In the era of Internet of Things(Io Ts),an energy-efficient ultraviolet(UV)photodetector(PD)is highly desirable considering the massive usage scenarios such as environmental sterilization,fire alarm and corona dischar...In the era of Internet of Things(Io Ts),an energy-efficient ultraviolet(UV)photodetector(PD)is highly desirable considering the massive usage scenarios such as environmental sterilization,fire alarm and corona discharge monitoring.So far,common self-powered UV PDs are mainly based on metal-semiconductor heterostructures or p–n heterojunctions,where the limited intrinsic built-in electric field restricts further enhancement of the photoresponsivity.In this work,an extremely low-voltage field-effect UV PD is proposed using a gatedrain shorted amorphous IGZO(a-IGZO)thin film transistor(TFT)architecture.A combined investigation of the experimental measurements and technology computer-aided design(TCAD)simulations suggests that the reverse current(ⅠR)of field-effect diode(FED)is highly related with the threshold voltage(Vth)of the parental TFT,implying an enhancement-mode TFT is preferable to fabricate the field-effect UV PD with low dark current.Driven by a low bias of-0.1 V,decent UV response has been realized including large UV/visible(R_(300)/R_(550))rejection ratio(1.9×10^(3)),low dark current(1.15×10^(-12)A)as well as high photo-to-dark current ratio(PDCR,~10^(3))and responsivity(1.89 A/W).This field-effect photodiode provides a new platform to construct UV PDs with well-balanced photoresponse performance at a low bias,which is attractive for designs of large-scale smart sensor networks with high energy efficiency.展开更多
In-Ga-Zn-O(IGZO) channel based thin-film transistors(TFT), which exhibit high on-off current ratio and relatively high mobility, has been widely researched due to its back end of line(BEOL)-compatible potential for th...In-Ga-Zn-O(IGZO) channel based thin-film transistors(TFT), which exhibit high on-off current ratio and relatively high mobility, has been widely researched due to its back end of line(BEOL)-compatible potential for the next generation dynamic random access memory(DRAM) application. In this work, thermal atomic layer deposition(TALD) indium gallium zinc oxide(IGZO) technology was explored. It was found that the atomic composition and the physical properties of the IGZO films can be modulated by changing the sub-cycles number during atomic layer deposition(ALD) process. In addition, thin-film transistors(TFTs) with vertical channel-all-around(CAA) structure were realized to explore the influence of different IGZO films as channel layers on the performance of transistors. Our research demonstrates that TALD is crucial for high density integration technology, and the proposed vertical IGZO CAA-TFT provides a feasible path to break through the technical problems for the continuous scale of electronic equipment.展开更多
随着人们进入信息时代,半导体技术快速发展,对薄膜晶体管(Thin film transistor,简称TFT)的性能要求逐渐提高.IGZO由于具有较高的载流子迁移率、相对良好的均匀性等优势而受到广泛关注;而传统的真空技术制备薄膜晶体管,因制备工艺复杂...随着人们进入信息时代,半导体技术快速发展,对薄膜晶体管(Thin film transistor,简称TFT)的性能要求逐渐提高.IGZO由于具有较高的载流子迁移率、相对良好的均匀性等优势而受到广泛关注;而传统的真空技术制备薄膜晶体管,因制备工艺复杂、制备成本高等问题,在快速发展的信息时代逐渐显露出局限性,本文采用制备工艺更为简单的溶液法在Si/SiO_(2)基底上制备IGZO有源层薄膜,并测试不同退火温度(450℃,550℃,650℃)条件下对薄膜性能的影响.结果表明,适当提高退火温度可以有效改善IGZO-TFT器件的电学性能,本实验测试得出:当溶液法制备薄膜在550℃退火温度下退火器件性能最优,溶液法制备的器件电流开关闭达到105,器件性能相对比较稳定.展开更多
Since the invention of amorphous indium-gallium-zinc-oxide(IGZO)based thin-film transistors(TFTs)by Hideo Hosono in 2004,investigations on the topic of IGZO TFTs have been rapidly expanded thanks to their high electri...Since the invention of amorphous indium-gallium-zinc-oxide(IGZO)based thin-film transistors(TFTs)by Hideo Hosono in 2004,investigations on the topic of IGZO TFTs have been rapidly expanded thanks to their high electrical performance,large-area uniformity,and low processing temperature.This article reviews the recent progress and major trends in the field of IGZO-based TFTs.After a brief introduction of the history of IGZO and the main advantages of IGZO-based TFTs,an overview of IGZO materials and IGZO-based TFTs is given.In this part,IGZO material electron travelling orbitals and deposition methods are introduced,and the specific device structures and electrical performance are also presented.Afterwards,the recent advances of IGZO-based TFT applications are summarized,including flat panel display drivers,novel sensors,and emerging neuromorphic systems.In particular,the realization of flexible electronic systems is discussed.The last part of this review consists of the conclusions and gives an outlook over the field with a prediction for the future.展开更多
随着显示技术的不断发展,对高性能、高稳定性的薄膜晶体管(Thin Film Transistor,TFT)的需求日趋增加,通过结晶改善薄膜晶体管性能的方法受到大量关注。当前,铟镓锌氧化物(IGZO)材料由于具有迁移率高、柔性好、透明度高等优势,被广泛用...随着显示技术的不断发展,对高性能、高稳定性的薄膜晶体管(Thin Film Transistor,TFT)的需求日趋增加,通过结晶改善薄膜晶体管性能的方法受到大量关注。当前,铟镓锌氧化物(IGZO)材料由于具有迁移率高、柔性好、透明度高等优势,被广泛用于薄膜晶体管的沟道中,而改善IGZO沟道层的结晶形态也成为研究热点。本文总结了晶态IGZO薄膜晶体管器件的研究进展,详细介绍了IGZO系化合物的晶体结构,重点阐述了单晶、c轴取向结晶、六方多晶型、尖晶石型、纳米晶型和原生结晶型IGZO的结构和各晶态IGZO薄膜晶体管的制备方法、器件性能和稳定性,深入分析其微观结构,总结物理特性,阐述不同晶系结构的结晶机理,建立不同晶体结构与电学特性的关系,最后对晶态IGZO薄膜晶体管的发展进行展望。展开更多
Amorphous indium-gallium-zinc-oxide （a-IGZO） thin-film transistor （TFT） backplane technology is the best candidate for flat panel displays （FPDs）. In this paper, a-IGZO TFT structures are described. The effects ...Amorphous indium-gallium-zinc-oxide （a-IGZO） thin-film transistor （TFT） backplane technology is the best candidate for flat panel displays （FPDs）. In this paper, a-IGZO TFT structures are described. The effects of etch parameters （rf power, dc-bias voltage and gas pressure） on the etch rate and etch profile are discussed. Three kinds of gas mixtures are compared in the dry etching process of a-IGZO thin films. Lastly, three problems are pointed out that need to be addressed in the dry etching process of a-IGZO TFTs.展开更多
The electrical instability behaviors of amorphous-indium-gallium-zinc-oxide （a-IGZO） thin-film transistors （TFTs） under ultraviolet （UV） illumination are studied. As UV radiation dosage increases, the turn-on vo...The electrical instability behaviors of amorphous-indium-gallium-zinc-oxide （a-IGZO） thin-film transistors （TFTs） under ultraviolet （UV） illumination are studied. As UV radiation dosage increases, the turn-on voltage of the TFT shows continuous negative shift, which is accompanied by enhanced degradation of sub-threshold swing and field-effect mobility. The electrical instability is caused by the increased carrier concentration and defect states within the device channel, which can be further attributed to additional oxygen vacancy generation and ionization of oxygen vacancy related defects upon UV illumination, respectively. Furthermore, the performance of the a-IGZO TFT treated with UV radiation can gradually recover to its initial stste after long-time storage.展开更多
基金supported by the National Natural Science Foundation of China(Grant Nos.62174113,12174275,and 61874139)the Guangdong Basic and Applied Basic Research Foundation(Grant Nos.2019B1515120057,2023A1515140094,and 2023A1515110730)。
文摘In the era of Internet of Things(Io Ts),an energy-efficient ultraviolet(UV)photodetector(PD)is highly desirable considering the massive usage scenarios such as environmental sterilization,fire alarm and corona discharge monitoring.So far,common self-powered UV PDs are mainly based on metal-semiconductor heterostructures or p–n heterojunctions,where the limited intrinsic built-in electric field restricts further enhancement of the photoresponsivity.In this work,an extremely low-voltage field-effect UV PD is proposed using a gatedrain shorted amorphous IGZO(a-IGZO)thin film transistor(TFT)architecture.A combined investigation of the experimental measurements and technology computer-aided design(TCAD)simulations suggests that the reverse current(ⅠR)of field-effect diode(FED)is highly related with the threshold voltage(Vth)of the parental TFT,implying an enhancement-mode TFT is preferable to fabricate the field-effect UV PD with low dark current.Driven by a low bias of-0.1 V,decent UV response has been realized including large UV/visible(R_(300)/R_(550))rejection ratio(1.9×10^(3)),low dark current(1.15×10^(-12)A)as well as high photo-to-dark current ratio(PDCR,~10^(3))and responsivity(1.89 A/W).This field-effect photodiode provides a new platform to construct UV PDs with well-balanced photoresponse performance at a low bias,which is attractive for designs of large-scale smart sensor networks with high energy efficiency.
基金funded in part by the National Key R&D Program of China(Grant No.2022YFB3606900)in part by the National Natural Science of China(Grant No.62004217)。
文摘In-Ga-Zn-O(IGZO) channel based thin-film transistors(TFT), which exhibit high on-off current ratio and relatively high mobility, has been widely researched due to its back end of line(BEOL)-compatible potential for the next generation dynamic random access memory(DRAM) application. In this work, thermal atomic layer deposition(TALD) indium gallium zinc oxide(IGZO) technology was explored. It was found that the atomic composition and the physical properties of the IGZO films can be modulated by changing the sub-cycles number during atomic layer deposition(ALD) process. In addition, thin-film transistors(TFTs) with vertical channel-all-around(CAA) structure were realized to explore the influence of different IGZO films as channel layers on the performance of transistors. Our research demonstrates that TALD is crucial for high density integration technology, and the proposed vertical IGZO CAA-TFT provides a feasible path to break through the technical problems for the continuous scale of electronic equipment.
文摘随着人们进入信息时代,半导体技术快速发展,对薄膜晶体管(Thin film transistor,简称TFT)的性能要求逐渐提高.IGZO由于具有较高的载流子迁移率、相对良好的均匀性等优势而受到广泛关注;而传统的真空技术制备薄膜晶体管,因制备工艺复杂、制备成本高等问题,在快速发展的信息时代逐渐显露出局限性,本文采用制备工艺更为简单的溶液法在Si/SiO_(2)基底上制备IGZO有源层薄膜,并测试不同退火温度(450℃,550℃,650℃)条件下对薄膜性能的影响.结果表明,适当提高退火温度可以有效改善IGZO-TFT器件的电学性能,本实验测试得出:当溶液法制备薄膜在550℃退火温度下退火器件性能最优,溶液法制备的器件电流开关闭达到105,器件性能相对比较稳定.
基金The authors are grateful for the financial support from the National Natural Science Foundation of China(Grant No.62074075,61834001)the National Key R&D Program of China(Grant No.2019YFB2205400).
文摘Since the invention of amorphous indium-gallium-zinc-oxide(IGZO)based thin-film transistors(TFTs)by Hideo Hosono in 2004,investigations on the topic of IGZO TFTs have been rapidly expanded thanks to their high electrical performance,large-area uniformity,and low processing temperature.This article reviews the recent progress and major trends in the field of IGZO-based TFTs.After a brief introduction of the history of IGZO and the main advantages of IGZO-based TFTs,an overview of IGZO materials and IGZO-based TFTs is given.In this part,IGZO material electron travelling orbitals and deposition methods are introduced,and the specific device structures and electrical performance are also presented.Afterwards,the recent advances of IGZO-based TFT applications are summarized,including flat panel display drivers,novel sensors,and emerging neuromorphic systems.In particular,the realization of flexible electronic systems is discussed.The last part of this review consists of the conclusions and gives an outlook over the field with a prediction for the future.
文摘随着显示技术的不断发展,对高性能、高稳定性的薄膜晶体管(Thin Film Transistor,TFT)的需求日趋增加,通过结晶改善薄膜晶体管性能的方法受到大量关注。当前,铟镓锌氧化物(IGZO)材料由于具有迁移率高、柔性好、透明度高等优势,被广泛用于薄膜晶体管的沟道中,而改善IGZO沟道层的结晶形态也成为研究热点。本文总结了晶态IGZO薄膜晶体管器件的研究进展,详细介绍了IGZO系化合物的晶体结构,重点阐述了单晶、c轴取向结晶、六方多晶型、尖晶石型、纳米晶型和原生结晶型IGZO的结构和各晶态IGZO薄膜晶体管的制备方法、器件性能和稳定性,深入分析其微观结构,总结物理特性,阐述不同晶系结构的结晶机理,建立不同晶体结构与电学特性的关系,最后对晶态IGZO薄膜晶体管的发展进行展望。
文摘Amorphous indium-gallium-zinc-oxide （a-IGZO） thin-film transistor （TFT） backplane technology is the best candidate for flat panel displays （FPDs）. In this paper, a-IGZO TFT structures are described. The effects of etch parameters （rf power, dc-bias voltage and gas pressure） on the etch rate and etch profile are discussed. Three kinds of gas mixtures are compared in the dry etching process of a-IGZO thin films. Lastly, three problems are pointed out that need to be addressed in the dry etching process of a-IGZO TFTs.
基金Supported by the Key Industrial R&D Program of Jiangsu Province under Grand No BE2015155the Priority Academic Program Development of Jiangsu Higher Education Institutionsthe Fundamental Research Funds for the Central Universities under Grant No 021014380033
文摘The electrical instability behaviors of amorphous-indium-gallium-zinc-oxide （a-IGZO） thin-film transistors （TFTs） under ultraviolet （UV） illumination are studied. As UV radiation dosage increases, the turn-on voltage of the TFT shows continuous negative shift, which is accompanied by enhanced degradation of sub-threshold swing and field-effect mobility. The electrical instability is caused by the increased carrier concentration and defect states within the device channel, which can be further attributed to additional oxygen vacancy generation and ionization of oxygen vacancy related defects upon UV illumination, respectively. Furthermore, the performance of the a-IGZO TFT treated with UV radiation can gradually recover to its initial stste after long-time storage.
