Heterojunction with intrinsic thin-layer （HIT） solar cells are sensitive to interface state density. Tradi- tional texture process for silicon solar cells is not suitable for HIT one. Thus, sodium hydroxide （NaOH）...Heterojunction with intrinsic thin-layer （HIT） solar cells are sensitive to interface state density. Tradi- tional texture process for silicon solar cells is not suitable for HIT one. Thus, sodium hydroxide （NaOH）, isopropanol （IPA） and mixed additive were tentatively introduced for the texturization of HIT solar cells in this study. Then, a mixture including nitric acid （HNO3）, hydrofluoric acid （HF） and glacial acetic acid （CH3COOH） was employed to round pyramid structure. The morphology of textured surface and the influence of etching time on surface reflectance were studied, and the relationship between etching time and surface reflectance, vertex angle of pyramid structure was analyzed. It was found that the mixture consisting of 1.1 wt% NaOH, 3 vol% IPA and 0.3 vol% additives with etching time of 22.5 min is the best for H1T solar cells under the condition of 80℃. Uniform pyramid structure was observed and the base width of pyramid was about 2-4 μm. The average surface reflec- tance was 11.68%. Finally the effect of different processes on the performance of HIT solar cells was investigated. It was shown that these texturization and rounding techni- ques used in this study can increase short circuit current （Jsc）, but they have little influence on fill factor （FF） and open circuit voltage （Voo） of HIT solar cells.展开更多
采用射频等离子体增强化学气相沉积（RF-PECVD）法在低温、低功率的条件下制备了一系列本征硅薄膜,研究了硅烷浓度（CS）对薄膜微结构、光电特性及表面钝化性能的影响.将本征硅薄膜作为钝化层应用到氢化纳米晶硅/晶硅（nc-Si：H/c-Si）...采用射频等离子体增强化学气相沉积（RF-PECVD）法在低温、低功率的条件下制备了一系列本征硅薄膜,研究了硅烷浓度（CS）对薄膜微结构、光电特性及表面钝化性能的影响.将本征硅薄膜作为钝化层应用到氢化纳米晶硅/晶硅（nc-Si：H/c-Si）硅异质结（SHJ）太阳电池中,研究了硅烷浓度和薄膜厚度对电池性能的影响.实验发现：随着硅烷浓度的降低,本征硅薄膜的晶化率、氢含量、结构因子、光学带隙和光敏性等都在过渡区急剧变化;本征硅薄膜的钝化性能由薄膜的氢含量及氢的成键方式决定.靠近过渡区的薄膜具有较好的致密性和光敏性,氢含量最高,带隙态密度低,且主要以Si H形式成键,对硅片表现出优异的钝化性能,使电池的开路电压大幅提高.但是,当薄膜的厚度过小时,会严重影响其钝化质量.本实验中,沉积本征硅薄膜的最优硅烷浓度为6%（摩尔分数）,且当薄膜厚度为~8 nm时,所制备电池的性能最好.实验最终获得了开路电压为672 m V,短路电流密度为35.1 m A·cm-2,填充因子为0.73,效率为17.3%的nc-Si：H/c-Si SHJ太阳电池.展开更多
运用模拟软件AFORS-HET对TCO/a-Si∶H(n)/a-Si∶H(i)/c-Si(p)/Ag结构的异质结(HIT)太阳电池进行仿真,分析其光伏输出特性随发射层掺杂浓度、晶硅衬底掺杂浓度、透明导电氧化物薄膜(TCO)的选择以及TCO功函数的变化规律。结果显示,当发射...运用模拟软件AFORS-HET对TCO/a-Si∶H(n)/a-Si∶H(i)/c-Si(p)/Ag结构的异质结(HIT)太阳电池进行仿真,分析其光伏输出特性随发射层掺杂浓度、晶硅衬底掺杂浓度、透明导电氧化物薄膜(TCO)的选择以及TCO功函数的变化规律。结果显示,当发射层掺杂浓度大于1.0×1020cm^(-3),晶硅衬底掺杂浓度大于1.2×10^(16)cm^(-3),以ZnO为TCO层且Zn O的功函数低于4.4 e V时,电池的开路电压、短路电流密度、填充因子及电池转换效率达到最优值,光电转换效率最高达到19.18%。展开更多
HIT(Heterojunction with intrinsic thin-layer)太阳能电池,即具有本征非晶硅薄层的异质结太阳能电池,利用了非晶硅薄膜/单晶硅衬底的异质结结构,从而结合了单晶硅和非晶硅太阳能电池优良的特点。这种类型结构的电池可以在较低温度下(&...HIT(Heterojunction with intrinsic thin-layer)太阳能电池,即具有本征非晶硅薄层的异质结太阳能电池,利用了非晶硅薄膜/单晶硅衬底的异质结结构,从而结合了单晶硅和非晶硅太阳能电池优良的特点。这种类型结构的电池可以在较低温度下(<250℃)制造,具有良好的光照稳定性和温度稳定性,成本低而且效率高,目前效率达到26.7%。文章简述了HIT太阳能电池的结构和工作原理,并且总结了HIT电池的研究和应用现状。除此之外,还分析了提高HIT太阳能电池效率的方法以及HIT电池广阔的应用前景和巨大的商业化潜力。展开更多
文摘Heterojunction with intrinsic thin-layer （HIT） solar cells are sensitive to interface state density. Tradi- tional texture process for silicon solar cells is not suitable for HIT one. Thus, sodium hydroxide （NaOH）, isopropanol （IPA） and mixed additive were tentatively introduced for the texturization of HIT solar cells in this study. Then, a mixture including nitric acid （HNO3）, hydrofluoric acid （HF） and glacial acetic acid （CH3COOH） was employed to round pyramid structure. The morphology of textured surface and the influence of etching time on surface reflectance were studied, and the relationship between etching time and surface reflectance, vertex angle of pyramid structure was analyzed. It was found that the mixture consisting of 1.1 wt% NaOH, 3 vol% IPA and 0.3 vol% additives with etching time of 22.5 min is the best for H1T solar cells under the condition of 80℃. Uniform pyramid structure was observed and the base width of pyramid was about 2-4 μm. The average surface reflec- tance was 11.68%. Finally the effect of different processes on the performance of HIT solar cells was investigated. It was shown that these texturization and rounding techni- ques used in this study can increase short circuit current （Jsc）, but they have little influence on fill factor （FF） and open circuit voltage （Voo） of HIT solar cells.
文摘采用射频等离子体增强化学气相沉积（RF-PECVD）法在低温、低功率的条件下制备了一系列本征硅薄膜,研究了硅烷浓度（CS）对薄膜微结构、光电特性及表面钝化性能的影响.将本征硅薄膜作为钝化层应用到氢化纳米晶硅/晶硅（nc-Si：H/c-Si）硅异质结（SHJ）太阳电池中,研究了硅烷浓度和薄膜厚度对电池性能的影响.实验发现：随着硅烷浓度的降低,本征硅薄膜的晶化率、氢含量、结构因子、光学带隙和光敏性等都在过渡区急剧变化;本征硅薄膜的钝化性能由薄膜的氢含量及氢的成键方式决定.靠近过渡区的薄膜具有较好的致密性和光敏性,氢含量最高,带隙态密度低,且主要以Si H形式成键,对硅片表现出优异的钝化性能,使电池的开路电压大幅提高.但是,当薄膜的厚度过小时,会严重影响其钝化质量.本实验中,沉积本征硅薄膜的最优硅烷浓度为6%（摩尔分数）,且当薄膜厚度为~8 nm时,所制备电池的性能最好.实验最终获得了开路电压为672 m V,短路电流密度为35.1 m A·cm-2,填充因子为0.73,效率为17.3%的nc-Si：H/c-Si SHJ太阳电池.
文摘运用模拟软件AFORS-HET对TCO/a-Si∶H(n)/a-Si∶H(i)/c-Si(p)/Ag结构的异质结(HIT)太阳电池进行仿真,分析其光伏输出特性随发射层掺杂浓度、晶硅衬底掺杂浓度、透明导电氧化物薄膜(TCO)的选择以及TCO功函数的变化规律。结果显示,当发射层掺杂浓度大于1.0×1020cm^(-3),晶硅衬底掺杂浓度大于1.2×10^(16)cm^(-3),以ZnO为TCO层且Zn O的功函数低于4.4 e V时,电池的开路电压、短路电流密度、填充因子及电池转换效率达到最优值,光电转换效率最高达到19.18%。
文摘HIT(Heterojunction with intrinsic thin-layer)太阳能电池,即具有本征非晶硅薄层的异质结太阳能电池,利用了非晶硅薄膜/单晶硅衬底的异质结结构,从而结合了单晶硅和非晶硅太阳能电池优良的特点。这种类型结构的电池可以在较低温度下(<250℃)制造,具有良好的光照稳定性和温度稳定性,成本低而且效率高,目前效率达到26.7%。文章简述了HIT太阳能电池的结构和工作原理,并且总结了HIT电池的研究和应用现状。除此之外,还分析了提高HIT太阳能电池效率的方法以及HIT电池广阔的应用前景和巨大的商业化潜力。
