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Analysis of Effects of the Arc Voltage on Arc Discharges in a Cathode Ion Source of Neutral Beam Injector
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作者 陈俞钱 胡纯栋 谢亚红 《Plasma Science and Technology》 SCIE EI CAS CSCD 2016年第4期453-456,共4页
A hot cathode bucket ion source is used for the EAST(experimental advanced superconducting tokamak)neutral beam injector.The thermal electrons emitted from the surface of the cathode are extracted and accelerated by... A hot cathode bucket ion source is used for the EAST(experimental advanced superconducting tokamak)neutral beam injector.The thermal electrons emitted from the surface of the cathode are extracted and accelerated by the electric field formed by the arc voltage,which is applied between the arc chamber of the ion source and the cathode.This paper analyzes the effects of arc voltage on the arc discharge in a hot cathode high current ion source. 展开更多
关键词 high current ion source arc discharge thermal emission limited mode stability
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Siliconization for Wall Conditioning in the HL-2A Tokamak
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作者 CAO Zeng CUI Chenghe CAI Xiao GAO Xiaoyan DUAN Xuru PAN Yudong LI Quang 《Southwestern Institute of Physics Annual Report》 2005年第1期43-44,共2页
The sputtering of impurities is caused by the interactions between plasma and the first wall, and the recycling of the gas affects the particle and energy transport of plasmas with a complicated mechanism in plasma op... The sputtering of impurities is caused by the interactions between plasma and the first wall, and the recycling of the gas affects the particle and energy transport of plasmas with a complicated mechanism in plasma operation. It is important for present tokarnaks to achieve a good confinement and high performance plasmas by means of controls of the vacuum condition, usage of low Z materials, control of the recycling of neutral particles and suppressions of the appearances and yield of impurities. For higher plasma parameters, some of the first wall of HL-2A is covered with graphite materials and carbon fiber tiles. Hence the studies on the in-situ coating application and development, and the interactions between the coating film and plasma are needed to effectively control the impurity, improve plasma confinement and achieve high performance plasma. 展开更多
关键词 Siliconization discharge improvement Density limits
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