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Simulation and fabrication of thin film bulk acoustic wave resonator
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作者 韩茜茜 欧毅 +3 位作者 李志刚 欧文 陈大鹏 叶甜春 《Journal of Semiconductors》 EI CAS CSCD 2016年第7期86-91,共6页
In this paper, we present the simulation and fabrication of a thin film bulk acoustic resonator (FBAR). In order to improve the accuracy of simulation, an improved Mason model was introduced to design the resonator ... In this paper, we present the simulation and fabrication of a thin film bulk acoustic resonator (FBAR). In order to improve the accuracy of simulation, an improved Mason model was introduced to design the resonator by taking the coupling effect between electrode and substrate into consideration. The resonators were fabricated by tile eight inch CMOS process, and the measurements show that the improved Mason model is more accurate than a simple Mason model. The Qs (Q at series resonance), Qp (Q at parallel resonance), Qmax and k2 of the FBAR were measured to be 695, 814, 1049, and 7.01% respectively, showing better performace than previous reports. 展开更多
关键词 FBAR RESONATOR improved mason model surface micromachining processes
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