足生产要求。经过多次循环反冲洗后,过滤器的初始压差和运行时间基本无变化,说明液体鼓泡+气体爆破反冲洗组合再生工艺应用效果良好。

基于光控监控厚度的胶合棱镜滤光膜系制备技术

胶合滤光棱镜主要是用来让不同波段的光谱或透射或反射以达到在一系列波段中选取所需要辐射波段的目的,其在两光路及以上的综合光电系统改善像质方面应用广泛,但是实际工艺加工中对于大陡度的胶合滤光棱镜膜系由于膜层厚度误差累积效应,经常在陡度附近透射波段出现“塌峰”现象,严重影响胶合滤光棱镜的实际光谱性能。阐述了光学薄膜透射率控制膜层厚度停止点的原理、镀膜机直接光控结构、胶合棱镜与光控片监控波长换算公式,并利用ARES1350镀膜机直接光控系统光控片监控胶合棱镜滤光膜系,提高了膜层厚度的控制精度,修正了膜层厚度的误差累计,达到了所制备膜系在790~825 nm, Ravg≥95%,895~935 nm, Tavg≥95%的滤光技术指标要求,膜层质量满足JB/T 8226.8—1999检测标准,为该类大陡度胶合滤光棱镜陡度附近透射率的控制提供了新的工艺方法。

基于基因荧光检测的长波通滤光片研制

光学滤光片是滤去杂质光干扰的重要光学器件,不同波段的滤光片在基因检测得到广泛应用。基于膜系设计理论与薄膜制备工艺,利用电子束蒸发离子辅助沉积技术,以Ta_(2)O_(5)和SiO_(2)为镀膜材料,在JGS1基底玻璃上设计并制备了一种截止中心λ_(0)=520 nm的高反射,透射带λ为530~750 nm的高透射长波通滤光片。通过分析膜层敏感度和电场分布,设置合理的晶控方案,调整工艺参数,避免监控高敏感膜层时石英晶控灵敏度下降,解决光谱透过率降低的问题。研制的滤光片在520 nm处反射率为99.77%,在530~750 nm波段平均透过率为98.58%,可满足应用需求。

薄膜体声波滤波器的离子束刻蚀修频工艺

薄膜体声波滤波器因设计模型与器件性能存在匹配度问题及制造过程中各工序的累计误差导致频率一致性差,严重影响了产品良率,因此实现晶圆级别的频率修整十分必要。介绍了离子束刻蚀工艺的原理、技术特点与优势,研究了刻蚀电压、刻蚀电流、刻蚀距离、Ar气体体积流量及单次刻蚀量对刻蚀效果的影响,表征了离子束刻蚀工艺对AlN钝化层厚度均一性、刻蚀精度及粗糙度的影响。探究了离子束刻蚀工艺在薄膜体声波滤波器频率修整上的应用,表征了离子束刻蚀工艺对钝化层的表面形貌及晶圆应力的影响。研究结果表明,刻蚀电压为1500 V、刻蚀电流为18 mA、刻蚀气体体积流量为4 cm^(3)/min、刻蚀距离为80 mm时,刻蚀精度高,具有一定借鉴意义;通过3轮电性能测试分析和离子束刻蚀工艺,频率标准差仅为1.23 MHz,大幅提升了薄膜体声波滤波器的频率一致性。

新型波浪加权式高性能声表面波滤波器设计

射频滤波器是移动通信中信号传输频率选择、噪声滤除干扰的不可或缺的关键器件。压电薄膜多层衬底结构的声表面波滤波器因具有高矩形度、低损耗等优点在近年来被广泛应用,但其谐振器固有的横向模式会极大影响滤波器性能。为此提出了一种新型的波浪加权式叉指设计的声表面波谐振器,该谐振器通过使用正弦函数作为交叠长度加权包络曲线,能够在不恶化谐振器性能的前提下有效抑制谐振器中的横向模式。将波浪加权式叉指设计的谐振器按照梯形拓扑结构级联,设计并制备了一款尺寸为1.1 mm×0.9 mm×0.55 mm的高性能滤波器。该滤波器中心频率为2.593 GHz,相对带宽为8.8%,插入损耗为0.52 dB。实物测试结果与仿真基本一致。