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RF electric field penetration and power deposition into nonequilibrium planar-type inductively coupled plasmas
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作者 毛明 王帅 +1 位作者 戴忠玲 王友年 《Chinese Physics B》 SCIE EI CAS CSCD 2007年第7期2044-2050,共7页
The RF electric field penetration and the power deposition into planar-type inductively coupled plasmas in low-pressure discharges have been studied by means of a self-consistent model which consists of Maxwell equati... The RF electric field penetration and the power deposition into planar-type inductively coupled plasmas in low-pressure discharges have been studied by means of a self-consistent model which consists of Maxwell equations combined with the kinetic equation of electrons. The Maxwell equations are solved based on the expansion of the Fourier-Bessel series for determining the RF electric field. Numerical results show the influence of a non-Maxwellian electron energy distribution on the RF electric field penetration and the power deposition for different coil currents. Moreover, the two-dimensional spatial profiles of RF electric field and power density are also shown for different numbers of RF coil turns. 展开更多
关键词 inductively coupled plasma7 rf field penetration kinetic theory
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