期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
Low-Frequency Noise in Gate Tunable Topological Insulator Nanowire Field Emission Transistor near the Dirac Point
1
作者 张浩 宋志军 +2 位作者 冯军雅 姬忠庆 吕力 《Chinese Physics Letters》 SCIE CAS CSCD 2016年第8期109-112,共4页
Low-frequency flicker noise is usually associated with material defects or imperfection of fabrication procedure. Up to now, there is only very limited knowledge about flicker noise of the topological insulator, whose... Low-frequency flicker noise is usually associated with material defects or imperfection of fabrication procedure. Up to now, there is only very limited knowledge about flicker noise of the topological insulator, whose topologically protected conducting surface is theoretically immune to back scattering. To suppress the bulk conductivity we synthesize antimony doped Bi2Se3 nanowires and conduct transport measurements at cryogenic temperatures. The low-frequency current noise measurement shows that the noise amplitude at the high-drain current regime can be described by Hooge's empirical relationship, while the noise level is significantly lower than that predicted by Hooge's model near the Dirac point. Furthermore, different frequency responses of noise power spectrum density for specific drain currents at the low drain current regime indicate the complex origin of noise sources of topological insulator. 展开更多
关键词 of in Low-Frequency Noise in gate Tunable Topological Insulator Nanowire Field Emission Transistor near the Dirac Point for were is with EDX that from
下载PDF
Metal–insulator transition in few-layered GaTe transistors
2
作者 Xiuxin Xia Xiaoxi Li Hanwen Wang 《Journal of Semiconductors》 EI CAS CSCD 2020年第7期28-32,共5页
Two-dimensional(2D)materials have triggered enormous interest thanks to their interesting properties and potential applications,ranging from nanoelectronics to energy catalysis and biomedicals.In addition to other wid... Two-dimensional(2D)materials have triggered enormous interest thanks to their interesting properties and potential applications,ranging from nanoelectronics to energy catalysis and biomedicals.In addition to other widely investigated 2D materials,GaTe,a layered material with a direct band gap of^1.7 e V,is of importance for applications such as optoelectronics.However,detailed information on the transport properties of GaTe is yet to be explored,especially at low temperatures.Here,we report on electrical transport measurements on few-layered GaTe field effect transistors(FETs)encapsulated by h-BN at different temperatures.We find that by tuning the carrier density,ambipolar transport was realized in GaTe devices,and an electrical-field-induced metal to insulator transition(MIT)was observed when it was hole doped.The mobilities of GaTe devices show a clear dependence on temperature and increase with the decrease of temperature,reaching^1200 cm2 V-1s-1 at 3 K.Our findings may inspire further electronic studies in devices based on GaTe. 展开更多
关键词 metal-insulator transition gate tunable gate field effect transistors
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部