Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the...Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the Shanghai Synchrotron Radiation Facility(SSRF)08U1B beamline in advancing this field.Specifically,it demonstrates how this beamline can create fringe patterns with a 15-nm half-pitch on a resist using synchrotron-based EUV lithography.This achievement is vital for evaluating EUV photoresists at the advanced 5-nm node.We provide a detailed introduction to the methods and experimental setup used at the SSRF 08U1B beamline to assess an EUV photoresist.A significant part of this research involved the fabrication of high-resolution hydrogen silsesquioxane mask gratings.These gratings,with an aspect ratio of approximately 3,were created using electron beam lithography on an innovative mask framework.This framework was crucial in eliminating the impact of zeroth-order light on interference patterns.The proposed framework propose offers a new approach to mask fabrication,particularly beneficial for achromatic Talbot lithography and multicoherent-beam interference applications.展开更多
The performance of solar cells is determined by three factors:the open-circuit voltage(Voc),short-circuit current density(Jsc),and fill factor(FF).The Voc and FF are determined by the material bandgap and the series/s...The performance of solar cells is determined by three factors:the open-circuit voltage(Voc),short-circuit current density(Jsc),and fill factor(FF).The Voc and FF are determined by the material bandgap and the series/shunt resistance,respectively.However,Jsc is determined by the amount of incident light in addition to the bandgap of the material.In this study,a moth-eye pattern was formed on a glass surface via direct printing to increase the amount of incident light and thus increase Jsc-The moth-eye pattern is a typical antireflection pattern that reduces the reflection by gradually increasing the refractive index.A flat perovskite solar cell(F-PSC)and a moth-eye patterned perovskite solar cell(M-PSC)had Jsc values of 23.70 and 25.50 mA/cm^2,respectively.The power-conversion efficiencies of the F-PSC and M-PSC were 19.81%and 21.77%,respectively.展开更多
基金supported by the National Key Research and Development Program of China(Nos.2021YFA1601003,2017YFA0206002,2017YFA0403400)the National Natural Science Foundation of China(No.11775291)。
文摘Evaluating the comprehensive characteristics of extreme ultraviolet(EUV)photoresists is crucial for their application in EUV lithography,a key process in modern technology.This paper highlights the capabilities of the Shanghai Synchrotron Radiation Facility(SSRF)08U1B beamline in advancing this field.Specifically,it demonstrates how this beamline can create fringe patterns with a 15-nm half-pitch on a resist using synchrotron-based EUV lithography.This achievement is vital for evaluating EUV photoresists at the advanced 5-nm node.We provide a detailed introduction to the methods and experimental setup used at the SSRF 08U1B beamline to assess an EUV photoresist.A significant part of this research involved the fabrication of high-resolution hydrogen silsesquioxane mask gratings.These gratings,with an aspect ratio of approximately 3,were created using electron beam lithography on an innovative mask framework.This framework was crucial in eliminating the impact of zeroth-order light on interference patterns.The proposed framework propose offers a new approach to mask fabrication,particularly beneficial for achromatic Talbot lithography and multicoherent-beam interference applications.
基金This work was supported by the Technology Innovation Program(No.N0002310)funded by the Ministry of Trade,Industry&Energy(MOTIE,Republic of Korea),Creative Materials Discovery Program through the National Research Foundation of Korea(NRF)funded by M inistry of Science and ICT(No.NRF-2018M3D1A1058972)the Materials and Components Technology Development Program program of MOTIE/KEIT(No.10080352,Development of polymer-based adhesive light concentration film for solar cell with 85%light transmittance,1 m2 area).
文摘The performance of solar cells is determined by three factors:the open-circuit voltage(Voc),short-circuit current density(Jsc),and fill factor(FF).The Voc and FF are determined by the material bandgap and the series/shunt resistance,respectively.However,Jsc is determined by the amount of incident light in addition to the bandgap of the material.In this study,a moth-eye pattern was formed on a glass surface via direct printing to increase the amount of incident light and thus increase Jsc-The moth-eye pattern is a typical antireflection pattern that reduces the reflection by gradually increasing the refractive index.A flat perovskite solar cell(F-PSC)and a moth-eye patterned perovskite solar cell(M-PSC)had Jsc values of 23.70 and 25.50 mA/cm^2,respectively.The power-conversion efficiencies of the F-PSC and M-PSC were 19.81%and 21.77%,respectively.
