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From intrinsic dielectric loss to geometry patterns: Dual-principles strategy for ultrabroad band microwave absorption 被引量:19
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作者 Bin Quan Weihua Gu +6 位作者 Jiaqi Sheng Xinfeng Lv Yuyi Mao Lie Liu Xiaogu Huang Zongjun Tian Guangbin Ji 《Nano Research》 SCIE EI CAS CSCD 2021年第5期1495-1501,共7页
As electromagnetic absorbers with wide absorption bandwidth are highly pursued in the cutting-edge electronic and telecommunication industries, the traditional dielectric or magnetic bulky absorbers remain concerns of... As electromagnetic absorbers with wide absorption bandwidth are highly pursued in the cutting-edge electronic and telecommunication industries, the traditional dielectric or magnetic bulky absorbers remain concerns of extending the effective absorption bandwidth. In this work, a dual-principle strategy has been proposed to make a better understanding of the impact of utilizing conductive absorption fillers coupled with implementing artificial structures design on the absorption performance. In the comparison based on the microscopic studies, the carbon nanotubes (CNTs)-based absorbers are confined to narrow operating bandwidth and relatively fixed response frequency range, which can not fulfill the ever-growing demands in the application. With subsequent macroscopic structure design based on the CNTs-based dielectric fillers, the artificial patterns show much more broadened absorption bandwidth, covering the majority of C-band, the whole X-band, and Ku-band, due to the tailored electromagnetic parameters and more reflections and scatterings. The results suggest that the combination of developing microscopic powder/bulky absorbers and macroscopic configuration design will fundamentally extend the effective operating bandwidth of microwave. 展开更多
关键词 geometry patterns numerical simulation three-dimensional(3D)printing broadband microwave absorption
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Tuning the crystal structure and optical properties of selective area grown InGaAs nanowires
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作者 Zahra Azimi Aswani Gopakumar +6 位作者 Amira SAmeruddin Li Li Thien Truong Hieu TNguyen Hark Hoe Tan Chennupati Jagadish Jennifer Wong-Leung 《Nano Research》 SCIE EI CSCD 2022年第4期3695-3703,共9页
Catalyst-free InGaAs nanowires grown by selective area epitaxy are promising building blocks for future optoelectronic devices in the infrared spectral region.Despite progress,the role of pattern geometry and growth p... Catalyst-free InGaAs nanowires grown by selective area epitaxy are promising building blocks for future optoelectronic devices in the infrared spectral region.Despite progress,the role of pattern geometry and growth parameters on the composition,microstructure,and optical properties of InGaAs nanowires is still unresolved.Here,we present an optimised growth parameter window to achieve highly uniform In1-xGaxAs nanowire arrays on GaAs(111)B substrate over an extensive range of Ga concentrations,from 0.1 to 0.91,by selective-area metal-organic vapor-phase epitaxy.We observe that the Ga content always increases with decreasing In/(Ga+In)precursor ratio and group V flow rate and increasing growth temperature.The increase in Ga content is supported by a blue shift in the photoluminescence peak emission.The geometry of the nanowire arrays also plays an important role in the resulting composition.Notably,increasing the nanowire pitch size from 0.6 to 2μm in a patterned array shifts the photoluminescence peak emission by up to 120 meV.Irrespective of these growth and geometry parameters,the Ga content determines the crystal structure,resulting in a predominantly wurtzite structure for xGa≤0.3 and a predominantly zinc blende phase for xGa≥0.65.These insights on the factors controlling the composition of InGaAs nanowires grown by a scalable catalyst-free approach provide directions for engineering nanowires as functional components of future optoelectronic devices. 展开更多
关键词 InGaAs nanowires ternary semiconductors selective-area metal-organic vapor-phase epitaxy NANOSTRUCTURE pattern geometry
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