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Development of a Hybrid Photopolymer for Stereolithography
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作者 甘志伟 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2006年第1期99-101,共3页
New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indica... New liquid free radical-cationic hybrid photopolymer, consisting of acrylate-based photocurable resin and epoxy-based photosensitive resin for stereolithography by UV laser was developed. The experiment results indicated that the hybrid photopolymer exhibits advantages of both the acrylate-based photosensitive resin and the epoxy-based photosensitive polymer contained in the hybrid system with relatively high photospeed and low linear shrinkage. Stereolithography parts without obvious distortion were built on the stereolithography apparatus HRPLA- I from this hybrid resin successfully and efficiently. 展开更多
关键词 stereolhhography UV-curing resin free radical-cationic hybrid photopolymer stereolithography parts
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