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Effect of coil and chamber structure on plasma radial uniformity in radio frequency inductively coupled plasma
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作者 赵洋 周晓华 +2 位作者 高升荣 宋莎莎 赵玉真 《Plasma Science and Technology》 SCIE EI CAS CSCD 2024年第7期58-66,共9页
Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial m... Enhancing plasma uniformity can be achieved by modifying coil and chamber structures in radio frequency inductively coupled plasma(ICP)to meet the demand for large-area and uniformly distributed plasma in industrial manufacturing.This study utilized a two-dimensional self-consistent fluid model to investigate how different coil configurations and chamber aspect ratios affect the radial uniformity of plasma in radio frequency ICP.The findings indicate that optimizing the radial spacing of the coil enhances plasma uniformity but with a reduction in electron density.Furthermore,optimizing the coil within the ICP reactor,using the interior point method in the Interior Point Optimizer significantly enhances plasma uniformity,elevating it from 56%to 96%within the range of the model sizes.Additionally,when the chamber aspect ratio k changes from 2.8 to 4.7,the plasma distribution changes from a center-high to a saddleshaped distribution.Moreover,the plasma uniformity becomes worse.Finally,adjusting process parameters,such as increasing source power and gas pressure,can enhance plasma uniformity.These findings contribute to optimizing the etching process by improving plasma radial uniformity. 展开更多
关键词 inductively coupled plasma fluid simulation optimized coil chamber aspect ratio plasma uniformity
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Orthogonal Frequency Division Multiplexing Adaptive Technology for Multinode Users of Seawater Channel Based on Inductively Coupled Mooring Chain
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作者 ZHENG Yu LIU Yingjie +3 位作者 REN Yuanhong FEI Chen ZHANG Shijiang LI Hongzhi 《Journal of Ocean University of China》 SCIE CAS CSCD 2023年第5期1243-1252,共10页
As an important part of buoy-type ocean monitoring systems,the inductively coupled mooring chain solves the problem of data cotransmission through the multinode sensors that it carries,which is significant for the rap... As an important part of buoy-type ocean monitoring systems,the inductively coupled mooring chain solves the problem of data cotransmission through the multinode sensors that it carries,which is significant for the rapid acquisition of fish,hydrology,and other information.This paper is based on a seawater channel transmission model with a depth of 300 m and a bandwidth of 2 MHz.An orthogonal frequency division multiplexing(OFDM)technology is used to overcome the multipath effect of signal transmission on a seawater medium.The adaptive technology is integrated into the OFDM,and an improved joint subcarrier and bit power allocation algorithm is proposed.This algorithm solves the problem of dynamic subcarrier allocation during the cotransmission of underwater multinode user data in seawater channels.The results show that the algorithm complexity can be reduced by 0.18126×10^(-2)s during one complete OFDM system data transmission by the improved greedy algorithm,and a total of 216 bits are transmitted by the OFDM.The normalized channel capacity can be improved by 0.012 bit s^(-1)Hz^(-1).At the bit error ratio(BER)of 10^(-3),the BER performance can be improved by approximately 6 d B.When the numbers of users are 4 and 8,the improved algorithm increases the channel capacity,and the higher the number of users,the more evident the channel capacity improvement effect is.The results of this paper have an important reference value for enhancing the transmission performance of inductively coupled mooring chain underwater multinode data. 展开更多
关键词 inductively coupled mooring chain seawater channel multinode users OFDM adaptive technology
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Fluid simulation of the effect of a dielectric window with high temperature on plasma parameters in inductively coupled plasma
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作者 李娜 韩道满 +3 位作者 张权治 刘旭辉 王英杰 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第3期51-61,共11页
To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature... To maintain the high-density plasma source in inductively coupled plasma(ICP),very high radiofrequency power is often delivered to the antenna,which can heat the dielectric windows near the antenna to high temperature.This high temperature can modulate the plasma characteristics to a large degree.We thus study the effect of dielectric window temperature on plasma parameters in two different ICP structures based on COMSOL software.The distributions of various plasma species are examined at different dielectric window temperatures.The concentration of neutral gas is found to be largely modulated at high dielectric window temperature,which further affects the electron collision probability with neutrals and the electron temperature.However,the electron density profiles are barely affected by the dielectric window temperature,which is mainly concentrated at the center of the reactor due to the fixed power input and pressure. 展开更多
关键词 fluid simulation metastable argon dielectric window temperature inductively coupled plasma
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A fast hybrid simulation approach of ion energy and angular distributions in biased inductively coupled Ar plasmas
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作者 赵明亮 张钰如 +1 位作者 高飞 王友年 《Plasma Science and Technology》 SCIE EI CAS CSCD 2023年第7期61-71,共11页
In this work,a two-dimensional hybrid model,which consists of a bulk fluid module,a sheath module and an ion Monte-Carlo module,is developed to investigate the modulation of ion energy and angular distributions at dif... In this work,a two-dimensional hybrid model,which consists of a bulk fluid module,a sheath module and an ion Monte-Carlo module,is developed to investigate the modulation of ion energy and angular distributions at different radial positions in a biased argon inductively coupled plasma.The results indicate that when the bias voltage amplitude increases or the bias frequency decreases,the ion energy peak separation width becomes wider.Besides,the widths of the ion energy peaks at the edge of the substrate are smaller than those at the center due to the lower plasma density there,indicating the nonuniformity of the ion energy distribution function(IEDF)along the radial direction.As the pressure increases from 1 to 10 Pa,the discrepancy of the IEDFs at different radial positions becomes more obvious,i.e.the IEDF at the radial edge is characterized by multiple low energy peaks.When a dual frequency bias source is applied,the IEDF exhibits three or four peaks,and it could be modulated efficiently by the relative phase between the two bias frequencies.The results obtained in this work could help to improve the radial uniformity of the IEDF and thus the etching process. 展开更多
关键词 biased inductively coupled plasma 2D hybrid model IEADs
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Determination of trace elements in high purity nickel by high resolution inductively coupled plasma mass spectrometry 被引量:11
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作者 聂西度 梁逸曾 +1 位作者 唐有根 谢华林 《Journal of Central South University》 SCIE EI CAS 2012年第9期2416-2420,共5页
The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was diss... The contents ofMg, Al, Si, Ti, Cr, Mn, Fe, Co, Cu, Ga, As, Se, Cd, Sb, Pb and Bi in high purity nickel were determined by high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS). The sample was dissolved in HNO3 and HCI by microwave digestion. Most of the spectral interferences could be avoided by measuring in the high resolution mode. The matrix effects because of the presence of excess HC1 and nickel were evaluated. Correction for matrix effects was made using Sc, Rh and T1 as internal standards. The optimum conditions for the determination were tested and discussed. The detection limits range from 0.012 to 1.76 ~tg/g depending on the type of elements. The applicability of the proposed method is also validated by the analysis of high purity nickel reference material (NIST SRM 671). The relative standard deviation (RSD) is less than 3.3%. Results for determination of trace elements in high purity nickel were presented. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity nickel trace element matrix effect internal standard
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Quantification of trace amounts of impurities in high purity cobalt by high resolution inductively coupled plasma mass spectrometry 被引量:10
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作者 XIE Hualin HUANG Kelong +1 位作者 NIE Xidu TANG Yougen 《Rare Metals》 SCIE EI CAS CSCD 2007年第3期286-291,共6页
A An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of 24 elements (Be, Mg, A1, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, ... A An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of 24 elements (Be, Mg, A1, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn Sb, Ba, Pt, Au, and Pb) in high purity cobalt was described. Sample digestions were performed in closed microwave vessels using HNO3 and HCI. The matrix effects because of the presence of excess HCI and Co were evaluated. The usefulness of high mass resolution for overcoming some spectral interference was demonstrated. The optimum conditions for the determination were tested and discussed. The standard addition method was employed for quantitative analysis. The detection limits were 0.016-1.50 ].tg·g^-1, the recovery ratios were 92.2%-111.2%, and the RSD was less than 3.6%. The method was accurate, quick, and convenient. It was applied to the determination of trace impurities in high purity cobalt with satisfactory results. 展开更多
关键词 high resolution inductively coupled plasma mass spectrometry high purity cobalt trace impurities matrix effect standard addition method
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Experimental Study of the Influence of Process Pressure and Gas Composition on GaAs Etching Characteristics in Cl_2/BCl_3-Based Inductively Coupled Plasma 被引量:5
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作者 D.S.RAWAL B.K.SEHGAL +1 位作者 R.MURALIDHARAN H.K.MALIK 《Plasma Science and Technology》 SCIE EI CAS CSCD 2011年第2期223-229,共7页
A study of Cl2/BCl3-based inductively coupled plasma (ICP) was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etc... A study of Cl2/BCl3-based inductively coupled plasma (ICP) was conducted using thick photoresist mask for anisotropic etching of 50μm diameter holes in a GaAs wafer at a relatively high average etching rate for etching depths of more than 150μm. Plasma etch characteristics with ICP process pressure and the percentage of BCI3 were studied in greater detail at a constant ICP coil/bias power. The measured peak-to-peak voltage as a function of pressure was used to estimate the minimum energy of the ions bombarding the substrate. The process pressure was found to have a substantial influence on the energy of heavy ions. Various ion species in plasma showed minimum energy variation from 1.85 eV to 7.5 eV in the pressure range of 20 mTorr to 50 mTorr. The effect of pressure and the percentage of BCl3 on the etching rate and surface smoothness of the bottom surface of the etched hole were studied for a fixed total flow rate. The etching rate was found to decrease with the percentage of BCl3, whereas the addition of BCl3 resulted in anisotropic holes with a smooth veil free bottom surface at a pressure of 30 mTorr and 42% BC13. In addition, variation of the etching yield with pressure and etching depth were also investigated. 展开更多
关键词 GAAS inductively coupled plasma ETCHING ion energy etch yield
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Microstructure, Hardness and Corrosion Resistance of ZrN Films Prepared by Inductively Coupled Plasma Enhanced RF Magnetron Sputtering 被引量:4
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作者 文峰 孟月东 +1 位作者 任兆杏 舒兴胜 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第2期170-175,共6页
ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance ... ZrN fihns were deposited on Si(111) and M2 steel by inductively coupled plasma (ICP)-enhanced RF magnetron sputtering. The effect of ICP power on the microstructure, mechanical properties and corrosion resistance of ZrN films was investigated. When the ICP power is below 300 W, the ZrN films show a columnar structure. With the increase of ICP power, the texture coefficient (To) of the (111) plane, the nanohardness and elastic modulus of the films increase and reach the maximum at a power of 300 W. As the ICP Power exceeds 300 W, the films exhibit a ZrN and ZrNx mixed crystal structure without columnar grain while the nanohardness and elastic modulus of the films decrease. All the ZrN coated samples show a higher corrosion resistance than that of the bare M2 steel substrate in 3.5% NaCl electrolyte. The nanohardness and elastic modulus mostly depend on the crystalline structure and Tc of ZrN(111). 展开更多
关键词 inductively coupled plasma (ICP) magnetron sputtering zirconium nitride nficrostructure nano-hardness corrosion resistance
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Determination of trace multi-elements in coal fly ash by inductively coupled plasma mass spectrometry 被引量:5
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作者 谢华林 唐有根 +1 位作者 李玉杰 李立波 《Journal of Central South University of Technology》 EI 2007年第1期68-72,共5页
The contents of Cr, Cu, Ni, As, Cd and Pb in coal fly ash were determined by a high resolution inductively coupled plasma mass spectrometry method. The sample digestions were performed in closed microwave vessels with... The contents of Cr, Cu, Ni, As, Cd and Pb in coal fly ash were determined by a high resolution inductively coupled plasma mass spectrometry method. The sample digestions were performed in closed microwave vessels with HNO3, HClO4 and FIE The optimum conditions for the determination were obtained. The applicability of the proposed method was validated by the analysis of coal fly ash reference material (NIST SRM 1633a). The results show that most of the spectral interferences can be avoided by measuring in the high resolution mode (maximum mass resolution R=9 000). The detection limit is from 0.05 to 0.21 μg/g, and the precision is fine with relative standard deviation less than 4.3%. 展开更多
关键词 coal fly ash microwave digestion inductively coupled plasma mass spectrometry DETERMINATION
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Simultaneous determination of some trace metal impurities in high-purity sodium tungstate using coprecipitation and inductively coupled plasma atomic emission spectrometry 被引量:3
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作者 MAXiaoguo KUANGTongchun LIUQianjun 《Rare Metals》 SCIE EI CAS CSCD 2004年第3期193-196,共4页
A method based on the combination of coprecipitation with inductively coupledplasma atomic emission spectrometry (ICP-AES) was developed for the determination of impurities inhigh-purity sodium tungstate. Six elements... A method based on the combination of coprecipitation with inductively coupledplasma atomic emission spectrometry (ICP-AES) was developed for the determination of impurities inhigh-purity sodium tungstate. Six elements (Co, Cu, Fe, Mn, Ni, and Pb) were coprecipitated bylanthanum hydroxide so as to be concentrated and separated from the tungsten matrix. Effects of somefactors on the recoveries of the analytes and on the residual amount of sodium tungstate wereinvestigated, and the optimum conditions for the coprecipitation were proposed. Matrix-matchingcalibration curve method was used for the analysis. It is shown that the elements mentioned abovecan be quantitatively recovered. The detection limits for Co, Cu, Fe, Mn, Ni, and Pb are 0.07, 0.4,0.2, 0.1, 0.6, and 1.3 μg·g^(-1), respectively. The recoveries vary from 92.5% to 108%, and therelative standard deviations (RSDs) are in the range of 3.1%-5.5%. 展开更多
关键词 analytical chemistry trace metal determination inductively coupled plasmaatomic emission spectrometry (ICP-AES) coprecipitation sodium tungstate
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Modeling Approach and Analysis of the Structural Parameters of an Inductively Coupled Plasma Etcher Based on a Regression Orthogonal Design 被引量:3
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作者 程嘉 朱煜 季林红 《Plasma Science and Technology》 SCIE EI CAS CSCD 2012年第12期1059-1068,共10页
The geometry of an inductively coupled plasma (ICP) etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these pa... The geometry of an inductively coupled plasma (ICP) etcher is usually considered to be an important factor for determining both plasma and process uniformity over a large wafer. During the past few decades, these parameters were determined by the "trial and error" method, resulting in wastes of time and funds. In this paper, a new approach of regression orthogonal design with plasma simulation experiments is proposed to investigate the sensitivity of the structural parameters on the uniformity of plasma characteristics. The tool for simulating plasma is CFD-ACE+, which is commercial multi-physical modeling software that has been proven to be accurate for plasma simulation. The simulated experimental results are analyzed to get a regression equation on three structural parameters. Through this equation, engineers can compute the uniformity of the electron number density rapidly without modeling by CFD-ACE+. An optimization performed at the end produces good results. 展开更多
关键词 fluid model inductively coupled plasma regression orthogonal structural parameters design of experiment
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Spheroidization of silica powders by radio frequency inductively coupled plasma with Ar–H2 and Ar–N2 as the sheath gases at atmospheric pressure 被引量:3
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作者 Lin Li Guo-hua Ni +3 位作者 Qi-jia Guo Qi-fu Lin Peng Zhao Jun-li Cheng 《International Journal of Minerals,Metallurgy and Materials》 SCIE EI CAS CSCD 2017年第9期1067-1074,共8页
Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz. The effects of the added content of hydrogen and nitrogen into argon(serving as the sh... Amorphous spherical silica powders were prepared by inductively coupled thermal plasma treatment at a radio frequency of 36.2 MHz. The effects of the added content of hydrogen and nitrogen into argon(serving as the sheath gas), as well as the carrier gas flow rate, on the spheroidization rate of silica powders, were investigated. The prepared silica powders before and after plasma treatment were examined by scanning electron microscopy, X-ray diffraction, and laser granulometric analysis. Results indicated that the average size of the silica particles increased, and the transformation of crystals into the amorphous state occurred after plasma treatment. Discharge image processing was employed to analyze the effect of the plasma temperature field on the spheroidization rate. The spheroidization rate of the silica powder increased with the increase of the hydrogen content in the sheath gas. On the other hand, the spheroidization rate of the silica power first increased and then decreased with the increase of the nitrogen content in the sheath gas. Moreover, the amorphous content increased with the increase of the spheroidization rate of the silica powder. 展开更多
关键词 silica powders SPHEROIDIZATION inductively coupled plasma mixed gas
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Ion Density Distribution in an Inductively Coupled Plasma Chamber 被引量:4
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作者 陈俊芳 赵文锋 +2 位作者 吴先球 樊双莉 符斯列 《Plasma Science and Technology》 SCIE EI CAS CSCD 2004年第2期2233-2236,共4页
The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamb... The ion density distribution in the reaction chamber was diagnosed by a Langmuir probe. The rules of the ion density distribution were obtained under the pressures of 9 Pa, 13 Pa, 27 Pa and 53 Pa in the reaction chamber, different radio-frequency powers and different positions. The result indicates that the ion density decreases as the pressure increases, and increases as the power decreases. The ion density of axial position z =0 achieves 5.8×1010 on the center of coil under the power of 200 w and pressure of 9 Pa in the reaction chamber. 展开更多
关键词 inductively coupled plasma ion density distribution angmuir probe
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Quantification of Trace Amounts of Impurities in High Purity Cobalt by High Resolution Inductively Coupled Plasma Mass Spectrometry 被引量:3
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作者 Hua Lin XIE Xi Du NIE You Gen TANG 《Chinese Chemical Letters》 SCIE CAS CSCD 2006年第8期1077-1080,共4页
An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of Be, Mg, Al, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn, ... An analytical method using high resolution inductively coupled plasma mass spectrometry (HR-ICP-MS) for rapid simultaneous determination of Be, Mg, Al, Ti, V, Cr, Mn, Fe, Ni, Cu, Zn, Ga, Ge, As, Se, Mo, Ag, Cd, Sn, Sb, Ba, Pt, Au and Pb in high purity cobalt was described. Sample digestions were performed in closed microwave vessels using HNO3 and HCl. The matrix effects due to the presence of excess HCl and Co were evaluated. The usefulness of high mass resolution for overcoming some spectral interference was demonstrated. The optimum conditions for the determination was tested and discussed. Correction for matrix effects, Sc, Rh and Bi were used as internal standards. The detection limits is 0.003-0.57 μg/g, the recovery ratio is 92.2%-111.2%, and the RSD is less than 3.6%. The method is accurate, quick and convenient. It has been applied to the determination of trace impurities in high purity cobalt with satisfactory results. 展开更多
关键词 High resolution inductively coupled plasma mass spectrometry high purity cobalt trace impurities matrix effect spectral interference internal standards.
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The determination of 52 elements in marine geological samples by an inductively coupled plasma optical emission spectrometry and an inductively coupled plasma mass spectrometry with a high-pressure closed digestion method 被引量:15
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作者 GAO Jingjing LIU Jihua +3 位作者 LI Xianguo YAN Quanshu WANG Xiaojing WANG Hongmin 《Acta Oceanologica Sinica》 SCIE CAS CSCD 2017年第1期109-117,共9页
An improved analytical method to determine the content of 52 major, minor and trace elements in marine geological samples, using a HF-HCl-HNO_3 acid system with a high-pressure closed digestion method(HPCD), is stud... An improved analytical method to determine the content of 52 major, minor and trace elements in marine geological samples, using a HF-HCl-HNO_3 acid system with a high-pressure closed digestion method(HPCD), is studied by an inductively coupled plasma optical emission spectrometry(ICP-OES) and an inductively coupled plasma mass spectrometry(ICP-MS). The operating parameters of the instruments are optimized, and the optimal analytical parameters are determined. The influences of optical spectrum and mass spectrum interferences, digestion methods and acid systems on the analytical results are investigated. The optimal spectral lines and isotopes are chosen, and internal standard element of rhodium is selected to compensate for matrix effects and analytical signals drifting. Compared with the methods of an electric heating plate digestion and a microwave digestion, a high-pressure closed digestion method is optimized with less acid, complete digestion,less damage for digestion process. The marine geological samples are dissolved completely by a HF-HCl-HNO_3 system, the relative error(RE) for the analytical results are all less than 6.0%. The method detection limits are 2–40μg/g by the ICP-OES, and 6–80 ng/g by ICP-MS. The methods are used to determine the marine sediment reference materials(GBW07309, GBW07311, GBW07313), rock reference materials(GBW07103, GBW07104,GBW07105), and cobalt-rich crust reference materials(GBW07337, GBW07338, GBW07339), the obtained analytical results are in agreement with the certified values, and both of the relative standard deviation(RSD) and the relative error(RE) are less than 6.0%. The analytical method meets the requirements for determining 52 elements contents of bulk marine geological samples. 展开更多
关键词 marine geological sample high-pressure closed digestion method inductively coupled plasma optical emission spectrometry inductively coupled plasma mass spectrometry major element minor element trace element
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Determination of micro yttrium in an ytterbium matrix by inductively coupled plasma atomic emission spectrometry and wavelet transform 被引量:2
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作者 MAXiaoguo 《Rare Metals》 SCIE EI CAS CSCD 2005年第2期137-141,共5页
In the determination of trace yttrium (Y) in an ytterbium (Yb) matrix byinductively coupled plasma atomic emission spectrometry (ICP-AES), the most prominent line ofyttrium, Y 371.030 nm line, suffers from strong inte... In the determination of trace yttrium (Y) in an ytterbium (Yb) matrix byinductively coupled plasma atomic emission spectrometry (ICP-AES), the most prominent line ofyttrium, Y 371.030 nm line, suffers from strong interference due to an emission line of ytterbium.In mis work, a method based on wavelet transform was proposed for the spectral interferencecorrection. Haar wavelet was selected as the mother wavelet. The discrete detail after the thirddecomposition, D3, was chosen for quantitative analysis based on the consideration of bothseparation degree and peak height. The linear correlation coefficient between the height of the leftpositive peak in D3 and the concentration of Y was calculated to be 0.9926. Six synthetic sampleswere analyzed, and the recovery for yttrium varied from 96.3 percent to 110.0 percent. The amountsof yttrium in three ytterbium metal samples were determined by the proposed approach with an averagerelative standard deviation (RSD) of 2.5 percent, and the detection limit for yttrium was 0.016percent. This novel correction technique is fast and convenient, since neither complicated modelassumption nor time-consuming iteration is required. Furthermore, it is not affected by thewavelength drift inherent in monochromators that will severely reduce the accuracy of resultsobtained by some chemometric methods. 展开更多
关键词 analytical chemistry trace analysis inductively coupled plasma atomicemission spectrometry (ICP-AES) wavelet transform spectral interference correction YTTRIUM YTTERBIUM
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Surface Modification of Nanometre Silicon Carbide Powder with Polystyrene by Inductively Coupled Plasma 被引量:3
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作者 韦刚 孟月东 +5 位作者 钟少锋 刘峰 蒋仲庆 舒兴胜 任兆杏 王祥科 《Plasma Science and Technology》 SCIE EI CAS CSCD 2008年第1期78-82,共5页
An investigation was made into polystyrene (PS) grafted onto nanometre silicon carbide (SIC) particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency (RF) inductively c... An investigation was made into polystyrene (PS) grafted onto nanometre silicon carbide (SIC) particles. In our experiment, the grafting polymerization reaction was induced by a radio frequency (RF) inductively coupled plasma (ICP) treatment of the nanometre powder. FTIR (Fourier transform infrared spectrum) and XPS (X-ray photoelectron spectroscopy) results reveal that PS is grafted onto the surface of silicon carbide powder. An analysis is presented on the effectiveness of this approach as a function of plasma operating variables including the plasma treating power, treating time, and grafting reaction temperature and time. 展开更多
关键词 inductively coupled plasma graft polymerization SIC
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Trace amounts of impurities in electrolytic manganese metal by sector field inductively coupled plasma mass spectrometry 被引量:2
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作者 聂西度 梁逸曾 +1 位作者 唐有根 谢华林 《Journal of Central South University》 SCIE EI CAS 2013年第12期3385-3390,共6页
An analytical method, using sector field inductively coupled plasma mass spectrometry (SF-ICP-MS) for rapid simultaneous determination of Be, Na, Mg, Si, Ca, Ti, V, Cr, Fe, Co, Ni, Cu, Zn, As, Sn, Sb, Pb and Bi in e... An analytical method, using sector field inductively coupled plasma mass spectrometry (SF-ICP-MS) for rapid simultaneous determination of Be, Na, Mg, Si, Ca, Ti, V, Cr, Fe, Co, Ni, Cu, Zn, As, Sn, Sb, Pb and Bi in electrolytic manganese metal, was described. At the beginning, the samples were decomposed by HNO3 and H2504, and then analyzed by SF-ICP-MS. Most of the spectral interferences could be avoided by measuring in different mass resolution modes. The matrix effects due to the excess of sulfuric acid and Mn were evaluated. Correction of matrix effects was conducted by using the internal standard elements. The optimum condition for the determination was investigated and discussed. The detection limit is in the range of 0.001-0.169 gg/L. The current method is applied to the determination of trace impurities in electrolytic manganese metal. And experiments show that good results can be obtained much faster, more accurately and conveniently by current method. 展开更多
关键词 sector field inductively coupled plasma mass spectrometry electrolytic manganese IMPURITIES spectral interferences matrix effects
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Direct Determination of Trace Impurities in High Purity Zinc Oxide by High Resolution Inductively Coupled Plasma Mass Spectrometry 被引量:2
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作者 谢华林 《Journal of Wuhan University of Technology(Materials Science)》 SCIE EI CAS 2006年第2期28-32,共5页
The determination of trace impurities in high purity zinc oxide by high resolution inductively coupled plasma mass spectrometry ( HR-ICP-MS ) was investigated. To overcome some poteutially problematic spectral iuter... The determination of trace impurities in high purity zinc oxide by high resolution inductively coupled plasma mass spectrometry ( HR-ICP-MS ) was investigated. To overcome some poteutially problematic spectral iuterference, measurements were acquired in both middle and high resolution modes. The matrix effects due to the presence of excess HCl and zinc were evaluated. The optimum conditions for the determination were tested and discussed. The standard addition method was employed for quantitative analysis. The detection limits ranged from 0.02μg/ g to 6 μg/ g depending on the elements. The experimental resalts for the determination of Na, Mg, Ca, Cr, Mn, Fe, Co, Ni, Cu, Mo, Cd, Sb and Pb in several high purity zinc oxide powders were presented. 展开更多
关键词 high purity zinc oxide trace impurities high resolution inductively coupled plasma mass spectrometry spectral interferences microwave digestion
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Thermochemical Nonequilibrium 2D Modeling of Nitrogen Inductively Coupled Plasma Flow 被引量:2
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作者 YU Minghao Yusuke TAKAHASHI +4 位作者 Hisashi KIHARA Ken-ichi ABE Kazuhiko YAMADA Takashi ABE Satoshi MIYATANI 《Plasma Science and Technology》 SCIE EI CAS CSCD 2015年第9期749-760,共12页
Two-dimensional(2D) numerical simulations of thermochemical nonequilibrium inductively coupled plasma(ICP) flows inside a 10-kW inductively coupled plasma wind tunnel(ICPWT) were carried out with nitrogen as the... Two-dimensional(2D) numerical simulations of thermochemical nonequilibrium inductively coupled plasma(ICP) flows inside a 10-kW inductively coupled plasma wind tunnel(ICPWT) were carried out with nitrogen as the working gas.Compressible axisymmetric NavierStokes(N-S) equations coupled with magnetic vector potential equations were solved.A fourtemperature model including an improved electron-vibration relaxation time was used to model the internal energy exchange between electron and heavy particles.The third-order accuracy electron transport properties(3rd AETP) were applied to the simulations.A hybrid chemical kinetic model was adopted to model the chemical nonequilibrium process.The flow characteristics such as thermal nonequilibrium,inductive discharge,effects of Lorentz force were made clear through the present study.It was clarified that the thermal nonequilibrium model played an important role in properly predicting the temperature field.The prediction accuracy can be improved by applying the 3rd AETP to the simulation for this ICPWT. 展开更多
关键词 inductively coupled plasma NONEQUILIBRIUM electron transport properties magnetic vector potential
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