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FIDER: A Force-Balance-Based Interconnect Delay Driven Re-Synthesis Algorithm for Data-Path Optimization After Floorplan
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作者 王云峰 边计年 +2 位作者 洪先龙 周强 吴强 《Tsinghua Science and Technology》 SCIE EI CAS 2007年第1期63-69,共7页
As the feature size of integrated circuits is reduced to the deep sub-micron level or the nanometer level, the interconnect delay is becoming more and more important in determining the total delay of a circuit. Re-syn... As the feature size of integrated circuits is reduced to the deep sub-micron level or the nanometer level, the interconnect delay is becoming more and more important in determining the total delay of a circuit. Re-synthesis after floorplan is expected to be very helpful for reducing the interconnect delay of a circuit. In this paper, a force-balance-based re-synthesis algorithm for interconnect delay optimization after floorplan is proposed. The algorithm optimizes the interconnect delay by changing the operation scheduling and the functional unit allocation and binding. With this method the number and positions of all functional units are not changed, but some operations are allocated or bound to different units. Preliminary experimental results show that the interconnect wire delays are reduced efficiently without destroying the floorplan performance. 展开更多
关键词 high-level synthesis FLOORPLAN interconnect delay re-synthesis reschedule REALLOCATION
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Effects of Dummy Thermal Vias on Interconnect Delay and Power Dissipation of Very Large Scale Integration Circuits
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作者 XU Peng PAN Zhongliang 《Wuhan University Journal of Natural Sciences》 CAS CSCD 2018年第5期438-446,共9页
The interconnect temperature of very large scale integration(VLSI) circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The t... The interconnect temperature of very large scale integration(VLSI) circuits keeps rising due to self-heating and substrate temperature, which can increase the delay and power dissipation of interconnect wires. The thermal vias are regarded as a promising method to improve the temperature performance of VLSI circuits. In this paper, the extra thermal vias were used to decrease the delay and power dissipation of interconnect wires of VLSI circuits. Two analytical models were presented for interconnect temperature, delay and power dissipation with adding extra dummy thermal vias. The influence of the number of thermal vias on the delay and power dissipation of interconnect wires was analyzed and the optimal via separation distance was investigated. The experimental results show that the adding extra dummy thermal vias can reduce the interconnect average temperature, maximum temperature, delay and power dissipation. Moreover, this method is also suitable for clock signal wires with a large root mean square current. 展开更多
关键词 very large scale integration (VLSI) circuits interconnect temperature interconnect delay thermal vias interconnect power dissipation
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A multilevel nano-scale interconnection RLC delay model
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作者 朱樟明 修利平 杨银堂 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第7期563-569,共7页
Based on the multilevel interconnections temperature distribution model and the RLC interconnection delay model of the integrate circuit, this paper proposes a multilevel nano-scale interconnection RLC delay model wit... Based on the multilevel interconnections temperature distribution model and the RLC interconnection delay model of the integrate circuit, this paper proposes a multilevel nano-scale interconnection RLC delay model with the method of numerical analysis, the proposed analytical model has summed up the influence of the configuration of multilevel interconnections, the via heat transfer and self-heating effect on the interconnection delay, which is closer to the actual situation. Delay simulation results show that the proposed model has high precision within 5% errors for global interconnections based on the 65 nm CMOS interconnection and material parameter, which can be applied in nanometer CMOS system chip computer-aided design. 展开更多
关键词 multilevel interconnection thermal distribution RLC interconnection delay current density
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Crosstalk Model and Estimation Formula for VLSI Interconnect Wires
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作者 Liu Ling\|zhi, Gong Shu, Rong Meng\|tian Department of Electronic Engineering, Shanghai Jiaotong University, Shanghai 200030, China 《Wuhan University Journal of Natural Sciences》 CAS 2002年第3期333-337,共5页
We develop an interconnect crosstalk estimation model on the assumption of linearity for CMOS device. First, we analyze the terminal response of RC model on the worst condition from theS field to the time domain. The ... We develop an interconnect crosstalk estimation model on the assumption of linearity for CMOS device. First, we analyze the terminal response of RC model on the worst condition from theS field to the time domain. The exact 3 order coefficients inS field are obtained due to the interconnect tree model. Based on this, a crosstalk peak estimation formula is presented. Unlike other crosstalk equations in the literature, this formula is only used coupled capacitance and grand capacitance as parameter. Experimental results show that, compared with the SPICE results, the estimation formulae are simple and accurate. So the model is expected to be used in such fields as layout-driven logic and high level synthesis, performance-driven floorplanning and interconnect planning. 展开更多
关键词 Key words crosstalk interconnect delay model estimation model S field response
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Signal Integrity for 0.18μm CMOS Technology 被引量:2
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作者 孙加兴 叶青 +1 位作者 周玉梅 叶甜春 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2003年第10期1030-1034,共5页
The signal integrity problem in 0.18μm CMOS technology is analyzed from simulation.Several rules in this phenomenon are found by analyzing the crosstalk delay and noise,which are helpful for the future circuit design.
关键词 interconnect delay signal integrity CROSSTALK noise
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