Comparison of displacement damage effects on the dark signal in CMOS image sensors induced by CSNS back-n and XAPR neutrons

This study investigates the effects of displacement damage on the dark signal of a pinned photodiode CMOS image sensor(CIS)following irradiation with back-streaming white neutrons from white neutron sources at the China spallation neutron source(CSNS)and Xi'an pulsed reactor(XAPR).The mean dark signal,dark signal non-uniformity(DSNU),dark signal distribution,and hot pixels of the CIS were compared between the CSNS back-n and XAPR neutron irradiations.The nonionizing energy loss and energy distribution of primary knock-on atoms in silicon,induced by neutrons,were calculated using the open-source package Geant4.An analysis combining experimental and simulation results showed a noticeable proportionality between the increase in the mean dark signal and the displacement damage dose(DDD).Additionally,neutron energies influence DSNU,dark signal distribution,and hot pixels.High neutron energies at the same DDD level may lead to pronounced dark signal non-uniformity and elevated hot pixel values.

Incomplete charge transfer in CMOS image sensor caused by Si/SiO_(2)interface states in the TG channel

CMOS image sensors produced by the existing CMOS manufacturing process usually have difficulty achieving complete charge transfer owing to the introduction of potential barriers or Si/SiO_(2)interface state traps in the charge transfer path,which reduces the charge transfer efficiency and image quality.Until now,scholars have only considered mechanisms that limit charge transfer from the perspectives of potential barriers and spill back effect under high illumination condition.However,the existing models have thus far ignored the charge transfer limitation due to Si/SiO_(2)interface state traps in the transfer gate channel,particularly under low illumination.Therefore,this paper proposes,for the first time,an analytical model for quantifying the incomplete charge transfer caused by Si/SiO_(2)interface state traps in the transfer gate channel under low illumination.This model can predict the variation rules of the number of untransferred charges and charge transfer efficiency when the trap energy level follows Gaussian distribution,exponential distribution and measured distribution.The model was verified with technology computer-aided design simulations,and the results showed that the simulation results exhibit the consistency with the proposed model.

A Low-Power-Consumption 9bit 10MS/s Pipeline ADC for CMOS Image Sensors

A low-power-consumption 9bit 10MS/s pipeline ADC,used in a CMOS image sensor,is proposed. In the design, the decrease of power consumption is achieved by applying low-power-consumption and large-output-swing amplifiers with gain boost structure, and biasing all the cells with the same voltage bias source, which requires careful layout design and large capacitors. In addition,capacitor array DAC is also applied to reduce power consumption,and low threshold voltage MOS transistors are used to achieve a large signal processing range. The ADC was implemented in a 0.18μm 4M-1 P CMOS process,and the experimental results indicate that it consumes only 7mW, which is much less than general pipeline ADCs. The ADC was used in a 300000 pixels CMOS image sensor.

Numerical Simulation and Analysis of Bipolar Junction Photogate Transistor for CMOS Image Sensor

A new photodetector--bipolar junction photogate transistor is presented for CMOS image sensor and its analytical model is also established.With the technical parameter of the 0.6μm CMOS process,the bipolar junction photogate transistor is analyzed and simulated.The simulated results illustrate that the bipolar junction photogate transistor has the similar characteristics of the traditional photogate transistor.The photocurrent density of the bipolar junction photogate transistor increases exponentially with the incidence light power due to introducing the injection p+n junction.Its characteristic of blue response is rather improved compared to the traditional photogate transistor that benefits to increase the color photograph made up of the red,the green,and the blue.

A New CMOS Image Sensor with a High Fill Factor and the Dynamic Digital Double Sampling Technique

A single CMOS image sensor based on a 0.35μm process along with its design and implementation is introduced. The architecture of an active pixel sensor is used in the chip. The fill factor of a pixel cell can reach 43%,higher than the traditional factor of 30%. Moreover, compared with the conventional method whose fixed pattern noise （FPN） is around 0.5%, a dynamic digital double sampling technique is developed, which possesses simpler circuit architecture and a better FPN suppression outcome. The CMOS image sensor chip is implemented in the 0.35μm mixed signal process of a Chartered by MPW. The experimental results show that the chip operates welt,with an FPN of about 0.17%.

全局/滚动曝光兼容高动态抗辐照CMOS图像传感器设计

针对高速目标的高精度探测及辐射环境的应用要求,为解决全局与滚动曝光模式兼容难度大、灵敏度和动态低、帧速不高、抗辐照水平低等问题,对CMOS图像传感器架构、像素结构、列并行高精度数字化、高速读出、抗辐照加固等技术进行研究。基于单边列并行DDS、多模兼容的架构方案,设计了一款7.5μm×7.5μm,2048×2048可见光CMOS图像传感器,采用双增益像素结构、高帧速数字化读出、多通道可选输出、像素和电路抗辐照加固等方法,实现了全局与滚动曝光兼容、高灵敏度高动态成像、高精度数字化和高速输出、抗辐照加固等技术验证,填补了国内多模曝光兼容抗辐照CMOS图像传感技术研究空白。测试结果表明:器件功能正常,成像效果良好,动态范围、满阱电荷、灵敏度、帧速、抗辐照等指标满足预期要求,对高速高动态成像及辐射环境的系统应用具有重要意义。

CMOS图像传感器辐射敏感参数测试电路设计及试验验证

以航天领域广泛应用的CMV4000型CMOS图像传感器(CIS)为研究对象,通过开展CIS辐射敏感参数测试电路设计,将CIS辐照电路板与测试电路板中FPGA数据采集及传输板分离,辐照电路板与测试电路板通过接插口通信,从而实现开展辐照试验时对FPGA数据采集部分进行辐射屏蔽防护,避免FPGA数据采集板受到辐射影响。开展了CIS测试电路中的电源模块、数据采集、存储模块、外围电路等设计及PCB版图的布局布线设计。采用VerilogHDL硬件描述语言对各个功能模块进行驱动时序设计,实现CIS辐射敏感参数测试功能。通过开展CMV4000型CIS ^(60)Coγ射线辐照试验,分析了平均暗信号、暗信号非均匀性、暗信号分布等辐射敏感参数随总剂量增大的退化规律,验证了CIS辐射敏感参数测试系统的可靠性。

Dark output characteristic of γ-ray irradiated CMOS digital image sensors

The quality of dark output images from the CMOS (complementarymetal oxide semiconductor) black and white (B & W) digital imagesensors captured before and after γ-ray irradiation was studied. Thecharacteristic parameters of the dark output images captured atdifferent radiation dose, e.g. average brightness and itsnon-uniformity of dark out- put images, were analyzed by our testsoftware. The primary explanation for the change of the parameterswith the radi- ation dose was given.

Pixel and Column Fixed Pattern Noise Suppression Mechanism in CMOS Image Sensor

A double sampling circuit to eliminating fixed pattern noise(FPN) in CMOS image sensor (CIS) is presented. Double sampling is implemented by column switch capacitor amplifier directly, and offset compensation is added to the amplifier to suppress column FPN. The amplifier is embedded in a 64×64 CIS and successfully fabricated with chartered 0.35 μm process. Theory analysis and circuit simulation indicate that FPN can be suppressed from millivolt to microvolt. Test results show that FPN is smaller than one least-significant bit of 8 bit ADC. FPN is reduced to an acceptable level with double sampling technique implemented with switch capacitor amplifier.

A nano-metallic-particles-based CMOS image sensor for DNA detection

In this paper we report on a study of the CMOS image sensor detection of DNA based on self-assembled nano- metallic particles, which are selectively deposited on the surface of the passive image sensor. The nano-metallic particles effectively block the optical radiation in the visible spectrum of ordinary light source. When such a technical method is applied to DNA detection, the requirement for a special UV light source in the most popular fluorescence is eliminated. The DNA detection methodology is tested on a CMOS sensor chip fabricated using a standard 0.5 gm CMOS process. It is demonstrated that the approach is highly selective to detecting even a signal-base mismatched DNA target with an extremely-low-concentration DNA sample down to 10 pM under an ordinary light source.

Novel CMOS image sensor pixel to improve charge transfer speed and efficiency by overlapping gate and temporary storage diffusing node

A novel CMOS image sensor(CIS) pinned photodiode(PPD) pixel, named as O-T pixel, is proposed and investigated by TCAD simulations. Compared with the conventional PPD pixel, the proposed pixel features the overlapping gate(OG)and the temporary storage diffusing(TSD) region, based on which the several-nanosecond-level charge transfer could be achieved and the complete charge transfer from the PPD to the floating node(FD) could be realized. And systematic analyses of the influence of the doping conditions of the proposed processes, the OG length, and the photodiode length on the transfer performances of the proposed pixel are conducted. Optimized simulation results show that the total charge transfer time could reach about 5.862 ns from the photodiode to the sensed node and the corresponding charge transfer efficiency could reach as high as 99.995% in the proposed pixel with 10 μm long photodiode and 2.22 μm long OG. These results demonstrate a great potential of the proposed pixel in high-speed applications.

Modeling random telegraph signal noise in CMOS image sensor under low light based on binomial distribution

The random telegraph signal noise in the pixel source follower MOSFET is the principle component of the noise in the CMOS image sensor under low light. In this paper, the physical and statistical model of the random telegraph signal noise in the pixel source follower based on the binomial distribution is set up. The number of electrons captured or released by the oxide traps in the unit time is described as the random variables which obey the binomial distribution. As a result,the output states and the corresponding probabilities of the first and the second samples of the correlated double sampling circuit are acquired. The standard deviation of the output states after the correlated double sampling circuit can be obtained accordingly. In the simulation section, one hundred thousand samples of the source follower MOSFET have been simulated,and the simulation results show that the proposed model has the similar statistical characteristics with the existing models under the effect of the channel length and the density of the oxide trap. Moreover, the noise histogram of the proposed model has been evaluated at different environmental temperatures.

基于粗细量化并行与TDC混合的CMOS图像传感器列级ADC设计方法

针对传统单斜式模数转换器(Analog-to-Digital Converter,ADC)和串行两步式ADC在面向大面阵CMOS(Complementary Metal Oxide Semiconductor)图像传感器读出过程中的速度瓶颈问题,本文提出了一种用于高速CMOS图像传感器的全并行ADC设计方法.该方法基于时间共享和时间压缩思想,将细量化时间提前到粗量化时间段内,解决了传统方法的时间冗余问题;同时采用插入式时间差值TDC(Time-to-Digital Converter),实现了全局低频时钟下的快速转换机制.本文基于55-nm 1P4M CMOS工艺对所提方法完成了详细电路设计和全面测试验证,在模拟电压3.3 V,数字电压1.2 V,时钟频率250 MHz,输入电压1.2~2.7 V的情况下,将行时间压缩至825 ns,ADC的微分非线性和积分非线性分别为+0.6/-0.6LSB和+1.6/-1.2LSB,信噪失真比(Signal-to-Noise-and-DistortionRatio,SNDR)为68.271 dB,有效位数(Effective Numbers Of Bits,ENOB)达到11.0489 bit,列不一致性低于0.05%.相比现有的先进ADC,本文提出的方法在保证低功耗、高精度的同时,ADC转换速率提高了87.1%以上,为高速高精度CMOS图像传感器的读出与量化提供了一定的理论支撑.

Column readout circuit with improved offset mismatch and charge sharing for CMOS image sensor

High linearity and low noise column readout chain are two key factors in CMOS image sensor.However,offset mismatch and charge sharing always exist in the conventional column wise readout implementation,even adopting the technology of correlated double sample.A simple column readout circuit with improved offset mismatch and charge sharing for CMOS image sensor is proposed in this paper.Based on the bottom plate sampling and fixed common level method,this novel design can avoid the offset nonuniformity between the two buffers.Also,the single buffer and switched capacitor technique can effectively suppress the charge sharing caused by the varied operating point.The proposed approach is experimentally verified in a 1024×1024 prototype chip designed and fabricated in 55 nm low power CMOS process.The measurement results show that the linear range is extended by 20%,the readout noise of bright and dark fields is reduced by 40%and 30%respectively,and the improved photo response nonuniformity is up to 1.16%.Finally,a raw sample image taken by the prototype sensor shows the excellent practical performance.

Difference in electron-and gamma-irradiation effects on output characteristic of color CMOS digital image sensors

Changes of the average brightness and non-uniformity of dark output images,and quality of pictures captured under natural lighting for the color CMOS digital image sensorsirradiated at different electron doses have been studied in comparison to those from theγ-irradiated sensors. For the electron-irradiated sensors, the non-uniformity increases obviouslyand a small bright region on the dark image appears at the dose of 0.4 kGy. The average brightnessincreases at 0.4 kGy, increases sharply at 0.5 kGy. The picture is very blurry only at 0.6 kGy,showing the sensor undergoes severe performance degradation. Electron radiation damage is much moresevere than γ radiation damage for the CMOS image sensors. A possible explanation is presented inthis paper.

Complete Focal Plane Compression Based on CMOS Image Sensor Using Predictive Coding

In this paper, a CMOS image sensor(CIS) is proposed, which can accomplish both decorrelation and entropy coding of image compression directly on the focal plane. The design is based on predictive coding for image decorrelation. The predictions are performed in analog domain by 2×2 pixel units. Both the prediction residuals and original pixel values are quantized and encoded in parallel. Since the residuals have a peak distribution around zero,the output codewords can be replaced by the valid part of the residuals' binary mode. The compressed bit stream is accessible directly at the output of CIS without extra disposition. Simulation results show that the proposed approach achieves a compression rate of 2. 2 and PSNR of 51 on different test images.

In-Pixel Charge Addition Scheme Applied in Time-Delay Integration CMOS Image Sensors

An addition scheme applicable to time-delay integration (TDI) CMOS image sensor is proposed,which adds signals in the charge domain in the pixel array.A two-shared pixel structure adopting two-stage charge transfer is introduced,together with the rolling shutter with an undersampling readout timing.Compared with the conventional TDI addition methods,the proposed scheme can reduce the addition operations by half in the pixel array,which decreases the power consumption of addition circuits outside the pixel array.The timing arrangement and pixel structure are analyzed in detail.The simulation results show that the proposed pixel structure can achieve the charge addition with negligible nonlinearity,therefore the power consumption of the periphery addition circuits can be reduced by half theoretically.

10-Bit Single-Slope ADC with Error Calibration for TDI CMOS Image Sensor

A 10-bit single-slope analog-to-digital converter (ADC) for time-delay-integration CMOS image sensor was proposed. A programmable ramp generator was applied to accomplish the error calibration and improve the linearity. The ADC was fabricated in a 180 nm 1P4M CMOS process. Experimental results indicate that the differential nonlinearity and integral nonlinearity were 0.51/-0.53 LSB and 0.63/-0.71 LSB, respectively. The sampling rate of the ADC was 32 kHz.

A low-power high-quality CMOS image sensor using 1.5 V 4T pinned photodiode and dual-CDS column-parallel single-slope ADC

This paper presents a low-power high-quality CMOS image sensor(CIS)using 1.5 V 4T pinned photodiode(4T-PPD)and dual correlated double sampling(dual-CDS)column-parallel single-slope ADC.A five-finger shaped pixel layer is proposed to solve image lag caused by low-voltage 4T-PPD.Dual-CDS is used to reduce random noise and the nonuniformity between columns.Dual-mode counting method is proposed to improve circuit robustness.A prototype sensor was fabricated using a 0.11μm CMOS process.Measurement results show that the lag of the five-finger shaped pixel is reduced by 80%compared with the conventional rectangular pixel,the chip power consumption is only 36 mW,the dynamic range is 67.3 dB,the random noise is only 1.55 e^(-)_(rms),and the figure-of-merit is only 1.98 e^(-)·nJ,thus realizing low-power and high-quality imaging.

320×240 Pixels CMOS Digital Image Sensor with Wide Dynamic Range

A 320×240 CMOS image sensor is demonstrated,which is implemented by a standard 0.6 μm 2P2M CMOS process.For reducing the chip area,each 2×2-pixel block shares a sample/hold circuit,analog-to-digital converter and 1-b memory.The 2×2 pixel pitch has an area of 40 μm×40 μm and the fill factor is about 16%.While operating at a low frame rate,the sensor dissipates a very low power by power-management circuit making pixel-level comparators in an idle state.A digital correlated double sampling,which eliminates fixed pattern noise,improves SNR of the sensor, and multiple sampling operations make the sensor have a wide dynamic range.