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Magnetic Proximity Effect in an Antiferromagnetic Insulator/Topological Insulator Heterostructure with Sharp Interface
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作者 Yuxin Liu Xuefan Niu +3 位作者 Rencong Zhang Qinghua Zhang Jing Teng Yongqing Li 《Chinese Physics Letters》 SCIE CAS CSCD 2021年第5期84-88,共5页
We report an experimental study of electron transport properties of MnSe/(Bi,Sb)_2Te_3 heterostructures,in which MnSe is an antiferromagnetic insulator,and(Bi,Sb)_2Te_3 is a three-dimensional topological insulator(TI)... We report an experimental study of electron transport properties of MnSe/(Bi,Sb)_2Te_3 heterostructures,in which MnSe is an antiferromagnetic insulator,and(Bi,Sb)_2Te_3 is a three-dimensional topological insulator(TI).Strong magnetic proximity effect is manifested in the measurements of the Hall effect and longitudinal resistances.Our analysis shows that the gate voltage can substantially modify the anomalous Hall conductance,which exceeds 0.1 e^(2)/h at temperature T=1.6 K and magnetic field μ_0H=5 T,even though only the top TI surface is in proximity to MnSe.This work suggests that heterostructures based on antiferromagnetic insulators provide a promising platform for investigating a wide range of topological spintronic phenomena. 展开更多
关键词 DIRAC Magnetic Proximity Effect in an Antiferromagnetic Insulator/Topological Insulator Heterostructure with Sharp interface SHARP
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Electronic Theory of Thermodynamic Adhesion inMetal/Ceramic Systems
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作者 李建国 《Rare Metals》 SCIE EI CAS CSCD 1995年第3期185-188,共4页
The thermodynamic adhesion between a metal and a ceramic crystal was believed to be the result of theelectron transfer from the metal into the cerainic crystal. From an electronic point of view, such an electrontransf... The thermodynamic adhesion between a metal and a ceramic crystal was believed to be the result of theelectron transfer from the metal into the cerainic crystal. From an electronic point of view, such an electrontransfer at the metal/ceramic interface may be represented by the tunnelling of the metal conduction electron into the ceramic bandgap. Theoretical analysis of the quantum tunnelling process at an intimate rnetal-semicon-ductor contact were performed . and the relationship between adhesion energies and Schottky barrier heights ofvarious metal/semiconductor or insulator interfaces was dcduced . 展开更多
关键词 Metal/semiconductor or insulator interfaces Adhesion energies Schottky barrier heights Quantum tunnelling.
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Contracted interlayer distance in graphene/sapphire heterostructure
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作者 Shiro Entani Liubov Yu. Antipina +8 位作者 Pavel V. Avramov Manabu Ohtomo Yoshihiro Matsumoto Norie Hirao Iwao Shimoyama Hiroshi Naramoto Yuji Baba Pavel B. Sorokin Seiji Sakai 《Nano Research》 SCIE EI CAS CSCD 2015年第5期1535-1545,共11页
Direct growth of graphene on insulators is expected to yield significant improvements in performance of graphene-based electronic and spintronic devices. In this study, we successfully reveal the atomic arrangement an... Direct growth of graphene on insulators is expected to yield significant improvements in performance of graphene-based electronic and spintronic devices. In this study, we successfully reveal the atomic arrangement and electronic properties of a coherent heterostructure of single-layer graphene and α-Al2O3(0001). The analysis of the atomic arrangement of single-layer graphene on α-Al2O3(0001) revealed an apparentcontradiction. The in-plane analysis shows that single-layer graphene grows not in a single-crystalline epitaxial manner, but rather in polycrystalline form, with two strongly pronounced preferred orientations. This suggests relatively weak interfacial interactions are operative. However, we demonstrate that unusually strong physical interactions between graphene and α-Al2O3(0001) exist, as evidenced by the small separation between the graphene and the α-Al2O3(0001) surface. The interfacial interaction is shown to be dominated by the electrostatic forces involved in the graphene n-system and the unsaturated electrons of the topmost O layer of α-Al2O3(0001), rather than the van der Waals interactions. Such features causes graphene hole doping and enable the graphene to slide on the α-Al2O3(0001) surface with only a small energy barrier despite the strong interfacial interactions. 展开更多
关键词 GRAPHENE SAPPHIRE chemical vapor deposition graphene/insulator interface
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