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Experimental and numerical analyses of high voltage 4H-SiC junction barrier Schottky rectifiers with linearly graded field limiting ring 被引量:2
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作者 王向东 邓小川 +3 位作者 王永维 王勇 文译 张波 《Chinese Physics B》 SCIE EI CAS CSCD 2014年第5期490-494,共5页
This paper describes the successful fabrication of 4H-SiC junction barrier Schottky (JBS) rectifiers with a linearly graded field limiting ring (LG-FLR). Linearly variable ring spacings for the FLR termination are... This paper describes the successful fabrication of 4H-SiC junction barrier Schottky (JBS) rectifiers with a linearly graded field limiting ring (LG-FLR). Linearly variable ring spacings for the FLR termination are applied to improve the blocking voltage by reducing the peak surface electric field at the edge termination region, which acts like a variable lateral doping profile resulting in a gradual field distribution. The experimental results demonstrate a breakdown voltage of 5 kV at the reverse leakage current density of 2 mA/cm2 (about 80% of the theoretical value). Detailed numerical simulations show that the proposed termination structure provides a uniform electric field profile compared to the conventional FLR termi- nation, which is responsible for 45% improvement in the reverse blocking voltage despite a 3.7% longer total termination length. 展开更多
关键词 4H-SIC junction barrier schottky rectifier linearly graded field limiting ring breakdown voltage
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Study of a double epi-layers SiC junction barrier Schottky rectifiers embedded P layer in the drift region 被引量:1
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作者 宋庆文 张玉明 +2 位作者 张义门 张倩 吕红亮 《Chinese Physics B》 SCIE EI CAS CSCD 2010年第8期548-553,共6页
This paper proposes a double epi-layers 4H-SiC junction barrier Schottky rectifier (JBSR) with embedded P layer (EPL) in the drift region. The structure is characterized by the P-type layer formed in the n-type dr... This paper proposes a double epi-layers 4H-SiC junction barrier Schottky rectifier (JBSR) with embedded P layer (EPL) in the drift region. The structure is characterized by the P-type layer formed in the n-type drift layer by epitaxial overgrowth process. The electric field and potential distribution are changed due to the buried P-layer, resulting in a high breakdown voltage (BV) and low specific on-resistance (Ron,sp). The influences of device parameters, such as the depth of the embedded P+ regions, the space between them and the doping concentration of the drift region, etc., on BV and Ron,sp are investigated by simulations, which provides a particularly useful guideline for the optimal design of the device. The results indicate that BV is increased by 48.5% and Baliga's figure of merit (BFOM) is increased by 67.9% compared to a conventional 4H-SiC JBSR. 展开更多
关键词 junction barrier schottky rectifier 4H-SiC breakdown voltage specific on-resistance
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