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GaN hexagonal pyramids formed by a photo-assisted chemical etching method
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作者 张士英 修向前 +7 位作者 华雪梅 谢自力 刘斌 陈鹏 韩平 陆海 张荣 郑有炓 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第5期588-593,共6页
A series of experiments were conducted to systematically study the effects of etching conditions on GaN by a con-venient photo-assisted chemical (PAC) etching method. The solution concentration has an evident influe... A series of experiments were conducted to systematically study the effects of etching conditions on GaN by a con-venient photo-assisted chemical (PAC) etching method. The solution concentration has an evident influence on the surface morphology of GaN and the optimal solution concentrations for GaN hexagonal pyramids have been identified. GaN with hexagonal pyramids have higher crystal quality and tensile strain relaxation compared with as-grown GaN. A detailed anal- ysis about evolution of the size, density and optical property of GaN hexagonal pyramids is described as a function of light intensity. The intensity of photoluminescence spectra of GaN etched with hexagonal pyramids significantly increases compared to that of as-grown GaN due to multiple scattering events, high quality GaN with pyramids and the Bragg effect. 展开更多
关键词 hexagonal pyramids gan photo-assisted chemical etching
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S i基外延G aN中缺陷的腐蚀研究 被引量:2
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作者 赵丽伟 刘彩池 +8 位作者 滕晓云 朱军山 郝秋艳 孙世龙 王海云 徐岳生 胡家辉 冯玉春 郭宝平 《人工晶体学报》 EI CAS CSCD 北大核心 2005年第6期1079-1082,共4页
本文采用KOH:H2O=3:20~1:25(质量比)的KOH溶液,对Si基外延GaN进行湿法腐蚀.腐蚀后用扫描电子显微镜(SEM)观察,GaN面出现了六角腐蚀坑,它是外延层中的位错露头,密度约108/cm2.腐蚀坑的密度随腐蚀时间延长而增加,说明GaN外延生长过程中... 本文采用KOH:H2O=3:20~1:25(质量比)的KOH溶液,对Si基外延GaN进行湿法腐蚀.腐蚀后用扫描电子显微镜(SEM)观察,GaN面出现了六角腐蚀坑,它是外延层中的位错露头,密度约108/cm2.腐蚀坑的密度随腐蚀时间延长而增加,说明GaN外延生长过程中位错密度是逐渐降低的,部分位错因相互作用而终止于GaN体内.观察缺陷腐蚀形貌还发现,接近裂纹处腐蚀坑的密度要高于远离裂纹处腐蚀坑的密度,围绕裂纹有许多由裂纹引起的位错.腐蚀坑的密度可以很好地反映GaN晶体的质量.晶体质量较差的GaN片,腐蚀后其六角腐蚀坑的密度高. 展开更多
关键词 gan 湿法腐蚀 六角腐蚀坑 SEM
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