A versatile nanosphere composite lithography（NSCL） combining both the advantages of multiple-exposure nanosphere lens lithography（MENSLL） and nanosphere template lithography（NSTL） is demonstrated. By well contro...A versatile nanosphere composite lithography（NSCL） combining both the advantages of multiple-exposure nanosphere lens lithography（MENSLL） and nanosphere template lithography（NSTL） is demonstrated. By well controlling the development, washing and the drying processes, the nanosphere monolayer can be well retained on the substrate after developing and washing. Thus the NSTL can be performed based on MENSLL to fabricate nanoring, nanocrescent and hierarchical multiple structures. The pattern size and the shape can be systemically tuned by shrinking nanospheres by using dry etching and adjusting the tilted angle. It is a natural nanopattern alignment process and possesses a great potential in the scope of nano-science due to its low cost,simplicity, and versatility for variuos nano-fabrications.展开更多
基金supported by the National Natural Science Foundation of China(Nos.61604051,51502074 and61474109)the Natural Science of Foundation of Tianjin(Nos.16JCQNJC01000 and 16JCYBJC16200)+1 种基金the Technology Foundation for Selected Overseas Chinese Scholar by Ministry of Human Resources and Social Security of the People’s Republic of China(No.CG2016008001)the Research Award for Top Young Scientist of Excellence of Hebei Province(No.210013)
文摘A versatile nanosphere composite lithography（NSCL） combining both the advantages of multiple-exposure nanosphere lens lithography（MENSLL） and nanosphere template lithography（NSTL） is demonstrated. By well controlling the development, washing and the drying processes, the nanosphere monolayer can be well retained on the substrate after developing and washing. Thus the NSTL can be performed based on MENSLL to fabricate nanoring, nanocrescent and hierarchical multiple structures. The pattern size and the shape can be systemically tuned by shrinking nanospheres by using dry etching and adjusting the tilted angle. It is a natural nanopattern alignment process and possesses a great potential in the scope of nano-science due to its low cost,simplicity, and versatility for variuos nano-fabrications.
