High power and high-slope efficiency 650nm band real-refractive-index ridge w aveguide AlGaInP laser diodes with compressive strained MQW active layer are for med by pure Ar ion beam etching process.Symmetric laser me...High power and high-slope efficiency 650nm band real-refractive-index ridge w aveguide AlGaInP laser diodes with compressive strained MQW active layer are for med by pure Ar ion beam etching process.Symmetric laser mesas with high perpendi cularity,which are impossible to obtain by traditional wet etching method due to the use of a 15°-misoriented substrate,are obtained by this dry etching metho d.Laser diodes with 4μm wide,600μm long and 10%/90% coat are fabricated.Th e typical threshold current of these devices is 46mA at room temperature,and a s table fundamental-mode operation over 40mW is obtained.Very high slope efficien cy of 1.4W/A at 10mW and 1.1W/A at 40mW are realized.展开更多
Ion beam etching technique was used to reveal the metallograhpic microstructure and interface morphology of electroplating chromium coating, in particular, whose substrate surface layer was treated in advance by laser...Ion beam etching technique was used to reveal the metallograhpic microstructure and interface morphology of electroplating chromium coating, in particular, whose substrate surface layer was treated in advance by laser quenching. Chemical etchings were also conducted for comparison. The reveal microstructures were observed and analyzed by scanning electron microscopy. The results show that ion beam etching can reveal well the whole microstructures of composite coating-substrate materials.展开更多
The action of etching and damage by 20 keV N+ beam on the cells of Deinococcus radiodurans and Escherichia coli was investigated by scanning electron microscope (SEM) and the electron spin resonance (ESR) spectrum of ...The action of etching and damage by 20 keV N+ beam on the cells of Deinococcus radiodurans and Escherichia coli was investigated by scanning electron microscope (SEM) and the electron spin resonance (ESR) spectrum of free radicals. The results showed that N+ implantation exerted the direct action of etching and damage of momentum transferring and the indirect action of the free radicals of energy deposition on their cells, many microholes were found on the surface of cells' wall and /or membrane by SEM, the damaged DNA was determined using DNA unwinding technique, and the signal of free radicals was measured by ESR. The degree of damage to cells by ion beam gradually increased with the increase implantation dose. With the post-treatment of 2 mmol/l caffeine and 0.5 mmol / l Na2-EDTA, the survival rate of D.radiodurans and E.coli further decreased in the order of caffeine > Na2-EDTA > control, and this suggested that low energy ion beam could be implanted into nucleus, doing a damage to DNA and resulting in the mutation of organisms.展开更多
We report on the fabrication of the lO-mm-long lithium niobate ridge waveguide and its supercontinuum gen- eration at near-visible wavelengths （around 800hm）. The waveguides are fabricated by a combination of MeV co...We report on the fabrication of the lO-mm-long lithium niobate ridge waveguide and its supercontinuum gen- eration at near-visible wavelengths （around 800hm）. The waveguides are fabricated by a combination of MeV copper ion implantation followed by wet etching in a proton exchanged lithium niobate planar waveguide. Using a mode-locked Ti：sapphire laser with a central wavelength of 800nm, the generated broadest supereontinuum through the ridge waveguides spans 302 nm （at -30 dB points）, from 693 to 995 nm. Temporal coherence proper- ties of the supercontinuum are experimentally studied by a Michelson interferometer and the coherence length of the broadest supercontinuum is measured to be 5.2 μm. Our results offer potential for a compact and integrated supercontinuum source for applications including bio-imaging, spectroscopy and optical communication.展开更多
[Objective] The aim was to study the mechanism of the removal effect of methylene blue(MB) by rice husk ash(RHA).[Method] The effects of contact time and pH on the adsorption of MB by rice husk ash were investigated,a...[Objective] The aim was to study the mechanism of the removal effect of methylene blue(MB) by rice husk ash(RHA).[Method] The effects of contact time and pH on the adsorption of MB by rice husk ash were investigated,and the mechanism was discussed.[Result] RHA exhibited a remarkable ability on the adsorption of MB.The process of adsorption reached the equilibrium after 30 min,at about pH 9.The adsorption effect was explored with the aid of ion beam etching technique,which displayed that there were two main adsorption manners.One was the electrostatic interactions,through which the negatively charged RHA could adsorb the positively charged MB,the other was the porous effect due to the huge specific surface area of the micro/nano-scale porous silica in RHA,and MB could be adsorbed and deposited into the pores.[Conclusion] RHA could be used in the treatment of textile wastewater.Ion beam technology might be used as an effective way to investigate the adsorption effect.展开更多
Three sample preparation techniques, focused ion beam （FIB）, ion beam （IB） etching, and ultramicrotomy （UM） were used in comparison to analyze the interphase of carbon fiber ＇epoxy composites using transmission...Three sample preparation techniques, focused ion beam （FIB）, ion beam （IB） etching, and ultramicrotomy （UM） were used in comparison to analyze the interphase of carbon fiber ＇epoxy composites using transmission electron microscopy. An intact interphase with a relatively uniform thickness was obtained by FIB. and detailed chemical analysis of the interphase was investigated by electron energy loss spectroscopy. It shows that the interphase region is 200 mn wide with an increasing oxygen-to-carbon ratio from 10% to 19% and an almost constant nitrogen-to-carbon ratio of about 3%. However, gallium implantation of FIB tends to hinder fine structure analysis of the interphase. For IB etching, the interphase region is observed with transition morphology frona amorphous resin to nano-crystalline carbon fiber, but the uneven sample thickness brings difficulty for quantitative chemical analysis. Moreover, UM tends to cause damage and/or deformation on the interphase. These results are meaningful for in-depth understanding on the interphase characteristic of carbon fiber composites.展开更多
A systemic process study on an electron beam nanolithography system operating at 100kV was pre-sent.The exposure conditions were optimized for resist ZEP520A.Grating structures with line/space of 50nm/50nm were obtain...A systemic process study on an electron beam nanolithography system operating at 100kV was pre-sent.The exposure conditions were optimized for resist ZEP520A.Grating structures with line/space of 50nm/50nm were obtained in a reasonably thick resist which is beneficial to the subsequent pattern transfer technique.The ICP etching process conditions was optimized.The role of etching parameters such as source power,gas pressure,and gas flow rate on the etching result was also discussed.A grating structure with line widths as small as 100nm,duty cycles of 0.5,depth of 900nm,and the side-wall scalloping as small as 5nm on a silicon substrate was obtained.The silicon deep etching technique for structure sizes smaller than 100nm is very important for the fabrication of nano-optical devices working in the visible regime.展开更多
An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and ...An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the grating under etching is extracted and detected outside the chamber. This arrangement greatly simplifies the end-point detection. Modeling the grating diffraction with a rigorous diffraction grating computer program, we can satisfactorily simulate the evolution of the diffraction intensity during the etching process and consequently, we can accurately predict the end-point. Employing the proposed technique, we have reproducibly fabricated multilayer dielectric gratings with diffraction efficiencies of more than 92%.展开更多
文摘High power and high-slope efficiency 650nm band real-refractive-index ridge w aveguide AlGaInP laser diodes with compressive strained MQW active layer are for med by pure Ar ion beam etching process.Symmetric laser mesas with high perpendi cularity,which are impossible to obtain by traditional wet etching method due to the use of a 15°-misoriented substrate,are obtained by this dry etching metho d.Laser diodes with 4μm wide,600μm long and 10%/90% coat are fabricated.Th e typical threshold current of these devices is 46mA at room temperature,and a s table fundamental-mode operation over 40mW is obtained.Very high slope efficien cy of 1.4W/A at 10mW and 1.1W/A at 40mW are realized.
文摘Ion beam etching technique was used to reveal the metallograhpic microstructure and interface morphology of electroplating chromium coating, in particular, whose substrate surface layer was treated in advance by laser quenching. Chemical etchings were also conducted for comparison. The reveal microstructures were observed and analyzed by scanning electron microscopy. The results show that ion beam etching can reveal well the whole microstructures of composite coating-substrate materials.
基金This work is supported by the National Science Foundation of china (19605005)
文摘The action of etching and damage by 20 keV N+ beam on the cells of Deinococcus radiodurans and Escherichia coli was investigated by scanning electron microscope (SEM) and the electron spin resonance (ESR) spectrum of free radicals. The results showed that N+ implantation exerted the direct action of etching and damage of momentum transferring and the indirect action of the free radicals of energy deposition on their cells, many microholes were found on the surface of cells' wall and /or membrane by SEM, the damaged DNA was determined using DNA unwinding technique, and the signal of free radicals was measured by ESR. The degree of damage to cells by ion beam gradually increased with the increase implantation dose. With the post-treatment of 2 mmol/l caffeine and 0.5 mmol / l Na2-EDTA, the survival rate of D.radiodurans and E.coli further decreased in the order of caffeine > Na2-EDTA > control, and this suggested that low energy ion beam could be implanted into nucleus, doing a damage to DNA and resulting in the mutation of organisms.
基金Supported by the National Natural Science Foundation of China under Grant Nos 61575129 and 11375105the Postdoctoral Science Foundation of China under Grant No 2016M602511+1 种基金the Shenzhen Science and Technology Planning under Grant No JCYJ20160422142912923the State Key Laboratory of Nuclear Physics and Technology,Peking University
文摘We report on the fabrication of the lO-mm-long lithium niobate ridge waveguide and its supercontinuum gen- eration at near-visible wavelengths （around 800hm）. The waveguides are fabricated by a combination of MeV copper ion implantation followed by wet etching in a proton exchanged lithium niobate planar waveguide. Using a mode-locked Ti：sapphire laser with a central wavelength of 800nm, the generated broadest supereontinuum through the ridge waveguides spans 302 nm （at -30 dB points）, from 693 to 995 nm. Temporal coherence proper- ties of the supercontinuum are experimentally studied by a Michelson interferometer and the coherence length of the broadest supercontinuum is measured to be 5.2 μm. Our results offer potential for a compact and integrated supercontinuum source for applications including bio-imaging, spectroscopy and optical communication.
基金Supported by National Natural Science Foundation of China (No.10975154)State Key Lab of Electroanalytical Chemistry,Changchun Institute of Applied Chemistry,CAS (SKLEA 201104)
文摘[Objective] The aim was to study the mechanism of the removal effect of methylene blue(MB) by rice husk ash(RHA).[Method] The effects of contact time and pH on the adsorption of MB by rice husk ash were investigated,and the mechanism was discussed.[Result] RHA exhibited a remarkable ability on the adsorption of MB.The process of adsorption reached the equilibrium after 30 min,at about pH 9.The adsorption effect was explored with the aid of ion beam etching technique,which displayed that there were two main adsorption manners.One was the electrostatic interactions,through which the negatively charged RHA could adsorb the positively charged MB,the other was the porous effect due to the huge specific surface area of the micro/nano-scale porous silica in RHA,and MB could be adsorbed and deposited into the pores.[Conclusion] RHA could be used in the treatment of textile wastewater.Ion beam technology might be used as an effective way to investigate the adsorption effect.
基金supported by the National Natural Science Foundation of China (Grant No. 51273007)the Program for New Century Excellent Talents in University of China (NCET)
文摘Three sample preparation techniques, focused ion beam （FIB）, ion beam （IB） etching, and ultramicrotomy （UM） were used in comparison to analyze the interphase of carbon fiber ＇epoxy composites using transmission electron microscopy. An intact interphase with a relatively uniform thickness was obtained by FIB. and detailed chemical analysis of the interphase was investigated by electron energy loss spectroscopy. It shows that the interphase region is 200 mn wide with an increasing oxygen-to-carbon ratio from 10% to 19% and an almost constant nitrogen-to-carbon ratio of about 3%. However, gallium implantation of FIB tends to hinder fine structure analysis of the interphase. For IB etching, the interphase region is observed with transition morphology frona amorphous resin to nano-crystalline carbon fiber, but the uneven sample thickness brings difficulty for quantitative chemical analysis. Moreover, UM tends to cause damage and/or deformation on the interphase. These results are meaningful for in-depth understanding on the interphase characteristic of carbon fiber composites.
基金Supported by the National Basic Research Program of China("973" Program)(Grant No.2007CB935301)
文摘A systemic process study on an electron beam nanolithography system operating at 100kV was pre-sent.The exposure conditions were optimized for resist ZEP520A.Grating structures with line/space of 50nm/50nm were obtained in a reasonably thick resist which is beneficial to the subsequent pattern transfer technique.The ICP etching process conditions was optimized.The role of etching parameters such as source power,gas pressure,and gas flow rate on the etching result was also discussed.A grating structure with line widths as small as 100nm,duty cycles of 0.5,depth of 900nm,and the side-wall scalloping as small as 5nm on a silicon substrate was obtained.The silicon deep etching technique for structure sizes smaller than 100nm is very important for the fabrication of nano-optical devices working in the visible regime.
基金This research is supported by the National 863 Program of China
文摘An in-situ end-point detection technique for ion-beam etching is presented. A laser beam of the same wavelength and polarization as those in the intended application of the grating is fed into the vacuum chamber, and the beam retro-diffracted by the grating under etching is extracted and detected outside the chamber. This arrangement greatly simplifies the end-point detection. Modeling the grating diffraction with a rigorous diffraction grating computer program, we can satisfactorily simulate the evolution of the diffraction intensity during the etching process and consequently, we can accurately predict the end-point. Employing the proposed technique, we have reproducibly fabricated multilayer dielectric gratings with diffraction efficiencies of more than 92%.
基金Supported by Jilin Province Science and Technology Department project(20220101122JC)Changchun University of Science and Technology project(627011102)。
