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Structure and Stability of Endohedral Complexes X@(HAlNH)_(12) (X = He, Ne, Ar, Kr) 被引量:4
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作者 ZHANGCai-Yun WUHai-Shun 《Chinese Journal of Structural Chemistry》 SCIE CAS CSCD 北大核心 2005年第6期684-690,共7页
The structures of closo-hedral cluster (HAlNH)12 and endohedral complexes X@(HAlNH)12 (X = He, Ne, Ar, Kr) have been studied by using density functional theory (DFT) at the B3LYP/6-31G(d) level. The geometries, natura... The structures of closo-hedral cluster (HAlNH)12 and endohedral complexes X@(HAlNH)12 (X = He, Ne, Ar, Kr) have been studied by using density functional theory (DFT) at the B3LYP/6-31G(d) level. The geometries, natural bond orbital (NBO), vibrational frequency, energetic parameters, magnetic shielding constants and nucleus independent chemical shifts (NICS) were discussed. The potential surface of guest X shifting from the cage center to a face of six- membered ring was calculated at the same level. The exit transition state was demonstrated with IRC calculations. It is found that X@(HAlNH)12 complexes are dynamically stable, and Ne@(HAlNH)12 is more energetically favorable than the other complexes in thermodynamics. 展开更多
关键词 structure and stability inclusion energy NICS potential energy surface exit transition state
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Encapsulation Chalcogen Anions in Perfluorinated Silicon Fullerene: X^2-@Si20F20 (X=O, S, Se)
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作者 王宏 武林 《Chinese Journal of Chemistry》 SCIE CAS CSCD 2011年第10期2063-2067,共5页
The structures and stabilities of cage Si20F2o and its endohedral complexes X^2-@Si20F20 (X=O, S, Se) were determined at the B3LYP/6-31G(d) levels of density functional theory (DFT). It is found that the adiabat... The structures and stabilities of cage Si20F2o and its endohedral complexes X^2-@Si20F20 (X=O, S, Se) were determined at the B3LYP/6-31G(d) levels of density functional theory (DFT). It is found that the adiabatic electron affinity (EAad) of host cage Si20F20 (1h) is higher than that of isolated O atom (4.24 vs. 1.46 eV). This suggests the Si20F20 cage can selectively trap and stabilize the capsulated spherical anions. The calculations predict that X=S and Se are nearly located at the center of the cage, and O dramatically deviates from the center in C3v symmetry. Moreover, the corresponding X^2- @Si20F20 complexes have more negative inclusion energies (AEinc) and thermodynamic parameters (AZ) than X2 @C20F20. The amount of charge that is being transferred from the encapsulated anions to the cage increases with the atomic radius, i.e., from O^2- (ca. 45%), S^2- (ca. 51%) to Se^2- (ca. 59%), and such a novel model of cage may have practical uses as potential and electrical building units of nanoscale materials. 展开更多
关键词 endohedral complexes inclusion energy adiabatic electron affinity
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Structure and Stability of Endohedral Complexes X@(HBNH)12
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作者 王宏 贾建峰 武海顺 《Chinese Journal of Chemistry》 SCIE CAS CSCD 2006年第11期1509-1513,共5页
Using quantum chemistry methods B3LYP/6-31++G(d,p) to optimize endohedral complexes X@(HBNH)12 (X=Li^0/+, Na^0/+, K^0/+, Be^0/2+, Mg^0/2+, Ca^0/2+, H and He), the geometries with the lowest energy were a... Using quantum chemistry methods B3LYP/6-31++G(d,p) to optimize endohedral complexes X@(HBNH)12 (X=Li^0/+, Na^0/+, K^0/+, Be^0/2+, Mg^0/2+, Ca^0/2+, H and He), the geometries with the lowest energy were achieved. Inclusion energy, standard equilibrium constant, natural charge, spin density, ionization potentials, and HOMO-LUMO energy gap were also discussed. The calculation predicted that X=Na^0/+, K^0/+, Mg^0/2+, Ca^0/2+, H and He are nearly located at the center of (HBNH)12 cluster. Li^+ lies in less than 0.021 nm departure from the center. Li and Be^0/2+ dramatically deviate from the center. (HBNH)12 prefers to enclose Li^+, Be^2+, Mg^2+, and Ca^2+ in it than others. Moreover, M@(HBNH)12 (M=Li, Na, K) species are "superalkalis" in that they possess lower first ionization potentials than the Cs atom (3.9 eV). 展开更多
关键词 endohedral complex inclusion energy HOMO-LUMO energy gap
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Anomalous Resistivity in Vanadium-Doped Semi-Insulating 4H-SiC Wafers
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作者 Xianglong Yang Kun Yang +4 位作者 Yingxin Cui Yan Peng Xiufang Chen Xuejian Xie Xiaobo Hu 《Acta Metallurgica Sinica(English Letters)》 SCIE EI CAS CSCD 2014年第6期1083-1087,共5页
The resistivities of vanadium-doped semi-insulating 4H-SiC wafers were measured by a contactless resistivity measurement system. Anomalous resistivity was found in semi-insulating 4H-SiC wafer. Raman spectra of semi-i... The resistivities of vanadium-doped semi-insulating 4H-SiC wafers were measured by a contactless resistivity measurement system. Anomalous resistivity was found in semi-insulating 4H-SiC wafer. Raman spectra of semi-insulating4H-SiC wafer indicated that the anomalous resistivity was caused by polytype inclusion. Based on the activation energies of different SiC polytypes calculated from resistivity versus temperature data measured by COREMA-VT, the resistivities in the vanadium-doped semi-insulating 4H-SiC wafer with 6H polytype inclusion were calculated. The calculated resistivities are quite consistent with the measured resistivities. Furthermore, the compensation mechanism for the formation of anomalous resistivity was proposed. 展开更多
关键词 SiC Anomalous resistivity Polytype inclusion Activation energy Compensation mechanism
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