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Rapid thermal annealing effects on vacuum evaporated ITO for InGaN/GaN blue LEDs
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作者 丁艳 郭伟玲 +2 位作者 朱彦旭 刘建朋 闫薇薇 《Journal of Semiconductors》 EI CAS CSCD 2012年第6期129-132,共4页
8 mil×10 mil InGaN/GaN blue LEDs with indium tin oxide(ITO) emitting at 460 nm were fabricated. A vacuum evaporation technique was adopted to deposit ITO on P-GaN with thickness of 240 nm.The electrical and opt... 8 mil×10 mil InGaN/GaN blue LEDs with indium tin oxide(ITO) emitting at 460 nm were fabricated. A vacuum evaporation technique was adopted to deposit ITO on P-GaN with thickness of 240 nm.The electrical and optical properties of ITO films on P-GaN wafers,as well as rapid thermal annealing(RTA) effects at different temperatures(100 to 550℃) were analyzed and compared.It was found that resistivity of 450℃RTA was as low as 1.19×10^(-4)Ω·cm,along with a high transparency of 94.17%at 460 nm.AES analysis indicated the variation of oxygen content after 450℃annealing,and ITO contact resistance showed a minimized value of 3.9×10^(-3)Ω·cm^2.With 20 mA current injection,it was found that forward voltage and output power were 3.14 V and 12.57 mW.Furthermore,maximum luminous flux of 0.49 lm of ITO RTA at 550℃was measured,which is the consequence of a higher transparency. 展开更多
关键词 rapid thermal annealing light emitting diodes ITO InGaN/GaN
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