Highly-Strained InGaAs/GaAs Single-Quantum-Well Lasers Grown by Molecular Beam Epitaxy

Highly stained InGaAs/GaAs Quantum Wells (QW) are grown by using molecular beam epitaxy.The room-temperature photoluminescence (PL) peak wavelength as long as 1160nm is obtained from QW with the In composition of 38% and the well width of 6 8nm.The full-width at half-maximum of the PL peak is 22meV,indicating a good quality.InGaAs/GaAs QW ridge-waveguide lasers with emission wavelength of 1120nm are demonstrated.For 100-μm-wide ridge-waveguide lasers with a cavity length of 800μm,the kink-free output power up to 200mW is achieved with the slope efficiency of 0 84mW/mA under the continue-wave operation.For 10μm-wide ridge-waveguide lasers,the lowest threshold current density of 450A/cm2 and the characteristic temperature of 90K are obtained.

High quality 2-μm GaSb-based optically pumped semiconductor disk laser grown by molecular beam epitaxy

The epitaxial growth conditions and performance of a diode-pumped GaSb-based optically pumped semiconductor disk laser(SDL) emitting near 2.0 μm in an external cavity configuration are reported. The high quality epitaxial structure,grown on Te-doped(001) oriented GaSb substrate by molecular beam epitaxy, consists of a distributed Bragg reflector(DBR), a multi-quantum-well gain region, and a window layer. An intra-cavity SiC heat spreader was attached to the gain chip for effective thermal management. A continuous-wave output power of over 1 W operating at 2.03 μm wavelength operating near room temperature was achieved using a 3% output coupler.

Effects of N_2 Pressure on the Structural and Electrical Properties of TiN Films Deposited by Laser Molecular Beam Epitaxy

Titanium nitride （TiN） films were deposited on Si（100） substrates by laser molecular beam epitaxy（LMBE）,and their properties of structure and resistivity with varying N2 pressure were investigated.The results showed that atomically flat TiN films with layer-by-layer growth mode were successfully grown on Si（100） substrates,and （200） was the preferred orientation.With the increasing of N2 pressure,the N/Ti ratio gradually increased and the diffraction peak progressively shifted towards lower diffraction angle.At pressure of 0.1 Pa,stoichiometric TiN film was formed which exhibited the characteristic diffraction angle of （200） plane.All films showed high reflectance to infrared spectrum and the films with overstoichiometry and understoichiometry had a higher resistivity owing to the surface particles and lattice distortion,while the stoichiometric TiN film depicted the minimum resistivity,around 19 μΩ·cm.

Effect of thickness on the microstructure of GaN films on Al_2 O_3 (0001) by laser molecular beam epitaxy

Heteroepitaxial GaN films are grown on sapphire （0001） substrates using laser molecular beam epitaxy. The growth processes are in-situ monitored by reflection high energy electron diffraction. It is revealed that the growth mode of GaN transformed from three-dimensional （3D） island mode to two-dimensional （2D） layer-by-layer mode with the increase of thickness. This paper investigates the interfacial strain relaxation of GaN films by analysing their diffraction patterns. Calculation shows that the strain is completely relaxed when the thickness reaches 15 nm. The surface morphology evolution indicates that island merging and reduction of the island-edge barrier provide an effective way to make GaN films follow a 2D layer-by-layer growth mode. The ll0-nm GaN films with a 2D growth mode have smooth regular hexagonal shapes. The X-ray diffraction indicates that thickness has a significant effect on the crystallized quality of GaN thin films.

Current transport in ZnO/Si heterostructure grown by laser molecular beam epitaxy

The n-ZnO/p-Si heterojunction was fabricated by depositing high quality single crystalline aluminium-doped n-type ZnO film on p-type Si using the laser molecular beam epitaxy technique. The heterojunction exhibited a good rectifying behavior. The electrical properties of the heterojunction were investigated by means of temperature dependence current density-voltage measurements. The mechanism of the current transport was proposed based on the band structure of the heterojunction. When the applied bias V is lower than 0.15 V, the current follows the Ohmic behavior. When 0.15 V ~ V 〈 0.6 V, the transport property is dominated by diffusion or recombination in the junction space charge region, while at higher voltages （V 〉 0.6 V）, the space charge limited effect becomes the main transport mechanism. The current-voltage characteristic under illumination was also investigated. The photovoltage and the short circuit current density of the heterojunction aproached 270 mV and 2.10 mA/cm^2, respectively.

Investigation into the InAs/GaAs quantum dot material epitaxially grown on silicon for O band lasers

InAs/GaAs quantum dot(QD)lasers were grown on silicon substrates using a thin Ge buffer and three-step growth method in the molecular beam epitaxy(MBE)system.In addition,strained superlattices were used to prevent threading disloca-tions from propagating to the active region of the laser.The as-grown material quality was characterized by the transmission electron microscope,scanning electron microscope,X-ray diffraction,atomic force microscope,and photoluminescence spectro-scopy.The results show that a high-quality GaAs buffer with few dislocations was obtained by the growth scheme we de-veloped.A broad-area edge-emitting laser was also fabricated.The O-band laser exhibited a threshold current density of 540 A/cm^(2) at room temperature under continuous wave conditions.This work demonstrates the potential of large-scale and low-cost manufacturing of the O-band InAs/GaAs quantum dot lasers on silicon substrates.

High-temperature continuous-wave operation of 1310 nm InAs/GaAs quantum dot lasers

Here we report 1.3μm electrical injection lasers based on InAs/GaAs quantum dots(QDs)grown on a GaAs substrate,which can steadily work at 110-℃without visible degradation.The QD structure is designed by applying the Stranski-Krastanow growth mode in solid source molecular beam epitaxy.The density of InAs QDs in the active region is increased from 3.8×10^(10)cm^(-2)to 5.9×10^(10)cm^(-2).As regards laser performance,the maximum output power of devices with lowdensity QDs as the active region is 65 m W at room temperature,and that of devices with the high-density QDs is 103 mW.Meanwhile the output power of high-density devices is 131 mW under an injection current of 4 A at 110-℃.

Atomic scale epitaxial growth of BaTiO_3 thin films by laser molecular beam epitaxy

By using laser molecular beam epitaxy (L-MBE), atomic scale epitaxial growth of BaTiO3(BTO) thin films on SrTiO3 (STO) substrates is achieved. Measurements of reflection high energy electron diffraction (RHEED), X-ray diffraction (XRD), scanning electron microscopy, and transmission electron microscopy reveal that the BTO films are c-axis oriented single crystals with smooth surface. The multi-layer ferroelectric/superconducting heterostructures are also prepared and the ferroelectric properties of BTO films are studied. The results show that by using L-MBE technique, high quality BTO films and improved device performance can be obtained.

Material Growth and Device Fabrication of GaAs Based 1.3μm GaInNAs Quantum Well Laser Diodes

Material growth and device fabrication of the first 1.3μm quantum well （QW） edge emitting laser diodes in China are reported. Through the optimization of the molecular beam epitaxy （MBE） growth conditions and the tuning of the indium and nitrogen composition of the GalnNAs QWs, the emission wavelengths of the QWs can be tuned to 1.3μm. Ridge geometry waveguide laser diodes are fabricated. The lasing wavelength is 1.3μm under continuous current injection at room temperature with threshold current of 1kA/cm^2 for the laser diode structures with the cleaved facet mirrors. The output light power over 30mW is obtained.

Room Temperature Operation of Strain-Compensated 5.5μm Quantum Cascade Lasers

Room temperature operation is an important criterion for high performance of quantum cascade lasers. A strain-compensated quantum cascade laser（λ≈5.5μm） with optimized waveguide structure lasing at room temperature is reported. Accurate control of layer thickness and strain-compensated material composition is demonstrated using X-ray diffraction. An output power of at least 45mW per facet is realized for a 20μm-wide and 2mm-long laser at room temperature.

Infuence of Substrate Temperature on Stress and Morphology Characteristics of Co Doped ZnO Films Prepared by Laser-Molecular Beam Epitaxy

Znl_xCoxO （x = 0.05） thin films are deposited on sapphire （0001） substrates by laser-molecular beam epitaxy technique at different substrate temperatures. The structural, stress and morphology evolution features are investigated by means of X-ray diffraction and atomic force microscopy. The surface parameters of roughness exponent α, root mean square （RMS） roughness w and autocorrelation length ~ are calculated and the surface parameters are preliminarily analyzed. The values of ~ vary from 0.7 to 0.9. The RMS roughness w is less than 2.2 nm, and it increases with increasing Ts from 300 to 400 °C, and then decreases when Ts is 500 °C. The autocorrelation length ~ decreases monotonously with the increase in Ts from 300 to 500 °C, which indicates that the increase in Ts restrains the spread of the surface fluctuations until Ts is higher than 400 °C.

Fabrication of atomically smooth SrRuO_3 thin films by laser molecular beam epitaxy

High-quality SrRuO3 (SRO) thin films and SrTiO3/SRO bilayer were grown epitaxially on SrTiO3 (STO)(001) substrates by laser molecular beam epitaxy. The results of in situ observation of reflection high-energy electron diffraction and ex situ X-ray diffraction θ -2θ scan indicate that the SRO thin films have good crystallinity. The measurements of atomic force microscopy and scan tunneling microscopy reveal that the surface of the SRO thin film is atomically smooth. The resistivity of the SRO thin film is 300 μΩ·cm at room temperature. Furthermore, the transmission electron microscopy study shows that the interfaces of STO/SRO and SRO/STO are very clear and no interfacial reaction layer was observed. The experimental results show that the SRO thin film is an excellent electrode material for devices based on perovskite oxide materials.

High quality YBCO superconductive thin films fabricated by laser molecular beam epitaxy

High quality YBa2Cu3O6+x (YBCO) superconductive thin films have been fabricated on the SrTiO3(100) substrate using laser molecular beam epitaxy (laser-MBE).The active oxygen source was used,which made the necessary ambient oxygen pressure be 2-3 orders lower than that in pulsed laser deposition (PLD).Tc0 is 85-87 K,and Jc～1.0×106 A/cm2.Atomic force microscopy (AFM) measurements show that no obvious particulates can be observed and the root mean square roughness is 7.8 nm.High stability DC superconducting quantum interference devices (DC-SQUID) was fabricated using this YBCO thin film.

Laser molecular-beam epitaxy and second-order optical nonlinearity of BaTiO_3/SrTiO_3 superlattices

A series of c-axis oriented BaTiO3/SrTiO3 superlattices with the atomic-scale precision were epitaxially grown on single-crystal SrTiO3(100) substrates using laser molecular-beam epitaxy (LMBE). A periodic modulation of the intensity of reflection high-energy electron diffraction (RHEED) in BaTiO3 and SrTiO3 layers was observed and attributed to the lattice-misfit-induced periodic variation of the terrace density in film surface. The relationship between the second-order nonlinear optical sus-ceptibilities and the superlattice structure was systematically studied. The experimental and theoretical fitting results indicate that the second-order nonlinear optical susceptibilities of BaTiO3/SrTiO3 superlattices were greatly enhanced with the maximum value being more than one order of magnitude larger than that of bulk BaTiO3 crystal. The mechanism of the enhancement of the second-order optical non-linearity was discussed by taking into account the stress-induced lattice distortion and polarization enhancement.

Oxygen pressure dependent electro-resistance in La_(0.9)Sr_(0.1)MnO_3 thin films grown by laser molecular beam epitaxy

We report here studies on the influence of oxygen pressure on the electroresis-tance behavior of La0.9Sr0.1MnO3 thin films fabricated by laser molecular beam epi-taxy. It was found that the film deposited at lower oxygen pressure shows larger c-axis parameter,higher resistance,and more distinct electroresistance. These results reveal that the electroresistance of manganite thin films can be tuned by the conditions of film fabrication.

Structure and chemical states of highly eptiaxial CeO_2(001) films grown on SrTiO_3 substrate by laser molecular beam epitaxy

Highly epitaxial and pure（001）-oriented CeO2 films were grown on SrTiO3（001） substrates by laser molecular beam epitaxy method without any gas ambient.Layer-by-layer epitaxial growth mode of CeO2 was confirmed by in situ reflection high-energy electron diffraction（RHEED） observations.High-resolution X-ray diffraction（HRXRD） and high-resolution transmission electron microscopy（HRTEM） results indicated the STO（100）//CeO2（100）,STO[100]//CeO2 [110] epitaxial relationship for out-of-plane and in-plane,respectively.The formation mechanism of the epitaxial film was also discussed in the light of a theoretical model.Chemical states of the LMBE ceria films were evaluated and evidences for the existence of Ce3＋and oxygen vacancies were presented.

Optimization of InAs/GaAs quantum-dot structures and application to 1.3-μm mode-locked laser diodes

The self-assembled growth of InAs/GaAs quantum dots by molecular beam epitaxy is conducted by optimizing several growth parameters, using a one-step interruption method after island formation. The dependence of photoluminescence on areal quantum-dot density is systematically investigated as a function of InAs deposition, growth temperature and arsenic pressure. The results of this investigation along with time-resolved photoluminescence measurements show that the com- bination of a growth temperature of 490℃, with a deposition rate of 0.02 ML/s, under an arsenic pressure of 1×10^-6 Torr （1 Torr = 1.33322×10^2 Pa）, provides the best compromise between high density and the photoluminescence of quantum dot structure, with a radiative lifetime of 780 ps. The applicability of this 5-layer quantum dot structure to high-repetition-rate pulsed lasers is demonstrated with the fabrication and characterization of a monolithic InAs/GaAs quantum-dot passively mode-locked laser operating at nearly 1300 nm. Picosecond pulse generation is achieved from a two-section laser, with a 19.7-GHz repetition rate.

GaSb-based type-Ⅰ quantum well cascade diode lasers emitting at nearly 2-μm wavelength with digitally grown AlGaAsSb gradient layers

We report a GaSb-based type-I quantum well cascade diode laser emitting at nearly 2-μm wavelength.The recycling of carriers is realized by the gradient AlGaAsSb barrier and chirped GaSb/AlSb/InAs electron injector.The growth of quaternary digital alloy with a gradually changed composition by short-period superlattices is introduced in detail in this paper.And the quantum well cascade laser with 100-μm-wide,2-mm-long ridge generates an about continuous-wave output of 0.8 W at room temperature.The characteristic temperature T_(0) is estimated at above 60 K.

利用InAs/GaAs数字合金超晶格改进InAs量子点有源区的结构设计

利用分子束外延技术,通过InAs/GaAs数字合金超晶格代替传统的直接生长InGaAs层的方式,在GaAs(100)衬底上生长了InAs量子点结构并成功制备了1.3μm InAs量子点激光器.通过原子力显微镜和光致荧光谱测试手段,对传统生长模式和数字合金超晶格生长模式的两种样品进行了表征,研究发现采用32周期InAs/GaAs数字合金超晶格样品的量子点密度非常高,发光性能良好.通过与常规生长方式所制备激光器的性能对比,发现采用InAs/GaAs数字合金超晶格生长InAs量子点的有源区也可以得到高质量的激光器.利用该方式生长的InAs量子点激光器的阈值电流为24 mA,相应的阈值电流密度仅为75 A/cm^(2),最高工作温度达到120℃.InAs/GaAs数字合金超晶格既可以保证生长过程中源炉的温度保持不变,还可以对InGaAs层的组分实现灵活调控.不需要改变生长速度,通过改变InAs/GaAs数字合金超晶格的周期数以及InAs层和GaAs层的厚度,便可以获得任意组分的InGaAs,从而得到不同发光波长的激光器.这种生长方式对量子点有源区的结构设计和外延生长提供了新思路.

有源区Be掺杂对1.3μm InAs量子点激光器性能的影响

利用分子束外延技术在GaAs(100)衬底上生长了1.3μm InAs DWELL量子点激光器结构,研究了有源区Be掺杂对量子点激光器性能的影响。研究表明,对有源区进行Be掺杂可以有效降低InAs量子点激光器的阈值电流密度,提升激光器的输出功率,增加激光器的温度稳定性。研制的Be掺杂InAs量子点激光器的阈值电流降低到12mA,相应的阈值电流密度仅为100 A/cm2,激光器的最高输出功率达到183 mW,最高工作温度达到了130℃。这对InAs量子点激光器器件在光通信系统中的应用具有重要意义。