LaON,LaTiO and LaTiON films are deposited as gate dielectrics by incorporating N or/and Ti into La_2O_3 using the sputtering method to fabricate Ge MOS capacitors,and the electrical properties of the devices are caref...LaON,LaTiO and LaTiON films are deposited as gate dielectrics by incorporating N or/and Ti into La_2O_3 using the sputtering method to fabricate Ge MOS capacitors,and the electrical properties of the devices are carefully examined.LaON/Ge capacitors exhibit the best interface quality,gate leakage property and device reliability,but a smaller k value（14.9）.LaTiO/Ge capacitors exhibit a higher k value（22.7）,but a deteriorated interface quality,gate leakage property and device reliability.LaTiON/Ge capacitors exhibit the highest k value（24.6）,and a relatively better interface quality（3.1×10^（11） eV^（-1）cm^（-2））,gate leakage property（3.6 × 10^（-3） A/cm^2 at V_g = 1V＋V_（fb）） and device reliability.Therefore,LaTiON is more suitable for high performance Ge MOS devices as a gate dielectric than LaON and LaTiO materials.展开更多
基金supported by the National Natural Science Foundation of China(No.61274112)the Natural Science Foundation of Hubei Province(No.2011CDB165)the Scientific Research Program of Huanggang Normal University(No.2012028803)
文摘LaON,LaTiO and LaTiON films are deposited as gate dielectrics by incorporating N or/and Ti into La_2O_3 using the sputtering method to fabricate Ge MOS capacitors,and the electrical properties of the devices are carefully examined.LaON/Ge capacitors exhibit the best interface quality,gate leakage property and device reliability,but a smaller k value（14.9）.LaTiO/Ge capacitors exhibit a higher k value（22.7）,but a deteriorated interface quality,gate leakage property and device reliability.LaTiON/Ge capacitors exhibit the highest k value（24.6）,and a relatively better interface quality（3.1×10^（11） eV^（-1）cm^（-2））,gate leakage property（3.6 × 10^（-3） A/cm^2 at V_g = 1V＋V_（fb）） and device reliability.Therefore,LaTiON is more suitable for high performance Ge MOS devices as a gate dielectric than LaON and LaTiO materials.
