This paper used optical emission spectroscopy (OES) to study the gas phase in high power DC arc plasma jet chemical vapour deposition (CVD) during diamond films growth processes. The results show that all the depo...This paper used optical emission spectroscopy (OES) to study the gas phase in high power DC arc plasma jet chemical vapour deposition (CVD) during diamond films growth processes. The results show that all the deposition parameters (methane concentration, substrate temperature, gas flow rate and ratio of H2/Ar) could strongly influence the gas phase. C2 is found to be the most sensitive radical to deposition parameters among the radicals in gas phase. Spatially resolved OES implies that a relative high concentration of atomic H exists near the substrate surface, which is beneficial for diamond film growth. The relatively high concentrations of C2 and CH are correlated with high deposition rate of diamond. In our high deposition rate system, C2 is presumed to be the main growth radical, and CH is also believed to contribute the diamond deposition.展开更多
Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was ...Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments (DOE). An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.展开更多
进化类算法和内点法交替迭代的混合算法在求解含电压源换流器的高压直流输电(voltage source converter basedhigh voltage direct current,VSC-HVDC)的交直流系统最优潮流(optimal power flow,OPF)问题时由于截断误差的影响和VSC-HVDC...进化类算法和内点法交替迭代的混合算法在求解含电压源换流器的高压直流输电(voltage source converter basedhigh voltage direct current,VSC-HVDC)的交直流系统最优潮流(optimal power flow,OPF)问题时由于截断误差的影响和VSC-HVDC控制方式的限制,容易发生振荡,因此提出一种基于差分进化(differential evolution,DE)和原—对偶内点法(primal-dual interior point method,PDIPM)的统一混合迭代算法。算法的主要思想是以DE算法为框架,对离散变量进行优化,在DE算法的每一次迭代过程中,采用PDIPM对每个DE个体进行连续变量的优化和适应度评估。由于采用PDIPM进行DE种群适应度评估,无需设定VSC-HVDC的控制方式,因此提高了算法的全局寻优能力。多个算例结果表明,该混合算法数值稳定性高,寻优能力强,能很好地解决含两端、多端、多馈入VSC-HVDC的交直流系统最优潮流问题。展开更多
建立了含柔性直流输电(voltage source converter based high voltage direct current,VSC-HVDC)的交直流混合发输电系统的可靠性分析模型,该模型既考虑了VSC-HVDC的稳态功率特性,还计及了发输电网络的故障率和输电线路的有功限制,采用...建立了含柔性直流输电(voltage source converter based high voltage direct current,VSC-HVDC)的交直流混合发输电系统的可靠性分析模型,该模型既考虑了VSC-HVDC的稳态功率特性,还计及了发输电网络的故障率和输电线路的有功限制,采用非序惯蒙特卡罗仿真实现;在满足系统安全约束的前提条件下,对系统进行模拟调度,重点评价了与发输电网络连接的VSC-HVDC对电网可靠性的影响,给出系统和节点的风险指标,为VSC-HVDC规划和运行提供参考依据,最后算例分析证明了该算法的可行性和合理性。展开更多
高压直流输电系统嵌入大型交流系统,将进一步增加换相失败、直流闭锁等故障对系统安全稳定的影响,交流系统与直流系统的交互作用,将使系统动态更加复杂。针对电网不同运行方式下大扰动后系统复杂动态响应特性分析难题,文中提出一种基于...高压直流输电系统嵌入大型交流系统,将进一步增加换相失败、直流闭锁等故障对系统安全稳定的影响,交流系统与直流系统的交互作用,将使系统动态更加复杂。针对电网不同运行方式下大扰动后系统复杂动态响应特性分析难题,文中提出一种基于机电-电磁混合仿真与机器学习的智能分析方法。该方法基于主成分分析(principal components analysis,PCA)降维、基于密度的噪声应用空间聚类(density-based spatial clustering of applications with noise,DBSCAN)、K-means等算法建立二阶段聚类模型,可针对直流落点近区严重故障后大量混合仿真动态曲线在高维空间中自动聚类,并给出相应标识与严重程度;提取交直流系统在不同故障下的典型动态模式,自动标注并识别各模式下主导安全稳定问题。文中所提方法的有效性在2025年华东电网运行方式中得以验证,仿真结果表明,所提方法可有效提取不同故障下系统动态模式,将有效支撑后续复杂故障下的交直流系统动态机理分析。展开更多
首先介绍在远距离大容量输电场合,3种基于模块化多电平换流器(modular multilevel converter,MMC)的高压直流输电(high voltage direct current,HVDC)拓扑及其处理直流故障的方法:基于半桥子模块(half bridge sub-module,HBSM)的HMMC-H...首先介绍在远距离大容量输电场合,3种基于模块化多电平换流器(modular multilevel converter,MMC)的高压直流输电(high voltage direct current,HVDC)拓扑及其处理直流故障的方法:基于半桥子模块(half bridge sub-module,HBSM)的HMMC-HVDC跳换流站交流侧断路器,基于箝位双子模块(clamp double sub-module,CDSM)的CMMCHVDC通过换流器控制实现直流侧故障自清除,以及基于电网换相换流器(line commutated converter,LCC)和MMC的混合拓扑在MMC直流出口处加装大功率二极管(LCC-D-MMC-HVDC)。然后,在由MMC-HVDC和交流线路构成的交直流并列简化系统中,基于等面积法则,对上述3种直流故障处理方法的暂态过程进行理论分析,并提出评价指标。最后通过仿真验证了分析结果。展开更多
将基于电压源换流器的高压直流(voltage source converter based high voltage direct current,VSC-HVDC)输电系统谐波潮流算法从单相扩展到三相,提出含VSCHVDC交直流混联电力系统三相谐波潮流统一算法。为计及直流系统中换流变压器和...将基于电压源换流器的高压直流(voltage source converter based high voltage direct current,VSC-HVDC)输电系统谐波潮流算法从单相扩展到三相,提出含VSCHVDC交直流混联电力系统三相谐波潮流统一算法。为计及直流系统中换流变压器和VSC的不对称,分别建立它们的三相谐波模型,而平衡的交流系统采用对称分量谐波模型。交直流系统的对称与不对称部分之间以相-序分量转换方程为接口。交流侧的三相基波和谐波量以及直流侧的直流、基波和谐波量用牛顿法统一求解。该算法保持了VSCHVDC单相谐波潮流算法的高精度和相对于时域仿真法的计算速度优势,完善了VSC-HVCD的谐波模型,使其更加通用且符合实际情况,计及了不对称所引起的交、直流侧非特征谐波,是VSC-HVDC谐波分析频域法的进一步发展。展开更多
文摘This paper used optical emission spectroscopy (OES) to study the gas phase in high power DC arc plasma jet chemical vapour deposition (CVD) during diamond films growth processes. The results show that all the deposition parameters (methane concentration, substrate temperature, gas flow rate and ratio of H2/Ar) could strongly influence the gas phase. C2 is found to be the most sensitive radical to deposition parameters among the radicals in gas phase. Spatially resolved OES implies that a relative high concentration of atomic H exists near the substrate surface, which is beneficial for diamond film growth. The relatively high concentrations of C2 and CH are correlated with high deposition rate of diamond. In our high deposition rate system, C2 is presumed to be the main growth radical, and CH is also believed to contribute the diamond deposition.
基金the National High-Tech Research and Development Program of China (No.2002AA305508)the National Natural Science Foundation of China (No.50472095)+1 种基金the Scientific Research Foundation for the Returned Overseas Chinese Scholars (No.2003-14)Beijing Novel Project (No. 2003A13).]
文摘Optical emission spectroscopy (OES) was used to study the gas phase composition near the substrate surface during diamond deposition by high-power DC arc plasma jet chemical vapor deposition (CVD). C2 radical was determined as the main carbon radical in this plasma atmosphere. The deposition parameters, such as substrate temperature, anode-substrate distance, methane concentration, and gas flow rate, were inspected to find out the influence on the gas phase. A strong dependence of the concentrations and distribution of radicals on substrate temperature was confirmed by the design of experiments (DOE). An explanation for this dependence could be that radicals near the substrate surface may have additional ionization or dissociation and also have recombination, or are consumed on the substrate surface where chemical reactions occur.
文摘进化类算法和内点法交替迭代的混合算法在求解含电压源换流器的高压直流输电(voltage source converter basedhigh voltage direct current,VSC-HVDC)的交直流系统最优潮流(optimal power flow,OPF)问题时由于截断误差的影响和VSC-HVDC控制方式的限制,容易发生振荡,因此提出一种基于差分进化(differential evolution,DE)和原—对偶内点法(primal-dual interior point method,PDIPM)的统一混合迭代算法。算法的主要思想是以DE算法为框架,对离散变量进行优化,在DE算法的每一次迭代过程中,采用PDIPM对每个DE个体进行连续变量的优化和适应度评估。由于采用PDIPM进行DE种群适应度评估,无需设定VSC-HVDC的控制方式,因此提高了算法的全局寻优能力。多个算例结果表明,该混合算法数值稳定性高,寻优能力强,能很好地解决含两端、多端、多馈入VSC-HVDC的交直流系统最优潮流问题。
文摘建立了含柔性直流输电(voltage source converter based high voltage direct current,VSC-HVDC)的交直流混合发输电系统的可靠性分析模型,该模型既考虑了VSC-HVDC的稳态功率特性,还计及了发输电网络的故障率和输电线路的有功限制,采用非序惯蒙特卡罗仿真实现;在满足系统安全约束的前提条件下,对系统进行模拟调度,重点评价了与发输电网络连接的VSC-HVDC对电网可靠性的影响,给出系统和节点的风险指标,为VSC-HVDC规划和运行提供参考依据,最后算例分析证明了该算法的可行性和合理性。
文摘高压直流输电系统嵌入大型交流系统,将进一步增加换相失败、直流闭锁等故障对系统安全稳定的影响,交流系统与直流系统的交互作用,将使系统动态更加复杂。针对电网不同运行方式下大扰动后系统复杂动态响应特性分析难题,文中提出一种基于机电-电磁混合仿真与机器学习的智能分析方法。该方法基于主成分分析(principal components analysis,PCA)降维、基于密度的噪声应用空间聚类(density-based spatial clustering of applications with noise,DBSCAN)、K-means等算法建立二阶段聚类模型,可针对直流落点近区严重故障后大量混合仿真动态曲线在高维空间中自动聚类,并给出相应标识与严重程度;提取交直流系统在不同故障下的典型动态模式,自动标注并识别各模式下主导安全稳定问题。文中所提方法的有效性在2025年华东电网运行方式中得以验证,仿真结果表明,所提方法可有效提取不同故障下系统动态模式,将有效支撑后续复杂故障下的交直流系统动态机理分析。
文摘将基于电压源换流器的高压直流(voltage source converter based high voltage direct current,VSC-HVDC)输电系统谐波潮流算法从单相扩展到三相,提出含VSCHVDC交直流混联电力系统三相谐波潮流统一算法。为计及直流系统中换流变压器和VSC的不对称,分别建立它们的三相谐波模型,而平衡的交流系统采用对称分量谐波模型。交直流系统的对称与不对称部分之间以相-序分量转换方程为接口。交流侧的三相基波和谐波量以及直流侧的直流、基波和谐波量用牛顿法统一求解。该算法保持了VSCHVDC单相谐波潮流算法的高精度和相对于时域仿真法的计算速度优势,完善了VSC-HVCD的谐波模型,使其更加通用且符合实际情况,计及了不对称所引起的交、直流侧非特征谐波,是VSC-HVDC谐波分析频域法的进一步发展。