期刊文献+
共找到1篇文章
< 1 >
每页显示 20 50 100
Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry 被引量:11
1
作者 聂西度 梁逸曾 +1 位作者 唐有根 谢华林 《Journal of Central South University》 SCIE EI CAS 2012年第9期2416-2420,共5页
The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was diss... The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was dissolved in HNO3 and HCI by microwave digestion. Most of the spectral interferences could be avoided by measuring in the high resolution mode. The matrix effects because of the presence of excess HC1 and nickel were evaluated. Correction for matrix effects was made using Sc, Rh and T1 as internal standards. The optimum conditions for the determination were tested and discussed. The detection limits range from 0.012 to 1.76 ~tg/g depending on the type of elements. The applicability of the proposed method is also validated by the analysis of high purity nickel reference material (NIST SRM 671). The relative standard deviation (RSD) is less than 3.3%. Results for determination of trace elements in high purity nickel were presented. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity nickel trace element matrix effect internal standard
下载PDF
上一页 1 下一页 到第
使用帮助 返回顶部