期刊文献+
共找到2篇文章
< 1 >
每页显示 20 50 100
高导热氮化硼/芳纶沉析复合薄膜的制备及性能 被引量:1
1
作者 谢璠 王亚芳 +4 位作者 卓龙海 秦盼亮 宁逗逗 王丹妮 陆赵情 《高等学校化学学报》 SCIE EI CAS CSCD 北大核心 2020年第3期582-590,共9页
利用多巴胺(DA)的氧化自聚合特性,对六方氮化硼(h-BN)进行表面修饰,并以多巴胺改性后的氮化硼(h-BN@PDA)为导热填料,对基体芳纶沉析纤维(AF)进行填充,通过真空辅助抽滤法制备多巴胺改性氮化硼/芳纶沉析(h-BN@PDA/AF)复合薄膜,并对其微... 利用多巴胺(DA)的氧化自聚合特性,对六方氮化硼(h-BN)进行表面修饰,并以多巴胺改性后的氮化硼(h-BN@PDA)为导热填料,对基体芳纶沉析纤维(AF)进行填充,通过真空辅助抽滤法制备多巴胺改性氮化硼/芳纶沉析(h-BN@PDA/AF)复合薄膜,并对其微观形貌、表面官能团、导热性能、绝缘性能及力学性能进行研究.结果表明,聚多巴胺(PDA)包覆在h-BN表面,并引入活性基团,与AF纤维产生氢键,改善了两者的界面结合,显著提高了复合薄膜导热性能及绝缘性能.当h-BN@PDA含量为70%时,h-BN@PDA/AF复合薄膜的导热系数为1.36 W/(m·K),与纯芳纶沉析薄膜相比,导热系数的增幅约为697.65%,体积电阻率为5.96×10^14Ω·m,拉伸模量高达287.19 MPa. 展开更多
关键词 氮化硼 多巴胺 芳纶沉析 绝缘性能 导热性能
下载PDF
Oxygen-suppressed selective growth of monolayer hexagonal boron nitride on copper twin crystals
2
作者 Xuemei Li Yao Li +4 位作者 Qin Wang Jun Yin Jidong Li Jin Yu Wanlin Guo 《Nano Research》 SCIE EI CAS CSCD 2017年第3期826-833,共8页
Controlled growth of hexagonal boron nitride (h-BN) with desired properties is essential for its wide range of applications. Here, we systematically carried out the chemical vapor deposition of monolayer h-BN on Cu ... Controlled growth of hexagonal boron nitride (h-BN) with desired properties is essential for its wide range of applications. Here, we systematically carried out the chemical vapor deposition of monolayer h-BN on Cu twin crystals. It was found that h-BN nucleated and grew preferentially and simultaneously on the narrow twin crystal strips present in the Cu substrates. The density functional theory calculations revealed that the introduction of oxygen could effidently ~ne the selectivity. This is because of the reduction in the dehydrogenation barrier of the precursor molecules by the introduction of oxygen. Our findings throw light on the direct growth of functional h-BN nanoribbons on nano-twinned crystal strips and switching of the growth behavior of h-BN films by oxygen. 展开更多
关键词 monolayer hexagonalboron nitride copper twin crystals OXYGEN selectivity chemical vapor deposition
原文传递
上一页 1 下一页 到第
使用帮助 返回顶部