Two-dimensional(2D)materials as channel materials provide a promising alternative route for future electronics and flexible electronics,but the device performance is affected by the quality of interface between the 2D...Two-dimensional(2D)materials as channel materials provide a promising alternative route for future electronics and flexible electronics,but the device performance is affected by the quality of interface between the 2D-material channel and the gate dielectric.Here we demonstrate an indium selenide(lnSe)/hexagonal boron nitride(hBN)/graphite heterostructure as a 2D field-effect transistor(FET),with InSe as channel material,hBN as dielectric,and graphite as gate.The fabricated FETs feature high electron mobility up to 1,146 cm2·V^-1·s^-1 at room temperature and on/off ratio up to 1010 due to the atomically flat gate dielectric.Integrated digital inverters based on InSe/hBN/graphite heterostructures are constructed by local gating modulation and an ultrahigh voltage gain up to 93.4 is obtained.Taking advantages of the mechanical flexibility of these materials,we integrated the heterostructured InSe FET on a flexible substrate,exhibiting little modification of device performance at a high strain level of up to 2%.Such high-performance heterostructured device configuration based on 2D materials provides a new way for future electronics and flexible electronics.展开更多
基金Acknowledgements This work was supported by the National Key Research&Development Projects of China(Nos.2016YFA0202300,2018FYA0305800)National Natural Science Foundation of China(Nos.61674170,61888102)+2 种基金K.C.Wong Education Foundation,Strategic Priority Research Program of Chinese Academy of Sciences(Nos.XDB30000000,XDB28000000)Youth Innovation Promotion Association of CAS(No.20150005)the CAS Pioneer Hundred Talents Program.A portion of the research was performed in the CAS Key Laboratory of Vacuum Physics.The authors gratefully acknowledge Haifang Yang,Junjie Li,and Changzi Gu for help in device fabrication,and Yu-Yang Zhang and Shixuan Du for helpful discussions.
文摘Two-dimensional(2D)materials as channel materials provide a promising alternative route for future electronics and flexible electronics,but the device performance is affected by the quality of interface between the 2D-material channel and the gate dielectric.Here we demonstrate an indium selenide(lnSe)/hexagonal boron nitride(hBN)/graphite heterostructure as a 2D field-effect transistor(FET),with InSe as channel material,hBN as dielectric,and graphite as gate.The fabricated FETs feature high electron mobility up to 1,146 cm2·V^-1·s^-1 at room temperature and on/off ratio up to 1010 due to the atomically flat gate dielectric.Integrated digital inverters based on InSe/hBN/graphite heterostructures are constructed by local gating modulation and an ultrahigh voltage gain up to 93.4 is obtained.Taking advantages of the mechanical flexibility of these materials,we integrated the heterostructured InSe FET on a flexible substrate,exhibiting little modification of device performance at a high strain level of up to 2%.Such high-performance heterostructured device configuration based on 2D materials provides a new way for future electronics and flexible electronics.
