Kinoform单透镜可以高效聚焦硬X射线至纳米量级,在X射线纳米显微学和纳米光谱学领域有着重要的应用前景.基于衍射光学和傅里叶光学理论,给出了X射线经由Kinoform单透镜聚焦的物理模型,基于数值模拟,研究了不同材料、光子能量、台阶数量...Kinoform单透镜可以高效聚焦硬X射线至纳米量级,在X射线纳米显微学和纳米光谱学领域有着重要的应用前景.基于衍射光学和傅里叶光学理论,给出了X射线经由Kinoform单透镜聚焦的物理模型,基于数值模拟,研究了不同材料、光子能量、台阶数量和顶点曲率半径对Kinoform单透镜聚焦性能的影响.结果表明,孔径为1 mm的Kinoform单透镜对30 ke V的X射线聚焦,可以得到14 nm焦斑、62μm焦深,且可实现4个量级的光强增益和大于30%的光强透过率.展开更多
The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is ...The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current （DC） magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35–41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.展开更多
We designed and fabricated a multilayer Laue lens （MLL） as a hard X-ray focusing device. WSi2/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sam...We designed and fabricated a multilayer Laue lens （MLL） as a hard X-ray focusing device. WSi2/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sample was fabricated by using direct current （DC） magnetron sputtering technology and then was sliced and thinned to form an MLL. The thickness of each layer was determined by scanning electron microscopy （SEM） image analysis with marking layers. The focusing property of the MLL was measured at Beamline 15U, Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 92 nm are obtained at photon energy of 14 keV.展开更多
文摘Kinoform单透镜可以高效聚焦硬X射线至纳米量级,在X射线纳米显微学和纳米光谱学领域有着重要的应用前景.基于衍射光学和傅里叶光学理论,给出了X射线经由Kinoform单透镜聚焦的物理模型,基于数值模拟,研究了不同材料、光子能量、台阶数量和顶点曲率半径对Kinoform单透镜聚焦性能的影响.结果表明,孔径为1 mm的Kinoform单透镜对30 ke V的X射线聚焦,可以得到14 nm焦斑、62μm焦深,且可实现4个量级的光强增益和大于30%的光强透过率.
基金Supported by National Natural Science Foundation of China (10825521)973 Project (2011CB922203)Natural Science Foundation of Shanghai (09ZR1434300)
文摘The multilayer Laue lens （MLL） is a novel diffraction optics which can realize nanometer focusing of hard X-rays with high efficiency. In this paper, a 7.9 μm-thick MLL with the outmost layer thickness of 15 nm is designed based on dynamical diffraction theory. The MLL is fabricated by first depositing the depth-graded multilayer using direct current （DC） magnetron sputtering technology. Then, the multilayer sample is sliced, and both cross-sections are thinned and polished to a depth of 35–41 μm. The focusing property of the MLL is measured at the Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 205 nm and 221 nm are obtained at E=14 keV and 18 keV, respectively. It demonstrates that the fabricated MLL can focus hard X-rays into nanometer scale.
基金Supported by National Natural Science Foundation of China(U1432244,11375131)Major State Basic Research Development Program(2011CB922203)
文摘We designed and fabricated a multilayer Laue lens （MLL） as a hard X-ray focusing device. WSi2/Si multilayers were chosen owing to their excellent optical properties and relatively sharp interface. The multilayer sample was fabricated by using direct current （DC） magnetron sputtering technology and then was sliced and thinned to form an MLL. The thickness of each layer was determined by scanning electron microscopy （SEM） image analysis with marking layers. The focusing property of the MLL was measured at Beamline 15U, Shanghai Synchrotron Facility （SSRF）. One-dimensional （1D） focusing resolutions of 92 nm are obtained at photon energy of 14 keV.
