Study of total ionizing dose radiation effects on enclosed gate transistors in a commercial CMOS technology

This paper studies the total ionizing dose radiation effects on MOS （metal-oxide-semiconductor） transistors with normal and enclosed gate layout in a standard commercial CMOS （compensate MOS） bulk process. The leakage current, threshold voltage shift, and transconductance of the devices were monitored before and after γ-ray irradiation. The parameters of the devices with different layout under different bias condition during irradiation at different total dose are investigated. The results show that the enclosed layout not only effectively eliminates the leakage but also improves the performance of threshold voltage and transconductance for NMOS （n-type channel MOS） transistors. The experimental results also indicate that analogue bias during irradiation is the worst case for enclosed gate NMOS. There is no evident different behaviour observed between normal PMOS （p-type channel MOS） transistors and enclosed gate PMOS transistors.

Charge transport and quantum confinement in MoS2 dual-gated transistors

Semiconductive two dimensional(2D)materials have attracted significant research attention due to their rich band structures and promising potential for next-generation electrical devices.In this work,we investigate the MoS2 field-effect transistors(FETs)with a dual-gated(DG)architecture,which consists of symmetrical thickness for back gate(BG)and top gate(TG)dielectric.The thickness-dependent charge transport in our DG-MoS2 device is revealed by a four-terminal electrical measurement which excludes the contact influence,and the TCAD simulation is also applied to explain the experimental data.Our results indicate that the impact of quantum confinement effect plays an important role in the charge transport in the MoS2 channel,as it confines charge carriers in the center of the channel,which reduces the scattering and boosts the mobility compared to the single gating case.Furthermore,temperature-dependent transfer curves reveal that multi-layer MoS2 DG-FET is in the phonon-limited transport regime,while single layer MoS2 shows typical Coulomb impurity limited regime.

Improved performance of back-gate MoS2 transistors by NH3-plasma treating high-k gate dielectrics

NH3-plasma treatment is used to improve the quality of the gate dielectric and interface. Al2O3 is adopted as a buffer layer between HfO2 and MoS2 to decrease the interface-state density. Four groups of MOS capacitors and back-gate transistors with different gate dielectrics are fabricated and their C–V and I–V characteristics are compared. It is found that the Al2O3/HfO2 back-gate transistor with NH3-plasma treatment shows the best electrical performance: high on–off current ratio of 1.53 × 107, higher field-effect mobility of 26.51 cm2/V·s, and lower subthreshold swing of 145 m V/dec.These are attributed to the improvements of the gate dielectric and interface qualities by the NH3-plasma treatment and the addition of Al2O3 as a buffer layer.

SiC gate-controlled bipolar field effect composite transistor with polysilicon region for improving on-state current

A novel silicon carbide gate-controlled bipolar field effect composite transistor with poly silicon region(SiC GCBTP)is proposed.Different from the traditional electrode connection mode of SiC vertical diffused MOS(VDMOS),the P+region of P-well is connected with the gate in SiC GCBTP,and the polysilicon region is added between the P+region and the gate.By this method,additional minority carriers can be injected into the drift region at on-state,and the distribution of minority carriers in the drift region will be optimized,so the on-state current is increased.In terms of static characteristics,it has the same high breakdown voltage(811 V)as SiC VDMOS whose length of drift is 5.5μm.The on-state current of SiC GCBTP is 2.47×10^(-3)A/μm(V_(G)=10 V,V_(D)=10 V)which is 5.7 times of that of SiC IGBT and 36.4 times of that of SiC VDMOS.In terms of dynamic characteristics,the turn-on time of SiC GCBTP is only 0.425 ns.And the turn-off time of SiC GCBTP is similar to that of SIC insulated gate bipolar transistor(IGBT),which is 114.72 ns.

Field-effect transistors based on two-dimensional materials for logic applications

Field-effect transistors （FETs） for logic applications, graphene and MoS2, are discussed. These materials have based on two representative two-dimensional （2D） materials, drastically different properties and require different consider- ations. The unique band structure of graphene necessitates engineering of the Dirac point, including the opening of the bandgap, the doping and the interface, before the graphene can be used in logic applications. On the other hand, MoS2 is a semiconductor, and its electron transport depends heavily on the surface properties, the number of layers, and the carrier density. Finally, we discuss the prospects for the future developments in 2D material transistors.

Analysis and Characterization of Normally-Off Gallium Nitride High Electron Mobility Transistors

High electron mobility transistor(HEMT)based on gallium nitride(GaN)is one of the most promising candidates for the future generation of high frequencies and high-power electronic applications.This research work aims at designing and characterization of enhancement-mode or normally-off GaN HEMT.The impact of variations in gate length,mole concentration,barrier variations and other important design parameters on the performance of normally-off GaN HEMT is thoroughly investigated.An increase in the gate length causes a decrease in the drain current and transconductance,while an increase in drain current and transconductance can be achieved by increasing the concentration of aluminium(Al).For Al mole fractions of 23%,25%,and 27%,within Al gallium nitride(AlGaN)barrier,the GaN HEMT devices provide a maximum drain current of 347,408 and 474 mA/μm and a transconductance of 19,20.2,21.5 mS/μm,respectively.Whereas,for Al mole fraction of 10%and 15%,within AlGaN buffer,these devices are observed to provide a drain current of 329 and 283 mA/μm,respectively.Furthermore,for a gate length of 2.4,3.4,and 4.4μm,the device is observed to exhibit a maximum drain current of 272,235,and 221 mA/μm and the transconductance of 16.2,14,and 12.3 mS/μm,respectively.It is established that a maximum drain current of 997 mA/μm can be achieved with an Al concentration of 23%,and the device exhibits a steady drain current with enhanced transconductance.These observations demonstrate tremendous potential for two-dimensional electron gas(2DEG)for securing of the normally-off mode operation.A suitable setting of gate length and other design parameters is critical in preserving the normally-off mode operation while also enhancing the critical performance parameters at the same time.Due to the normallyon depletion-mode nature of GaN HEMT,it is usually not considered as suitable for high power levels,frequencies,and temperature.In such settings,a negative bias is required to enter the blocking condition;however,in the before-mentioned normally-off devices,the negative bias can be avoided and the channel can be depleted without applying a negative bias.

Design,modelling,and simulation of a floating gate transistor with a novel security feature

This study proposes a new generation of floating gate transistors(FGT)with a novel built-in security feature.The new device has applications in guarding the IC chips against the current reverse engineering techniques,including scanning capacitance microscopy(SCM).The SCM measures the change in the C–V characteristic of the device as a result of placing a minute amount of charge on the floating gate,even in nano-meter scales.The proposed design only adds a simple processing step to the conventional FGT by adding an oppositely doped implanted layer to the substrate.This new structure was first analyzed theoretically and then a two-dimensional model was extracted to represent its C–V characteristic.Furthermore,this model was verified with a simulation.In addition,the C–V characteristics relevant to the SCM measurement of both conventional and the new designed FGT were compared to discuss the effectiveness of the added layer in masking the state of the transistor.The effect of change in doping concentration of the implanted layer on the C–V characteristics was also investigated.Finally,the feasibility of the proposed design was examined by comparing its I–V characteristics with the traditional FGT.

Construction of MoS2 field effect transistor sensor array for the detection of bladder cancer biomarkers

Bladder cancer is one of the commonest malignant tumors of urinary system with high recurrence. However, currently developed bladder cancer urine diagnosis methods are hindered by the low detection sensitivity and accuracy. Herein, a molybdenum disulfide(MoS2) nanosheets-based field effect transistor(FET) sensor array was constructed for simultaneous detection of multiple bladder cancer biomarkers in human urine. With the excellent electronic property of MoS2 and the high specific identification capability of recognition molecules, the proposed biosensor array could simultaneously detect nuclear matrix protein 22(NMP22) and cytokeratin 8(CK8) with a wide linear range of 10-6–10-1 pg mL-1 and an ultra-low detection limit of 0.027 and 0.019 aM, respectively. Furthermore, this highly sensitive and specific MoS2 FET sensor array could be used to identify bladder cancer biomarkers from human urine samples. This designed high-performance biosensor array shows great potential in the future diagnosis of bladder cancer.

Significant enhancement of photoresponsive characteristics and mobility of MoS2-based transistors through hybridization with perovskite CsPbBr3 quantum dots

Inorganic perovskite CsPbBr3 quantum dots (QDs) are potential nanoscale photosensitizers;moreover,two-dimensional (2-D) molybdenum disulfide (MoS2) has been intensively studied for application in the active layers of optoelectronic devices.In this study,heterostructures of 2D-monolayered MoS2 with zero-dimensional functionalized CsPbBr3 QDs were prepared,and their nanoscale optical characteristics were investigated.The effect of n-type doping on the MoS2 monolayer after hybridization with perovskite CsPbBr3 QDs was observed using laser confocal microscope photoluminescenca (PL) and Raman spectra.Field-effect transistors (FETs) using MoS2 and the MoS2-CsPbBr3 QDs hybrid were also fabricated,and their electrical and photoresponsive characteristics were investigated in terms of the charge transfer effect.For the MoS2-CsPbBr3 QDs-based FETs,the field effect mobility and photoresponsivity upon light irradiation were enhanced by ~ 4 times and a dramatic ~ 17 times,respectively,compared to the FET prepared without the parovskite QDs and without light irradiation.It is noteworthy that the photoresponsivity of the MoS-2-CsPbBr3 QDs-based FETs significantly increased with increasing light power,which is completely contrary to the behavior observed in previous studies of MoS2-based FETs.The increased mobility and significant enhancement of the photoresponsivity can be attributed to the n-type doping effect and efficient energy transfer from CsPbBr3 QDs to MoS2.The results indicate that the optoelectronic characteristics of MoS2-based FETs can be significantly improved through hybridization with photosensitive parovskite CsPbBr3 QDs.

Field-effect transistor with a chemically synthesized MoS2 sensing channel for label-free and highly sensitive electrical detection of DNA hybridization

A field-effect transistor （FET） with two-dimensional （2D） few-layer MoS2 as a sensing-channel material was investigated for label-free electrical detection of the hybridization of deoxyribonucleic acid （DNA） molecules. The high-quality MoS2-channel pattern was selectively formedthrough the chemical reaction of the Mo layer with H2S gas. The MoS2 FET was very stable in an electrolyte and inert to pH changes due to the lack of oxygen-containing functionalities on the MoS2 surface. Hybridization of single-stranded target DNA molecules with single-stranded probe DNA molecules physically adsorbed on the MoS2 channel resulted in a shift of the threshold voltage （Vt,） in the negative direction and an increase in the drain current. The negative shift in Vth is attributed to electrostatic gating effects induced by the detachment of negatively charged probe DNA molecules from the channel surface after hybridization. A detection limit of 10 fM, high sensitivity of 17 mWdec, and high dynamic range of 106 were achieved. The results showed that a bio-FET with an ultrathin 2D MoS2 channel can be used to detect very small concentrations of target DNA molecules specifically hybridized with the probe DNA molecules.

Total dose radiation effects on SOI NMOS transistors with different layouts

Partially-depleted Silicon-On-Insulator Negative Channel Metal Oxide Semiconductor （SOI NMOS） transistors with different layouts are fabricated on radiation hard Separation by IMplanted OXygen （SIMOX） substrate and tested using 10 keV X-ray radiation sources. The radiation performance is characterized by transistor threshold voltage shift and transistor leakage currents as a function of the total dose up to 2.0×10^6 rad（Si）. The results show that the total dose radiation effects on NMOS devices are very sensitive to their layout structures.

Ballistic transport in single-layer MoS2 piezotronic transistors

Because of the coupling between semiconducting and piezoelectric properties in wurtzite materials, strain-induced piezo-charges can tune the charge transport across the interface or junction, which is referred to as the piezotronic effect. For devices whose dimension is much smaller than the mean free path of carriers （such as a single atomic layer of MoS2）, ballistic transport occurs. In this study, transport in the monolayer MoS2 piezotronic transistor is studied by presenting analytical solutions for two-dimensional （2D） MoS2. Furthermore, a numerical simulation for guiding future 2D piezotronic nanodevice design is presented.

Impurity Deionization Effects on Surface Recombination DC Current-Voltage Characteristics in MOS Transistors

Impurity deionization on the direct-current current-voltage characteristics from electron-hole recombi- nation （R-DCIV） at SiO2/Si interface traps in MOS transistors is analyzed using the steady-state Shockley-Read-Hall recombination kinetics and the Fermi distributions for electrons and holes. Insignificant distortion is observed over 90% of the bell-shaped R-DCIV curves centered at their peaks when impurity deionization is excluded in the theory. This is due to negligible impurity deionization because of the much lower electron and hole concentrations at the interface than the impurity concentration in the 90% range.

Tunnel contacted MoS_2 transistor makes thinnest polarity-tunable rectifier

With the support by the National Natural Science Foundation of China,a collaborative study by the research group led by Prof.Zhang Zhidong(张志东)and Prof.Han Zheng(韩拯)from the Institute of Metal Research,Chinese Academy of Sciences demonstrates that by intercalating a tunneling layer

Nanosensitive Silicon Microprobes for Mechanical Detection and Measurements

Nanosensitive mechanical microprobes with CMOS transistors, inverters, inverters cascades and ring oscillators, integrated on the thin silicon cantilevers are presented. Mechanical stress shifts linear, steep switching fragment of the inverters’ electrical characteristics. Microprobes were fabricated with use of the standard CMOS technology (3.5 μm design rules, one level polysilicon gate and one level of the metal interconnections) and relief MEMS technique. Control of the silicon cantilever thickness was satisfactory in the range above the few micrometers. Several computer simulations were done to analyze and optimize transistors location on the cantilever, in respect to the mechanical stress distribution. Results of the microprobes electromechanical tests confirm high deflection sensitivity 1.2 - 1.8 mV/nm and force sensitivity 2.0 - 2.4 mV/nN, both in nano ranges. Microprobes, with the ring oscillators revealed sensitivities 5 - 8 Hz/nm. These microprobes seem to be appropriate for applications in precise chemical and biochemical sensing.

Manganese and chromium doping in atomically thin MoS2

Recently,two-dimensional materials have been attracting increasing attention because of their novel properties and promising applications.However,the impurity doping remains a significant challenge owing to the lack of the doping strategy in the atomically thin layers.Here we report on the chromium（Cr） and manganese（Mn）doping in atomically-thin MoS_2 crystals grown by chemical vapor deposition.The Cr/Mn doped MoS_2 samples are characterized by a peak at 1.76 and 1.79 eV in photoluminescence spectra,respectively,compared with the undoped one at 1.85 eV.The field-effect transistor（FET） devices based on the Mn doping show a higher threshold voltage than that of the pure MoS_2 while the Cr doping exhibits the opposite behavior.Importantly,the carrier concentration in these samples displays a remarkable difference arising from the doping effect,consistent with the evolution of the FET performance.The temperature-dependent conductivity measurements further demonstrate a large variation in activation energy.The successful incorporation of the Mn and Cr impurities into the monolayer MoS_2 paves the way towards the high Curie temperature two-dimensional dilute magnetic semiconductors.

Monolayer-molybdenum-disulfide-based nano-optomechanical transistor and tunable nonlinear responses

Atomically thin two-dimensional semiconductor nanomaterials have attained considerable attention currently. Here, we present a nano-optomechanical system based on a suspended monolayer molybdenum disulfide （MoS2）. The linear and nonlinear coherent optical properties of this system, and the phenomenon ofphonon-induced transparency are demonstrated. The transmission of the probe field can be manipulated by the power of a second ‘gating＇ （pump） field, which indicates a promising candidate for an optical transistor. We further study the nonlinear effect of the system, and the optical Kerr effect of the monolayer MoS2 resonator can be regulated under different parameter regimes. This scheme proposed here may indicate potential chip-scale applications of monolayer MoS2 resonator in quantum information with the currently popular pump-probe technology.

A surface potential-based non-charge-sheet core model for undoped surrounding-gate MOSFETs

A surface potential based non-charge-sheet core model for cylindrical undoped surrounding-gate （SRG） MOSFETs is presented. It is based on the exact surface potential solution of Poisson＇s equation and Pao-Sah＇s dual integral without the charge-sheet approximation, allowing the SRG-MOSFET characteristics to be adequately described by a single set of the analytic drain current equation in terms of the surface potential evaluated at the source and drain ends. It is valid for all operation regions and traces the transition from the linear to saturation and from the sub-threshold to strong inversion region without fitting-parameters, and verified by the 3-D numerical simulation.

Manipulation of Coherent Optical Propagation Based on Monolayer MoS2 Resonator

Atomically thin two-dimensional semiconductor nanomaterials have attained considerable attention currently.We here theoretically investigate the phenomena of slow and superluminal light based on the MoS2 resonator system driven by two-tone fields.Superluminal and ultraslow probe light without absorption can be obtained via manipulating the pump laser on-and off-resonant with the exciton frequency under different parameters regimes,respectively,of which the magnitude is larger than that in a carbon nanotube resonator.The bandwidth of the probe spectrum determined by the quality factor Q of MoS2 resonator is also presented.Furthermore,we also demonstrate the phenomenon of phonon induced transparency and show an optical transistor in the system.The all-optical device based on MoS2 resonator may indicate potential chip-scale applications in quantum information with the currently popular pump-probe technology.

晶体管、MOS 器件

Y2002-63120-305 0217331SPICE 的功率达林顿晶体管的新电热动态宏观模型=A new electrothermal dynamic macromodel of the powerdarlington transistor for SPICE[会,英]/Zarebski,J.//The IEEE International Symposium on Circuits and Sys-tems Vol.3 of 5.—305～308(HE)