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Spatiotemporal evolution of high-aspect-ratio filamentary trace in sapphire of picosecond pulse burst-mode for laser lift-off 被引量:1
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作者 SUN Wei-gao YAN Tian-yang +1 位作者 WANG Yu-heng JI Ling-fei 《Journal of Central South University》 SCIE EI CAS CSCD 2022年第10期3304-3311,共8页
The influence of the picosecond(ps) pulsed burst with a nanosecond scale of temporal separation(50 ns) on filamentary traces in sapphire substrate is investigated. The spatiotemporal evolution of the filamentary plasm... The influence of the picosecond(ps) pulsed burst with a nanosecond scale of temporal separation(50 ns) on filamentary traces in sapphire substrate is investigated. The spatiotemporal evolution of the filamentary plasma string induced by sub-pulses of the burst-mode is revealed according to the analysis of the instantaneous photoluminescence images. Due to the presence of residual plasma, the energy loss of sub-pulse during the balancing of self-focusing effect is reduced, and thus refreshes the plasma via refocusing. The refreshed plasma peak generated by the subsequent subpulse appears at relatively low density positions in the formed filamentary plasma string, which results in more uniform densities and less spatial overlap among the plasma peaks. The continuity and uniformity of the filamentary trace in sapphire are enhanced by the burst-mode. Besides, the burst filamentary propagation can also remain effective when the sub-pulse energy is below the self-focusing threshold. Based on this uniform and precise energy propagation mode, the feasibility of its use for the laser lift-off(LLO) process is verified. 展开更多
关键词 picosecond laser filamentary plasma string BURST-MODE spatiotemporal evolution laser lift-off
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激光剥离GaN表面的抛光技术 被引量:1
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作者 应磊莹 刘文杰 +2 位作者 张江勇 胡晓龙 张保平 《半导体技术》 CAS CSCD 北大核心 2014年第10期758-762,共5页
激光剥离(LLO)技术是研制新型氮化镓(GaN)基谐振腔结构光电子器件的关键技术。然而LLO后的GaN表面往往具有较大的粗糙度,而制作谐振腔结构器件需要很高的表面平整度,因此需要对LLO后的GaN表面进行抛光。分别采用金刚石粉抛光液和胶粒二... 激光剥离(LLO)技术是研制新型氮化镓(GaN)基谐振腔结构光电子器件的关键技术。然而LLO后的GaN表面往往具有较大的粗糙度,而制作谐振腔结构器件需要很高的表面平整度,因此需要对LLO后的GaN表面进行抛光。分别采用金刚石粉抛光液和胶粒二氧化硅抛光液进行机械抛光和化学机械抛光(CMP),并对比了两种方法获得的抛光结果,研究发现前者会在抛光后的GaN表面引入划痕,而采用后者可以得到亚纳米级平整度的表面。进一步的实验结果表明,胶粒二氧化硅抛光液同样适用于图形化衬底外延片激光剥离后的GaN表面抛光。 展开更多
关键词 激光剥离(llo) GAN 化学机械抛光(CMP) 垂直结构发光二极管(VSLED) 谐振腔发光二极管(RCLED) 垂直腔面发射激光器(VCSEL)
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Experimental study of laser lift-off of ultra-thin polyimide film for flexible electronics 被引量:3
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作者 BIAN Jing ZHOU LaoBoYang +4 位作者 WAN XiaoDong LIU MinXiao ZHU Chen HUANG YongAn YIN ZhouPing 《Science China(Technological Sciences)》 SCIE EI CAS CSCD 2019年第2期233-242,共10页
It is increasingly crucial for flexible electronics to efficiently and reliably peel large-area, ultra-thin flexible films off from rigid substrate serving as substrates of flexible electronics device, especially in i... It is increasingly crucial for flexible electronics to efficiently and reliably peel large-area, ultra-thin flexible films off from rigid substrate serving as substrates of flexible electronics device, especially in industrial production. This paper experimentally investigated the mechanism and technologic characteristics of laser lift-off(LLO) process of ultra-thin(~ 2 μm) polyimide(PI)film. It was found increasingly difficult to obtain desirable ultra-thin PI film by LLO with the decrease of the film thickness. The optimal process parameters were achieved considering laser fluence and accumulated irradiation times(AIT), which were found to be strongly correlative to the thickness of PI film. The process mechanism of LLO of PI film was disclosed that laser ablation of interfacial PI will result in the formation of gas products between the PI and glass substrate, enabling the change of interface microstructures to reduce the interface bond strength. The amount of gas products mainly determines the result of LLO process for ultra-thin PI film, from residual adhesion to wrinkles or cracking. The strategy of multi-scanning based on multiple irradiations of low-energy laser pulses was presented to effectively achieve a reliable LLO process of ultra-thin PI film. This study provides an attractive route to optimize the LLO process for large-scale production of ultra-thin flexible electronics. 展开更多
关键词 laser lift-off INTERFACIAL PEELING DELAMINATION flexible ELECTRONICS thin film
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Flexible inorganic oxide thin-film electronics enabled by advanced strategies 被引量:1
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作者 Tianyao Zhang Guang Yao +2 位作者 Taisong Pan Qingjian Lu Yuan Lin 《Journal of Semiconductors》 EI CAS CSCD 2020年第4期21-34,共14页
With the advent of human-friendly intelligent life,as well as increasing demands for natural and seamless humanmachine interactions,flexibility and wearability are among the inevitable development trends for electroni... With the advent of human-friendly intelligent life,as well as increasing demands for natural and seamless humanmachine interactions,flexibility and wearability are among the inevitable development trends for electronic devices in the future.Due to the advantages of rich physicochemical properties,flexible and stretchable inorganic oxide thin-film electronics play an increasingly important role in the emerging and exciting flexible electronic field,and they will act as a critical player in nextgeneration electronics.However,a stable strategy to render flexibility while maintaining excellent performance of oxide thin films is the most demanding and challenging problem,both for academic and industrial communities.Thus,this review focuses on the latest advanced strategies to achieve flexible inorganic oxide thin-film electronics.This review emphasizes the physical transferring strategies that are based on mechanical peeling and the chemical transferring strategies that are based on sacrificial layer etching.Finally,this review evaluates and summarizes the merits and demerits of these strategies toward actual applications,concluding with a future perspective into the challenges and opportunities for the next-generation of flexible inorganic oxide thin-film electronics. 展开更多
关键词 FLEXIBLE ELECTRONICS laser lift-off VAN der WAALS EPITAXY transfer printing
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GaN/metal/Si heterostructure fabricated by metal bonding and laser lift-off 被引量:1
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作者 张小英 阮育娇 +1 位作者 陈松岩 李成 《Journal of Semiconductors》 EI CAS CSCD 北大核心 2009年第12期5-8,共4页
A process methodology has been adopted to transfer GaN thin films grown on sapphire substrates to Si substrates using metal bonding and laser lift-off techniques. After bonding, a single KrF (248 nm) excimer laser p... A process methodology has been adopted to transfer GaN thin films grown on sapphire substrates to Si substrates using metal bonding and laser lift-off techniques. After bonding, a single KrF (248 nm) excimer laser pulse was directed through the transparent sapphire substrates followed by low-temperature heat treatment to remove the substrates. The influence of bonding temperature and energy density of the excimer laser on the structure and optical properties of GaN films were investigated systemically. Atomic force microscopy, X-ray diffraction and photoluminescence measurements showed that (1) the quality of the GaN film was higher at a lower bonding temperature and lower energy density; (2) the threshold of the energy density of the excimer laser lift-off GaN was 300 mJ/cm^2. The root-mean-square roughness of the transferred GaN surface was about 50 nm at a bonding temperature of 400 ℃. 展开更多
关键词 GaN films SILICON metal bonding laser lift-off atomic force microscopy X-ray diffraction
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Laser projection proximity transfer for deterministic assembly of microchip arrays at scale 被引量:1
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作者 HU JinLong CHEN FuRong +7 位作者 BIAN Jing SUN NingNing WANG KaiXin LING Hong YU HaiYang GAI MengXin XU LiZhi HUANG YongAn 《Science China(Technological Sciences)》 SCIE EI CAS CSCD 2022年第9期2205-2214,共10页
Deterministic assembly techniques that enable programmatic and massively parallel integration of chips are essential for the development of novel electronic systems such as micro LED displays.However,large-area integr... Deterministic assembly techniques that enable programmatic and massively parallel integration of chips are essential for the development of novel electronic systems such as micro LED displays.However,large-area integration of ultrathin micro-chips with high yield and transfer accuracy remains a great challenge due to the difficulties in selective transfer,adhesion switchability,and transfer deviation.Here,a“laser projection proximity transfer(Laser PPT)”technique is presented for the deterministic assembly of microchip arrays at scale.One of the remarkable features is that the transfer status between the chip and the receiver substrate evolves from the original non-contact mode to contact mode for high-precision transfer,which overcomes the strict requirements of the flatness of stamp and substrate in contact-style transfer,and flight deviation of microchip array in noncontact-style transfer.Another feature is the rapid modulation of interfacial adhesion for reliable transfer via the use of thermally expandable microspheres to form microstructures and combining with a laser-induced blister.The adhesion regulation range is over 20 times without any damage to chip arrays.The results show that the transfer accuracy has been improved substantially with a minimum relative error of~0.5%.Combined with a laser beam projection system,demonstrations of Laser PPT for selective assembly of fragile objects onto challenging non-adhesive/cured surfaces in batch illustrate its potential in the highprecision integration of microscale chips at scale. 展开更多
关键词 microtransfer printing micro LED display laser lift-off interfacial adhesion
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高质量的AlGaN外延结构和UVC垂直腔面发射激光器的实现 被引量:1
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作者 郑重明 王玉坤 +6 位作者 胡建正 郭世平 梅洋 龙浩 应磊莹 郑志威 张保平 《Science China Materials》 SCIE EI CAS CSCD 2023年第5期1978-1988,共11页
AlGaN基垂直腔面发射激光器(VCSEL)因其优越的材料性质和器件优点吸引了很多关注.然而,由于材料外延生长和器件制备工艺的局限,AlGaN基VCSEL制备很困难.本工作通过侧向外延生长技术制备了高质量的AlGaN多量子阱(MQWs)结构的外延片,并通... AlGaN基垂直腔面发射激光器(VCSEL)因其优越的材料性质和器件优点吸引了很多关注.然而,由于材料外延生长和器件制备工艺的局限,AlGaN基VCSEL制备很困难.本工作通过侧向外延生长技术制备了高质量的AlGaN多量子阱(MQWs)结构的外延片,并通过X射线衍射(XRD)和光致发光(PL)实验对外延片进行了分析.XRD测量显示,外延片中的AlN模板层几乎是弛豫的,刃位错密度为10^(9)cm^(-2).随后,生长的AlGaN/AlN超晶格(SL)层被用来减少刃位错密度,使得量子阱中的位错密度为10^(8)cm^(-2).根据PL测试结果,MQWs的内量子效率(IQE)为62%,且在室温下的发光以辐射复合为主.通过激光剥离(LLO)和化学机械抛光(CMP)技术,将这些外延片制备成UVC VCSEL.经过这些工艺,MQWs的晶体质量没有受到影响,还在抛光之后的表面观察到了UVC波段的受激辐射.这些AlGaN基UVC VCSEL在275.91,276.28和277.64 nm实现了激射,最小激射阈值为0.79 MW cm^(-2). 展开更多
关键词 ALGAN vertical-cavity surface-emitting lasers epitaxial lateral overgrowth laser lift-off UVC
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