A set of 100-nm gate-length In P-based high electron mobility transistors(HEMTs)were designed and fabricated with different gate offsets in gate recess.A novel technology was proposed for independent definition of gat...A set of 100-nm gate-length In P-based high electron mobility transistors(HEMTs)were designed and fabricated with different gate offsets in gate recess.A novel technology was proposed for independent definition of gate recess and T-shaped gate by electron beam lithography.DC and RF measurement was conducted.With the gate offset varying from drain side to source side,the maximum drain current(I_(ds,max))and transconductance(g_(m,max))increased.In the meantime,fTdecreased while f;increased,and the highest fmax of 1096 GHz was obtained.It can be explained by the increase of gate-source capacitance and the decrease of gate-drain capacitance and source resistance.Output conductance was also suppressed by gate offset toward source side.This provides simple and flexible device parameter selection for HEMTs of different usages.展开更多
We fabricated 88 nm gate-length InP-based InAlAs/InGaAs high electron mobility transistors（HEMTs） with a current gain cutoff frequency of 100 GHz and a maximum oscillation frequency of 185 GHz.The characteristics of...We fabricated 88 nm gate-length InP-based InAlAs/InGaAs high electron mobility transistors（HEMTs） with a current gain cutoff frequency of 100 GHz and a maximum oscillation frequency of 185 GHz.The characteristics of HEMTs with side-etched region lengths（L_（Side）） of 300,412 and 1070 nm were analyzed.With the increase in L_（Side）,the kink effect became notable in the DC characteristics,which resulted from the surface state and the effect of impact ionization.The kink effect was qualitatively explained through energy band diagrams,and then eased off by reducing the L_（Side）.Meanwhile,the L_（Side） dependence of the radio frequency characteristics,which were influenced by the parasitic capacitance,as well as the parasitic resistance of the source and drain,was studied.This work will be of great importance in fabricating high-performance InP HEMTs.展开更多
基金Project supported by the National Nature Science Foundation of China(Grant No.61434006)。
文摘A set of 100-nm gate-length In P-based high electron mobility transistors(HEMTs)were designed and fabricated with different gate offsets in gate recess.A novel technology was proposed for independent definition of gate recess and T-shaped gate by electron beam lithography.DC and RF measurement was conducted.With the gate offset varying from drain side to source side,the maximum drain current(I_(ds,max))and transconductance(g_(m,max))increased.In the meantime,fTdecreased while f;increased,and the highest fmax of 1096 GHz was obtained.It can be explained by the increase of gate-source capacitance and the decrease of gate-drain capacitance and source resistance.Output conductance was also suppressed by gate offset toward source side.This provides simple and flexible device parameter selection for HEMTs of different usages.
基金Project supported by the National Basic Research Program of China(No.2010CB327502)
文摘We fabricated 88 nm gate-length InP-based InAlAs/InGaAs high electron mobility transistors（HEMTs） with a current gain cutoff frequency of 100 GHz and a maximum oscillation frequency of 185 GHz.The characteristics of HEMTs with side-etched region lengths（L_（Side）） of 300,412 and 1070 nm were analyzed.With the increase in L_（Side）,the kink effect became notable in the DC characteristics,which resulted from the surface state and the effect of impact ionization.The kink effect was qualitatively explained through energy band diagrams,and then eased off by reducing the L_（Side）.Meanwhile,the L_（Side） dependence of the radio frequency characteristics,which were influenced by the parasitic capacitance,as well as the parasitic resistance of the source and drain,was studied.This work will be of great importance in fabricating high-performance InP HEMTs.
